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公开(公告)号：US20060110665A1
公开(公告)日：2006-05-25
申请号：US10994201
申请日：2004-11-22
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70308
摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.
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2.发明申请公开(公告)号：US20060077372A1
公开(公告)日：2006-04-13
申请号：US10962550
申请日：2004-10-13
申请人： Stephen Roux , Erik Loopstra , Michael Nelson
发明人： Stephen Roux , Erik Loopstra , Michael Nelson
IPC分类号： G03B27/72
CPC分类号： G03F7/70558 , G03F7/70066
摘要： An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system comprising a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system of the photolithography system and a reticle stage of the photolithography system so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The blade structure is either translucent to a wavelength of the light or opaque to the wavelength. The first portion of the light has a first area. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that, when the illumination system provides the light having the illumination field, a second portion of the light within the illumination field impinges upon the blade structure. The second portion of the light has a second area. The second area is different from the first area.
摘要翻译： 一种用于改变包括叶片结构和第一致动器的光刻系统的照明场内的光聚集强度的装置。 刀片结构被配置为沿着光刻系统的光路定位在光刻系统的照明系统和光刻系统的光罩台之间，使得当照明系统提供具有照明场的光时，叶片结构 基本上在照明场的中心，并且照明场内的光的第一部分撞击在叶片结构上。 叶片结构对于光的波长是半透明的或对于波长是不透明的。 光的第一部分具有第一区域。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且构造成在第一方向上至少移动叶片结构的第一部分，使得当照明系统提供具有 照明场，照明场内的光的第二部分照射在叶片结构上。 光的第二部分具有第二区域。 第二个区域与第一个区域不同。
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3.发明申请公开(公告)号：US20070013891A1
公开(公告)日：2007-01-18
申请号：US11523695
申请日：2006-09-20
申请人： Stephen Roux , Erik Loopstra , Michael Nelson
发明人： Stephen Roux , Erik Loopstra , Michael Nelson
IPC分类号： G03B27/72
CPC分类号： G03F7/70558 , G03F7/70066
摘要： An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.
摘要翻译： 一种用于改变具有叶片结构和第一致动器的光刻系统的照明场中的光的聚集强度的装置。 叶片结构被构造成沿着光刻系统的光路在照明系统和标线镜台之间定位，使得当照明系统提供具有照明场的光时，叶片结构基本上处于照明的中心 并且照明场内的光的第一部分撞击在叶片结构上。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且被配置成沿着第一方向移动至少第一部分叶片结构，使得第一部分的光在照明区域内 撞击在叶片结构上。
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公开(公告)号：USD734554S1
公开(公告)日：2015-07-14
申请号：US29475449
申请日：2013-12-03
申请人： Eric Crane , Michael Nelson , Kip Arnette , Scott Layton , Matt Capozzi
设计人： Eric Crane , Michael Nelson , Kip Arnette , Scott Layton , Matt Capozzi
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公开(公告)号：US08549241B2
公开(公告)日：2013-10-01
申请号：US12683288
申请日：2010-01-06
IPC分类号： G06F12/16
CPC分类号： G06F11/2023 , G06F11/1438 , G06F11/1484 , G06F11/2097 , G06F2201/84
摘要： A virtualization platform provides fault tolerance for a primary virtual machine by continuously transmitting checkpoint information of the primary virtual machine to a collector process, such as a backup virtual machine. When implemented on a hardware platform comprising a multi-processor that supports nested page tables, the virtualization platform leverages the nested page table support to quickly identify memory pages that have been modified between checkpoints. The backup virtual machine provides feedback information to assist the virtualization platform in identifying candidate memory pages for transmitting actual modifications to the memory pages rather than the entire memory page as part of the checkpoint information. The virtualization platform further maintains a modification history data structure to identify memory pages that can be transmitted simultaneous with the execution of the primary virtual machine rather than while the primary virtual machine has been stunned.
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公开(公告)号：US08235302B2
公开(公告)日：2012-08-07
申请号：US11109877
申请日：2005-04-20
申请人： Cedric Loiret-Bernal , Linette Demers , Bjoern Rosner , Michael Nelson , Ray Eby , Joseph S. Fragala , Raymond Roger Shile , Hua Zhang , John Edward Bussan , Sylvain Cruchon-Dupeyrat
发明人： Cedric Loiret-Bernal , Linette Demers , Bjoern Rosner , Michael Nelson , Ray Eby , Joseph S. Fragala , Raymond Roger Shile , Hua Zhang , John Edward Bussan , Sylvain Cruchon-Dupeyrat
CPC分类号： B30B15/065 , B30B15/34 , G06K19/06028
摘要： Methods for providing pharmaceutical compositions and objects with identification regions and identification features which are difficult to detect. Microlithography, nanolithography, and stamping methods are used. The identification features can be positive protrusions or negative indentations with respect to the surface. The identification regions can comprise bar codes and holograms. DPN printing or other lithographies such as electron beam lithography, optical lithography, or nanoimprint lithography can be used to prepare stamps, which are then used to prepare the identification features. Redundant patterns can be formed. The invention is useful for counterfeit prevention. An apparatus for stamping the identification features is also described.
摘要翻译： 用于提供药物组合物和物体具有难以检测的识别区域和识别特征的方法。 使用微光刻，纳米光刻和冲压方法。 识别特征可以是相对于表面的正突起或负凹痕。 识别区域可以包括条形码和全息图。 可以使用DPN印刷或诸如电子束光刻，光刻或纳米压印光刻的其它平版印刷术来制备标记，然后将其用于制备识别特征。 可以形成冗余图案。 本发明可用于防伪。 还描述了用于冲压识别特征的装置。
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公开(公告)号：US08043652B2
公开(公告)日：2011-10-25
申请号：US11852978
申请日：2007-09-10
申请人： Raymond K. Eby , Michael Nelson , Igor Touzov
发明人： Raymond K. Eby , Michael Nelson , Igor Touzov
CPC分类号： G01Q40/00 , Y10S977/854
摘要： A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
摘要翻译： 用于将由第一SPM尖端形成的先前图案形成位置与第二SPM尖端对准的系统和方法与SPM系统组合包括识别包括第一SPM尖端的位置和SPM样本上的样本参考位置的第一位置信息，以及 将第一位置信息存储在存储区域中。 在用第二SPM尖端替换第一SPM尖端之后，识别包括第二SPM尖端的位置和SPM样本上的样本参考位置的第二位置信息。 基于第一和第二位置信息在第二SPM尖端的位置和第一SPM尖端之间计算位移，并且平移第二SPM尖端或支撑SPM样本的平台以使第二SPM尖端与 第一个SPM尖端按照计算出的位移。
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8.发明授权公开(公告)号：US07762638B2
公开(公告)日：2010-07-27
申请号：US11399621
申请日：2006-04-07
申请人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
发明人： Sylvain Cruchon-Dupeyrat , Michael Nelson , Robert Elghanian , Joseph S. Fragala , Igor Touzov , Debjyoti Banerjee
IPC分类号： B41J2/005
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Inkwells adapted for use in direct-write nanolithography and other applications including use of wells, channels, and posts. The wells can possess a geometry which matches the geometry of tips which are dipped into the inkwells. The channels can be open or closed. Hydrophilicity and hydrophobicity can be used to control ink flow. SEM can be used to characterize the inkwells. Ink flow can be monitored with video. Hydrophobic material layers can be used to prevent cross contamination. Microsyringes can be used to fill reservoirs. Satellite reservoirs can be used to prevent bubble formation.
摘要翻译： Inkwells适用于直写纳米光刻技术和其他应用，包括使用井，通道和柱。 孔可以具有与浸入墨水孔中的尖端的几何形状相匹配的几何形状。 通道可以打开或关闭。 亲水性和疏水性可用于控制油墨流动。 SEM可用于表征墨水。 墨水流量可以用视频监控。 疏水材料层可用于防止交叉污染。 微量注射器可用于填充储存器。 可以使用卫星储层来防止气泡形成。
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公开(公告)号：US20090106449A1
公开(公告)日：2009-04-23
申请号：US11875520
申请日：2007-10-19
IPC分类号： G06F15/173
CPC分类号： G06Q30/02
摘要： A method and apparatus for providing dynamic route advertisement based on IP-Sec security associations are disclosed. The method receives a notification for an establishment, a deletion or a modification of a security association for a sub-network. The method then adds or deletes a route for the sub-network based on the security association and dynamically advertises the added or deleted route to one or more peer devices. In one embodiment, the method also receives an advertisement for an added or deleted route from a peer device, identifies at least one IP-Sec client for receiving the advertisement, and establishes or deletes one or more security associations for the at least one identified IP-Sec client.
摘要翻译： 公开了一种基于IP-Sec安全关联提供动态路由广告的方法和装置。 该方法接收关于子网的安全关联的建立，删除或修改的通知。 然后，该方法基于安全关联添加或删除子网的路由，并将添加或删除的路由动态通告给一个或多个对等设备。 在一个实施例中，该方法还从对等设备接收用于添加或删除的路由的广告，识别用于接收广告的至少一个IP-Sec客户端，并且建立或删除用于所述至少一个识别的IP的一个或多个安全关联 -Sec客户端
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公开(公告)号：US20090023607A1
公开(公告)日：2009-01-22
申请号：US12116908
申请日：2008-05-07
申请人： Sergey V. Rozhok , Michael Nelson , Nabil A. Amro , Joseph S. Fragala , Raymond Roger Shile , John Edward Bussan , Dirk N. vanMerkestyn
发明人： Sergey V. Rozhok , Michael Nelson , Nabil A. Amro , Joseph S. Fragala , Raymond Roger Shile , John Edward Bussan , Dirk N. vanMerkestyn
CPC分类号： G03F7/0002 , G01Q80/00 , G03F7/70383 , G03F9/00
摘要： An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage.
摘要翻译： 一种用于制造结构并从尖端到表面沉积材料的装置，用于以直写式模式进行图案化，提供行进宏观距离并提供纳米尺度图案化的能力。 适用于小规模制造和纳米光刻。 该仪器可以紧凑，并在实验台或台式机上使用。 一种装置，包括：至少一个多轴组件，其包括多个纳米定位阶段，至少一个笔组件，其中所述笔组件和所述多轴组件适于将材料从所述笔组件传送到定位的衬底 通过多轴组件，至少一个观察组件，至少一个控制器。 通过压电方法和装置和电动机的定位是特别有用的。 该设备可以包括集成的环境室和壳体，以及用于要输送的材料的油墨储存器。 观察组件可以是具有长工作距离的显微镜。 特别适用于制造生物芯片或微阵列。 多轴组件可以是五轴组件。 软件可以促进有效的使用。
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