Abstract:
The present invention provides a dye compound and a method for preparing the same, a colorant, a photosensitive resin composition and an optical filter. As the dye compound of the present invention has an epoxy group, the dye compound can effectively prevent surface shrinkage of an optical filter while improving transmittance thereof.
Abstract:
The present invention provides an alkali-soluble resin having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current alkali-soluble resin and the photosensitive composition made of the same; and a method for preparing the same. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.
Abstract:
The present invention provides a display panel, a manufacturing method thereof, and a display device. The display panel comprises a base substrate, an opposite substrate, a first electrode, a second electrode, and a plurality of original sub-pixels on at least part of which conversion sub-pixels are provided, and an upper water layer is provided on each of the conversion sub-pixels. The conversion sub-pixel is configured to, when an electric field is generated between the first and second electrodes, shrink to one side of the original sub-pixel so that the upper water layer covers the original sub-pixel from above, and, when no electric field is generated between the first and second electrodes, cover the original sub-pixel located under the conversion sub-pixel from above.
Abstract:
A polyether compound which is as shown in Formula (I), wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.
Abstract:
A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I, wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope.
Abstract:
Composite granules of white light quantum dots and manufacture methods, manufacture devices thereof with improved stability and quantum efficiencies of quantum dots materials. The composite granules of white light quantum dots comprise: main body of the granules (1), which is a polymer obtained from light-polymerization of photoinitiator(s) and polymerizable component(s) under ultra-violet irradiation; red light quantum dots (2), green light quantum dots (3) and blue light quantum dots (4) dispersed in the main body of the granules, wherein the concentrations of the red light quantum dots (2), green light quantum dots (3) and blue light quantum dots (4) are different.
Abstract:
The present invention provides a photosensitive resin composition having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current photosensitive resin composition. The photosensitive resin composition comprising: based on the total mass of the photosensitive resin composition, 5% to 45% of an alkali-soluble resin, 5% to 40% of an unsaturated monomer having polyffunctional groups, 1% to 10% of a photoinitiator, 10% to 60% of a pigment dispersion, 0% to 5% of an addition, and 20% to 70% of a solvent. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.
Abstract:
The present invention relates to a modified epoxy acrylate and a method for producing the same, a photoresist composition and a method for producing the same, and a transparent photoresist formed from the photoresist composition. The modified epoxy acrylate is an epoxy acrylate modified with phosphate monomer which has a structure represented by Formula I wherein, n is an integer selected from 1˜21, R is a short-chain carboxylic acid ester group having the structural formula in which p is a bivalent saturated or unsaturated carbon chain having 1˜10 carbon atoms, and the carbon chain is optionally substituted by alkyl, alkenyl, hydroxy, nitro or halogen. Since the phosphate can react with the multi-valence metal in substrates so as to connect the polymer onto the substrates firmly through covalent bonds, therefore the adhesion force is improved significantly and the protective function of the tranparent photoresist is improved accordingly.
Abstract:
The present invention relates to a cyclodextrin derivative, a method for preparing the same, a photoresist composition, a color photoresist and a display device. The cyclodextrin derivative particularly is a α-cyclodextrin modified polymerizable monomer represented by the following formula I or I′, wherein k is any integer selected from 2-6, n is any integer selected from 1-3, R is an aromatic ring having 5 to 30 carbon atoms, R′ is a multivalent straight or branched carbon chain having 5 to 30 carbon atoms which may optionally be interrupted by O. The α-cyclodextrin modified polymerizable monomer can be applied to a photoresist composition which has small aberration and high transmittance, thereby improving the display quality of the display apparatus.