公开(公告)号：US20050122490A1

公开(公告)日：2005-06-09

申请号：US10729376

申请日：2003-12-08

申请人： Bernardus Luttikhuis ,  Pertrus Bartray ,  Wilhelmus Box ,  Martinus Hendrikus Leenders ,  Marc Maria Van Der Wijst

发明人： Bernardus Luttikhuis ,  Pertrus Bartray ,  Wilhelmus Box ,  Martinus Hendrikus Leenders ,  Marc Maria Van Der Wijst

IPC分类号： G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70858

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.

公开(公告)号：US20070242245A1

公开(公告)日：2007-10-18

申请号：US11730749

申请日：2007-04-03

申请人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

发明人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

公开(公告)号：US20060072087A1

公开(公告)日：2006-04-06

申请号：US10954654

申请日：2004-10-01

申请人： Jacob Frederik Klinkhamer ,  Anastasius Jacobus Bruinsma ,  Martinus Hendrikus Leenders ,  Hubert Van Mierlo

发明人： Jacob Frederik Klinkhamer ,  Anastasius Jacobus Bruinsma ,  Martinus Hendrikus Leenders ,  Hubert Van Mierlo

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F9/7084 ,  G03F9/7088

摘要： An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.

摘要翻译： 可以应用本发明的实施例来测量具有传感器的掩模上的对准区域中的特征的位置。 从设计中已知对准区域中的特征的位置。 通过将测量的特征与从设计已知的相对位置进行比较来识别测量位置的特征。 从所识别的特征的测量位置减去识别的特征的已知位置，以给出掩模的位置。

公开(公告)号：US20080007704A1

公开(公告)日：2008-01-10

申请号：US11798928

申请日：2007-05-17

申请人： Martinus Hendrikus Leenders ,  Sjoerd Donders ,  Nicolaas Kate ,  Michel Riepen ,  Sergei Shulepov

发明人： Martinus Hendrikus Leenders ,  Sjoerd Donders ,  Nicolaas Kate ,  Michel Riepen ,  Sergei Shulepov

IPC分类号： G03B27/42

CPC分类号： H01L21/0274 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.

摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。

公开(公告)号：US20060250601A1

公开(公告)日：2006-11-09

申请号：US11120186

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/58

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US20090027635A1

公开(公告)日：2009-01-29

申请号：US11862817

申请日：2007-09-27

申请人： Anthonius Martinus Cornelis Petrus DE JONG ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Antonius Johannus Van Der Net ,  Peter Franciscus Wanten ,  Jacques Cor Johan Van Der Donck ,  Robert Douglas Watso ,  Teunis Cornelis Van Den Dool ,  Nadja Schuh ,  Jan Willem Cromwijk

发明人： Anthonius Martinus Cornelis Petrus DE JONG ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Antonius Johannus Van Der Net ,  Peter Franciscus Wanten ,  Jacques Cor Johan Van Der Donck ,  Robert Douglas Watso ,  Teunis Cornelis Van Den Dool ,  Nadja Schuh ,  Jan Willem Cromwijk

IPC分类号： G03B27/42 ,  B08B17/00 ,  B08B3/10 ,  G03C5/16 ,  B08B9/00

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。

公开(公告)号：US20060087630A1

公开(公告)日：2006-04-27

申请号：US11212921

申请日：2005-08-29

申请人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

发明人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

IPC分类号： G03B27/52

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20070114451A1

公开(公告)日：2007-05-24

申请号：US11603228

申请日：2006-11-22

申请人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

发明人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

IPC分类号： G21G5/00

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20070109512A1

公开(公告)日：2007-05-17

申请号：US11274888

申请日：2005-11-16

申请人： Nicolaas Kate ,  Nicolaas Kemper ,  Martinus Hendrikus Leenders ,  Joost Ottens ,  Johannes Smeulers

发明人： Nicolaas Kate ,  Nicolaas Kemper ,  Martinus Hendrikus Leenders ,  Joost Ottens ,  Johannes Smeulers

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A barrier member is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly on a bottom surface which faces the substrate. The extractor assembly includes a plate which splits the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and a meniscus is formed in a lower channel between the plate and the substrate.

摘要翻译： 公开了用于浸没式光刻技术的阻挡构件。 阻挡构件包括在底表面上面向衬底的提取器组件。 提取器组件包括一个板，它将液体移除装置和基板之间的空间分成两部分，使得在液体移除装置和板之间的上部通道中形成弯液面，并且弯曲面形成在板之间的下部通道中 和基板。

公开(公告)号：US20050218342A1

公开(公告)日：2005-10-06

申请号：US10813682

申请日：2004-03-31

申请人： Engelbertus Antonius Van Der Pasch ,  Marcel Hendrikus Beems ,  Martinus Hendrikus Leenders

发明人： Engelbertus Antonius Van Der Pasch ,  Marcel Hendrikus Beems ,  Martinus Hendrikus Leenders

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70575 ,  G03F7/7005

摘要： A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support a patterning device, the patterning device is configured to impart the radiation with a pattern in its cross-section. A substrate table is configured to hold a substrate, and a projection system is configured to project the patterned radiation onto a target portion of a substrate. The first wavelength range is the primary wavelength of the lithographic apparatus. The second wavelength range is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.

摘要翻译： 光刻设备包括被配置为向照明系统提供辐射的辐射源，所述辐射源被配置为提供在第一波长范围内且在第二波长范围内的第二波长范围与第一波长范围不同的辐射。 支撑件被构造成支撑图案形成装置，图案形成装置被配置成在其横截面中赋予辐射图案。 衬底台被配置为保持衬底，并且投影系统被配置为将图案化的辐射投影到衬底的目标部分上。 第一波长范围是光刻设备的主要波长。 第二波长范围用于光刻设备的设置，该设置包括校准，鉴定，性能测试和对准中的一个或多个。 第二波长范围也可以用于另外的基底的曝光。