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公开(公告)号：US20100062282A1
公开(公告)日：2010-03-11
申请号：US12208095
申请日：2008-09-10
申请人： Bing K. Yen , Jim Hennessey , Eric Freeman , Kim Yang Lee , David S. Kuo , Mark Ostrowski
发明人： Bing K. Yen , Jim Hennessey , Eric Freeman , Kim Yang Lee , David S. Kuo , Mark Ostrowski
摘要： The invention relates to bit patterned recording media having a stop layer for chemical mechanical polishing. One embodiment of the present invention is a method of manufacturing a magnetic recording medium comprising the step of planarizing by chemical mechanical polishing until the stop layer is reached. The present invention also provides a magnetic recording medium having a stop layer.
摘要翻译： 本发明涉及具有用于化学机械抛光的停止层的位图形记录介质。 本发明的一个实施例是一种制造磁记录介质的方法，包括通过化学机械抛光进行平面化的步骤，直到达到停止层。 本发明还提供一种具有停止层的磁记录介质。
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公开(公告)号：US08900655B2
公开(公告)日：2014-12-02
申请号：US11542129
申请日：2006-10-04
申请人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
发明人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
CPC分类号： G11B5/732 , G11B5/656 , G11B5/7325 , G11B5/855
摘要： A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.
摘要翻译： 制造图案化的垂直磁记录介质的方法包括以下步骤：（a）提供包括磁软底层（“SUL”）和上覆非磁性中间层的层堆叠; （b）在非磁性中间层上形成掩模层; （c）在掩模层上形成抗蚀剂层; （d）形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; （e）将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和（f）至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。
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公开(公告)号：US20080085362A1
公开(公告)日：2008-04-10
申请号：US11542129
申请日：2006-10-04
申请人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
发明人： Bing K. Yen , David S. Kuo , Dieter K. Weller , Kim Y. Lee , Koichi Wago
CPC分类号： G11B5/732 , G11B5/656 , G11B5/7325 , G11B5/855
摘要： A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer (“SUL”) and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.
摘要翻译： 制造图案化的垂直磁记录介质的方法包括以下步骤：（a）提供包括磁软底层（“SUL”）和上覆非磁性中间层的层堆叠; （b）在非磁性中间层上形成掩模层; （c）在掩模层上形成抗蚀剂层; （d）形成延伸穿过抗蚀剂层并露出掩模层的间隔开的表面部分的凹陷图案; （e）将凹槽的图案延伸穿过掩模层以暴露中间层的间隔开的表面部分; 和（f）至少部分地用磁性硬的材料填充凹槽的图案以形成垂直的磁记录层。
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4.发明申请Multilevel nonvolatile memory device containing a carbon storage material and methods of making and using same 有权含有碳储存材料的多层非易失性存储器件及其制造和使用方法公开(公告)号：US20090257265A1
公开(公告)日：2009-10-15
申请号：US12153872
申请日：2008-05-27
申请人： Xiying Chen , Bing K. Yen , Dat Nguyen , Huiwen Xu , George Samachisa , Tanmay Kumar , Er-Xuan Ping
发明人： Xiying Chen , Bing K. Yen , Dat Nguyen , Huiwen Xu , George Samachisa , Tanmay Kumar , Er-Xuan Ping
CPC分类号： G11C11/56 , B82Y10/00 , G11C13/00 , G11C13/0069 , G11C13/025 , G11C2013/009 , G11C2213/35 , G11C2213/72 , G11C2213/79 , H01L27/2409 , H01L27/2463 , H01L45/04 , H01L45/1233 , H01L45/124 , H01L45/149 , H01L45/1616 , H01L45/1675
摘要： A nonvolatile memory cell includes a steering element located in series with a storage element. The storage element includes a carbon material and the memory cell includes a rewritable cell having multiple memory levels.
摘要翻译： 非易失性存储单元包括与存储元件串联定位的转向元件。 存储元件包括碳材料，并且存储单元包括具有多个存储器级别的可重写单元。
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5.发明授权Energy gradient ion beam deposition of carbon overcoats on rigid disk media for magnetic recordings 失效用于磁记录的刚性盘介质上的碳覆盖层的能量梯度离子束沉积公开(公告)号：US06902773B1
公开(公告)日：2005-06-07
申请号：US09721264
申请日：2000-11-21
IPC分类号： C23C14/06 , C23C14/48 , C23C16/26 , G11B5/012 , G11B5/72 , G11B5/82 , G11B5/84 , B05D5/00 , B05D3/06 , C23C14/46
CPC分类号： C23C14/0605 , C23C14/48 , C23C16/26 , G11B5/012 , G11B5/72 , G11B5/82 , G11B5/8408 , Y10T428/265
摘要： The fabrication of an overcoat layer starts with a low energy ion beam to avoid magnetic layer implantation problems, followed by higher deposition energies where the higher energy atoms are implanted into the previously formed lower energy overcoat layer, rather than the magnetic layer. The energy gradient ion beam deposition process therefore results in a thin overcoat layer that is denser than a comparable layer formed by low energy magnetron sputtering, and which overcoat layer provides good mechanical and corrosion protection to the magnetic layer.
摘要翻译： 外涂层的制造从低能离子束开始，以避免磁层注入问题，随后是较高的沉积能量，其中较高的能原子被注入到先前形成的较低能量外涂层而不是磁性层中。 因此，能量梯度离子束沉积过程导致比通过低能量磁控溅射形成的可比较层更致密的薄的外涂层，并且该外涂层为磁性层提供良好的机械和腐蚀保护。
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公开(公告)号：US20100167502A1
公开(公告)日：2010-07-01
申请号：US12318590
申请日：2008-12-31
申请人： Bing K. Yen , Chun-Ming Wang , Yung-Tin Chen , Steven Maxwell
发明人： Bing K. Yen , Chun-Ming Wang , Yung-Tin Chen , Steven Maxwell
IPC分类号： H01L21/36 , H01L21/467
CPC分类号： H01L21/32139 , H01L21/0337 , H01L21/3086 , H01L27/101 , H01L27/1021
摘要： A method of making a device is disclosed including: forming a first hard mask layer over an underlying layer; forming a first imprint resist layer over the underlying layer; forming first features over the first hard mask layer by bringing a first imprint template in contact with the first imprint resist layer; forming a first spacer layer over the first features; etching the first spacer layer to form a first spacer pattern and to expose top of the first features; removing the first features; patterning the first hard mask, using the first spacer pattern as a mask, to form first hard mask features; and etching at least part of the underlying layer using the first hard mask features as a mask.
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公开(公告)号：US20100055346A1
公开(公告)日：2010-03-04
申请号：US12202554
申请日：2008-09-02
申请人： Bing K. Yen , Jianwei Liu
发明人： Bing K. Yen , Jianwei Liu
摘要： The invention relates to a method of depositing a release layer on a Ni surface for use in nano-imprint lithography comprising passivating the Ni surface, etching the passivated Ni surface, and depositing a layer of fluorocarbon on the passivated and etched surface.
摘要翻译： 本发明涉及一种在Ni表面上沉积剥离层的方法，用于纳米压印光刻中，包括钝化Ni表面，蚀刻钝化的Ni表面，以及在钝化和蚀刻的表面上沉积一层碳氟化合物。
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8.发明授权Energy gradient ion beam deposition of carbon overcoats on rigid disk media for magnetic recordings 失效用于磁记录的刚性盘介质上的碳覆盖层的能量梯度离子束沉积公开(公告)号：US07018729B2
公开(公告)日：2006-03-28
申请号：US10611240
申请日：2003-06-30
IPC分类号： G11B5/72
CPC分类号： C23C14/0605 , C23C14/48 , C23C16/26 , G11B5/012 , G11B5/72 , G11B5/82 , G11B5/8408 , Y10T428/265
摘要： The fabrication of the overcoat layer starts with a low energy ion beam to avoid magnetic layer implantation problems, followed by higher deposition energies where the higher energy atoms are implanted into the previously formed lower energy overcoat layer, rather than the magnetic layer. The energy gradient ion beam deposition process therefore results in a thin overcoat layer that is denser than a comparable layer formed by low energy magnetron sputtering, and which overcoat layer provides good mechanical and corrosion protection to the magnetic layer, without degrading the magnetic properties of the magnetic layer.
摘要翻译： 外涂层的制造以低能离子束开始，以避免磁层注入问题，随后是更高的沉积能量，其中较高的能原子被注入到先前形成的较低能量外涂层而不是磁性层中。 因此，能量梯度离子束沉积过程导致比由低能量磁控管溅射形成的可比层更致密的薄的外涂层，并且该外涂层为磁性层提供良好的机械和腐蚀保护，而不降低磁性能 磁性层。
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公开(公告)号：US06969447B2
公开(公告)日：2005-11-29
申请号：US10756556
申请日：2004-01-12
CPC分类号： C23C14/345 , C23C14/0658 , G11B5/012 , G11B5/72 , G11B5/82 , G11B5/8408 , H01F41/32
摘要： A method for sputtering a thin film protective layer with improved durability is disclosed. The method reduces kinetic energy of the ions of the overcoat material during the initial period of deposition to form a buffering interface which reduces the interpenetration of the atoms of the protective layer into the underlying film. In the method of the invention the sputtering of the overcoat preferably begins with zero (or very low) voltage applied to the underlying film resulting in minimal ion implantation in the underlying film. The “high energy” phase of the process begins with increases in the magnitude of the negative bias voltage applied to the underlying film. The higher energy imparted to ions in the plasma result in a denser and harder film being formed over the initial buffer layer. The protective layer preferably comprises carbon and nitrogen.
摘要翻译： 公开了一种用于溅射具有改善的耐久性的薄膜保护层的方法。 该方法在初始沉积期间降低外涂层材料的离子的动能，形成缓冲界面，从而减少保护层原子相互渗透到下面的膜中。 在本发明的方法中，外涂层的溅射优选以施加到下面的膜的零（或非常低的）电压开始，导致在底层膜中的最小离子注入。 该过程的“高能”阶段从施加到底层薄膜的负偏置电压的大小的增加开始。 在等离子体中赋予离子的较高能量导致在初始缓冲层上形成更致密和更硬的膜。 保护层优选包含碳和氮。
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公开(公告)号：US06586070B1
公开(公告)日：2003-07-01
申请号：US10119328
申请日：2002-04-08
IPC分类号： G11B572
CPC分类号： G11B5/72 , G11B5/82 , G11B5/8408 , G11B2005/001
摘要： A overcoat layer of TiSixNy for use on a magnetic thin film disk is disclosed. The overcoat of the invention has high hardness, provides corrosion protection and has low surface energy which reduces contaminant attraction. The TiSixNy film is conductive and, therefore, reduces the deleterious effects of tribocharging.
摘要翻译： 公开了用于磁性薄膜盘上的TiSixNy的外涂层。 本发明的外涂层具有高硬度，提供防腐蚀和低表面能，减少了污染物的吸引。 TiSixNy膜是导电的，因此减少摩擦带电的有害影响。
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