Diffusion plasma-assisted chemical treatment apparatus
    1.
    发明授权
    Diffusion plasma-assisted chemical treatment apparatus 失效
    扩散等离子体辅助化学处理装置

    公开(公告)号:US5105761A

    公开(公告)日:1992-04-21

    申请号:US597812

    申请日:1990-10-15

    CPC分类号: H01J37/3244 H01J37/32357

    摘要: The apparatus comprises a tight treatment enclosure (10), means (20,22) for the axial production of a carrier gas plasma, a solid plate (30) serving as an obstacle to the plasma and located perpendicular to the enclosure axis and downstream of the plasma production means, plasma diffusion means (40) located downstream of the obstacle plate, several non-ionized vector gas supply tubes (50) issuing axially into the enclosure beneath the diffusion means and all located in the same plane around the enclosure axis, a substrate carrier (56) positioned downstream of the vector gas supply tubes and perpendicular to the axis and annular pumping means (66,16) for the gaseous medium contained in the enclosure and positioned downstream of the substrate carrier.

    摘要翻译: 该设备包括紧密处理的外壳(10),用于轴向产生载气等离子体的装置(20,22),用作等离子体的障碍物并且垂直于外壳轴线定位的固体板(30) 等离子体生产装置,位于障碍板下游的等离子体扩散装置(40),几个非离子化的矢量气体供应管(50),其轴向地发射到扩散装置下方的壳体中,并且都围绕围绕轴线位于同一平面中, 位于所述向量气体供应管的下游并且垂直于所述轴线的衬底载体(56)和用于所述封装中并且位于所述衬底载体的下游的气态介质的环形泵送装置(66,16)。

    Method and apparatus for dry surface treatment of an object
    2.
    发明授权
    Method and apparatus for dry surface treatment of an object 失效
    一种物体的干表面处理方法和装置

    公开(公告)号:US6146503A

    公开(公告)日:2000-11-14

    申请号:US147463

    申请日:1999-01-04

    IPC分类号: C08J7/00 B29C59/12 H05F3/00

    CPC分类号: B29C59/12

    摘要: In this process for dry surface treatment of at least one surface portion of an object, a gas is passed through an instrument for forming excited or unstable gas species, and said surface portion is brought in front of the outlet of said device with a view to treating it with said excited or unstable gas species, the secondary gas delivered as outlet from the instrument being subsequently taken in again by the Venturi effect and reinjected into the instrument.

    摘要翻译: PCT No.PCT / FR97 / 01027 Sec。 371日期1999年1月4日 102(e)日期1999年1月4日PCT提交1997年6月10日PCT公布。 公开号WO98 / 00284 日期1998年1月8日在用于干物表面处理物体的至少一个表面部分的方法中,气体通过用于形成激发或不稳定气体物质的仪器,并且所述表面部分被带到所述 装置,以便用所述激发或不稳定的气体物质进行处理,随后从仪器出口输送的二次气体随后被文丘里效应吸入并重新注入到仪器中。

    Method for dry fluxing of metallic surfaces, before soldering or
tinning, using an atmosphere which includes water vapor
    3.
    发明授权
    Method for dry fluxing of metallic surfaces, before soldering or tinning, using an atmosphere which includes water vapor 失效
    在焊接或镀锡之前,使用包括水蒸气的气氛在金属表面进行干式助熔的方法

    公开(公告)号:US5941448A

    公开(公告)日:1999-08-24

    申请号:US984539

    申请日:1997-12-03

    IPC分类号: B23K1/20

    CPC分类号: B23K1/203

    摘要: A method for dry fluxing at least one metallic surface of an article comprising the steps of:a) passing at least one initial gas mixture comprising (1) at least one of an inert gas and a reducing gas and (2) an oxidizing gas mixture comprising water vapor into at least one apparatus for forming excited or unstable gas species, the initial gas mixture including 50 ppm to 6% water vapor;b) converting the at least one initial gas mixture to at least one primary gas mixture comprising excited or unstable gas species; andc) treating the surface to be fluxed, at a pressure close to atmospheric pressure, with a gaseous treatment atmosphere comprising excited or unstable gas species and substantially free of electrically charged species obtained from the primary gas mixture.

    摘要翻译: 一种干法熔化制品的至少一个金属表面的方法,包括以下步骤:a)使至少一种初始气体混合物通过,所述初始气体混合物包括(1)惰性气体和还原气体中的至少一种,和(2)氧化性气体混合物 将水蒸汽包含在至少一个用于形成激发或不稳定气体物质的装置中,初始气体混合物包括50ppm至6%的水蒸汽; b)将至少一种初始气体混合物转化为至少一种包含激发或不稳定气体物质的初级气体混合物; 和c)在包含激发或不稳定的气体物质并基本上不含从主气体混合物获得的带电物质的气态处理气氛下,以接近大气压的压力处理要被助熔的表面。

    Gas excitation device
    6.
    发明授权
    Gas excitation device 失效
    气体激励装置

    公开(公告)号:US5858312A

    公开(公告)日:1999-01-12

    申请号:US877914

    申请日:1997-06-18

    摘要: A gas excitation device, comprisinga gas excitation chamber comprising a gas inlet passage defining a path of gas in communication with a primary gas supply sources, an outlet passage for excited gas, a venturi-effect constriction arranged on the path of the gas between the primary supply source and the inlet passage, and at least one secondary gas supply source in communication with a region located downstream of the constriction, the gas delivered by the secondary source being entrained by venturi effect into the excitation chamber under the effect of the gas delivered by the primary source.

    摘要翻译: 一种气体激发装置,包括气体激发室,其包括气体入口通道,所述气体入口通道限定与主气体供应源连通的气体路径,用于激发气体的出口通道,布置在气体路径上的文丘里效应收缩部 主供应源和入口通道,以及与位于收缩部下游的区域连通的至少一个二次气体供应源,由二次源输送的气体在输送气体的作用下被文丘里效应带入激发室 由主要来源。

    Method and device for wave soldering incorporating a dry fluxing
operation
    7.
    发明授权
    Method and device for wave soldering incorporating a dry fluxing operation 失效
    采用干式助熔操作的波峰焊方法和装置

    公开(公告)号:US5722581A

    公开(公告)日:1998-03-03

    申请号:US655206

    申请日:1996-06-07

    摘要: A method for wave soldering a circuit having two or more faces comprising the steps of: (i) passing at least one initial gas mixture comprising at least one of an inert gas, a reducing gas and an oxidizing gas into at least one apparatus for forming excited or unstable gas species; (ii) converting the at least one initial gas mixture into at least one primary gas mixture comprising excited or unstable gas species and substantially free of electrically charged species; (iii) treating each of the two or more faces of the circuit with the at least one primary gas mixture at a pressure close to atmospheric pressure; and (iv) contacting the two or more faces of the circuit with at least one wave of a liquid soldering alloy.

    摘要翻译: 一种用于波峰焊接具有两个或更多个面的电路的方法,包括以下步骤:(i)将至少一种包含惰性气体,还原气体和氧化气体中的至少一种的初始气体混合物送入至少一个用于形成的装置 激发或不稳定的气体物种; (ii)将至少一种初始气体混合物转化成至少一种包含激发或不稳定气体物质并且基本上不带电荷的物质的主要气体混合物; (iii)在接近大气压的压力下用至少一种主要气体混合物处理电路的两个或更多个面中的每一个; 和(iv)使电路的两个或更多个面与液体焊接合金的至少一波接触。

    Process and apparatus for the dry treatment of metal surfaces
    9.
    发明授权
    Process and apparatus for the dry treatment of metal surfaces 失效
    用于干式处理金属表面的工艺和设备

    公开(公告)号:US6007637A

    公开(公告)日:1999-12-28

    申请号:US746876

    申请日:1996-11-18

    IPC分类号: C23G5/00 B08B7/04

    CPC分类号: C23G5/00

    摘要: The invention relates to a process for the dry surface treatment of at least one metal surface portion, according to which the portion is treated at a pressure close to atmospheric pressure by a gaseous treatment atmosphere comprising excited or unstable species and substantially devoid of electrically charged species, obtained from a primary gaseous mixture and if necessary an adjacent gaseous mixture, the primary gaseous mixture being obtained at the gas outlet of at least one device for the production of excited or unstable gaseous species, in which an initial gaseous mixture comprising an inert gas and/or a reducing gas and/or an oxidizing gas has been converted, the adjacent mixture not having passed through the device.

    摘要翻译: 本发明涉及一种用于干表面处理至少一个金属表面部分的方法,根据该方法,该部分在接近于大气压的压力下通过包含激发或不稳定物质的气体处理气氛进行处理,并且基本上没有带电荷的物质 从主要气体混合物获得,如果需要的话,相邻的气体混合物,在至少一个装置的气体出口处获得主要气体混合物,用于产生激发或不稳定的气态物质,其中包含惰性气体的初始气体混合物 和/或还原气体和/或氧化气体已经被转化,相邻的混合物没有通过该装置。