公开(公告)号：US20060046167A1

公开(公告)日：2006-03-02

申请号：US10933090

申请日：2004-09-01

申请人： Bo Wu ,  Abdurrahman Sezginer ,  Franz Zach

发明人： Bo Wu ,  Abdurrahman Sezginer ,  Franz Zach

IPC分类号： G03C5/00

CPC分类号： G03F7/70941 ,  G03F1/44 ,  G03F7/70591

摘要： Flare of an imaging system is measured using resist by employing the imaging system to directly expose a first part of the resist at an image plane of the imaging system to a first dose of radiation and to indirectly expose a second part of the resist as a result of flare. The imaging system exposes the second part of the resist to a second dose of radiation. Flare of the imaging system is determined from a pattern that is formed in the second part of the resist.

摘要翻译： 使用抗蚀剂通过使用成像系统将成像系统的图像平面处的抗蚀剂的第一部分直接暴露于第一剂量的辐射并且间接暴露抗蚀剂的第二部分来测量成像系统的耀斑，结果 的耀斑。 成像系统将抗蚀剂的第二部分暴露于第二剂量的辐射。 从形成在抗蚀剂的第二部分的图案确定成像系统的光斑。

公开(公告)号：US20060072097A1

公开(公告)日：2006-04-06

申请号：US10960357

申请日：2004-10-06

申请人： Franz Zach ,  Bo Wu ,  Abdurrahman Sezginer

发明人： Franz Zach ,  Bo Wu ,  Abdurrahman Sezginer

IPC分类号： G03B27/72

CPC分类号： G03B27/72 ,  G03F7/70133

摘要： Pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image plane, and exposing the image field of the detector with a bright feature, resulting in a cumulative exposure of the image field of the detector from the two exposures. A characteristic of a spatial pattern in the cumulative exposure of the image field of the detector is then determined.

摘要翻译： 成像系统的瞳孔强度分布通过用具有明亮特征的放射线检测器的图像场曝光来测量，将检测器定位在远离图像平面的距离处，并且用明亮特征曝光检测器的图像场，导致 来自两次曝光的检测器的图像场的累积曝光。 然后确定检测器的图像场的累积曝光中的空间图案的特性。

公开(公告)号：US20060048091A1

公开(公告)日：2006-03-02

申请号：US10933192

申请日：2004-09-01

申请人： Devendra Joshi ,  Abdurrahman Sezginer ,  Franz Zach

发明人： Devendra Joshi ,  Abdurrahman Sezginer ,  Franz Zach

IPC分类号： G06F17/50 ,  G03F1/00 ,  G21K5/00

CPC分类号： G03F1/36

摘要： A method and system for reducing the computation time required to apply position-dependent corrections to lithography, usually mask, data is disclosed. Optical proximity or process corrections are determined for a few instances of a repeating cluster or object, usually at widely separated locations and then interpolating the corrections to the other instances of the repeating cluster based on their positions in the exposure field. Or, optical proximity corrections can be applied to the repeating cluster of objects for different values of flare intensity, or another parameter of patterning imperfection, such as by calculating the value of the flare at the location of each instance of the repeating cluster, and interpolating the optical proximity corrections to those values of flare.

摘要翻译： 公开了一种用于减少对光刻应用位置相关校正所需的计算时间的方法和系统，通常是屏蔽数据。 通常在广泛分离的位置处对重复的簇或对象的几个实例确定光学邻近度或过程校正，然后基于它们在曝光区域中的位置将校正内插到重复簇的其他实例。 或者，可以将光学邻近校正应用于不同的闪光强度值的对象的重复簇或者图案化缺陷的另一参数，例如通过计算重复簇的每个实例的位置处的闪光的值，以及内插 光学接近度校正到这些闪光值。

公开(公告)号：US20060268254A1

公开(公告)日：2006-11-30

申请号：US11141803

申请日：2005-05-31

申请人： Gokhan Percin ,  Abdurrahman Sezginer ,  Franz Zach

发明人： Gokhan Percin ,  Abdurrahman Sezginer ,  Franz Zach

IPC分类号： G03B27/72

CPC分类号： G03F7/7025 ,  G03F7/70591

摘要： An apparatus and method for characterizing an illumination pupil of an exposure tool comprises forming a plurality of pinhole test patterns at a plurality of test site locations to facilitate locating test pattern edges for extracting therefrom the illumination pupil characteristics of the exposure tool.

摘要翻译： 用于表征曝光工具的照明光瞳的装置和方法包括在多个测试位置处形成多个针孔测试图案，以便于定位测试图案边缘以从其中提取曝光工具的照明光瞳特性。

公开(公告)号：US20060073686A1

公开(公告)日：2006-04-06

申请号：US10971350

申请日：2004-10-22

申请人： Franz Zach ,  Abdurrahman Sezginer ,  Gokhan Percin

发明人： Franz Zach ,  Abdurrahman Sezginer ,  Gokhan Percin

IPC分类号： H01L21/22

CPC分类号： G03B27/72 ,  G03F7/70441 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641

摘要： First and second exposures of a mask onto a wafer are performed such that the exposure field of the second exposure partially overlaps the exposure field of the first exposure. A characteristic of a set of features is determined, and a value of a parameter of an optical proximity correction model is determined. An alignment feature can be used to align a measurement tool. In yet another embodiment, pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image plane, and exposing the image field of the detector with a bright feature, resulting in a cumulative exposure of the image field of the detector from the two exposures. A characteristic of a spatial pattern in the cumulative exposure of the image field of the detector is then determined.

公开(公告)号：US20070143733A1

公开(公告)日：2007-06-21

申请号：US11541921

申请日：2006-10-02

申请人： Franz Zach ,  Jesus Carrero ,  Bayram Yenikaya ,  Gokhan Percin ,  Xuelong Cao ,  Abdurrahman Sezginer

发明人： Franz Zach ,  Jesus Carrero ,  Bayram Yenikaya ,  Gokhan Percin ,  Xuelong Cao ,  Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.

摘要翻译： 一种用于从给定目标布局合成光掩模数据集的方法，包括以下步骤：（a）为目标布局提供一组目标多边形; （b）将平滑曲线拟合到所述目标多边形集合的目标多边形，所述曲线具有一组蚀刻目标点; （c）根据蚀刻工艺的模型移动蚀刻目标点以产生一组光刻目标点; 以及（d）基于光刻工艺的模型和所述一组光刻目标点合成光掩模数据集。

公开(公告)号：US20060266243A1

公开(公告)日：2006-11-30

申请号：US11139551

申请日：2005-05-31

申请人： Gokhan Percin ,  Ram Ramanujam ,  Franz Zach ,  Abdurrahman Sezginer ,  Chi-Song Horng ,  Roy Prasad

发明人： Gokhan Percin ,  Ram Ramanujam ,  Franz Zach ,  Abdurrahman Sezginer ,  Chi-Song Horng ,  Roy Prasad

IPC分类号： B41F33/00 ,  B41F1/54

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/44 ,  G03F1/68

摘要： A method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips. More particularly, a method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips based on the parameters of test patterns measured at the “wafer sweet spots” so as to arrive at an accurate model.

摘要翻译： 提供了一种产生OPC模型的方法，其考虑了在制造半导体芯片的过程中发生的跨晶片变化。 更具体地，提供了一种用于生成OPC模型的方法，其考虑了在基于在“晶片甜点”处测量的测试图案的参数的制造半导体芯片的过程期间发生的跨晶片变化，以便到达 准确模型。

公开(公告)号：US07277165B2

公开(公告)日：2007-10-02

申请号：US10860853

申请日：2004-06-04

申请人： Bo Wu ,  Abdurrahman Sezginer

发明人： Bo Wu ,  Abdurrahman Sezginer

IPC分类号： G01N21/00

CPC分类号： G03F7/70941 ,  G03F1/44 ,  G03F7/70591

摘要： A method of measuring flare in an optical lithographic system utilizes an exposure mask with first and second discrete opaque features each having rotational symmetry of order greater than four and of different respective areas. The exposure mask is positioned in the lithographic system such that actinic radiation emitted by the lithographic system illuminates the sensitive surface of an exposure target through the exposure mask. The extent to which regions of the sensitive surface that are within the geometric image of a feature of the exposure mask are exposed to actinic radiation during due to flare is measured.

摘要翻译： 一种在光学平版印刷系统中测量光斑的方法利用具有第一和第二离散不透明特征的曝光掩模，每个不透明特征具有大于四的旋转对称性以及不同的相应区域。 曝光掩模位于光刻系统中，使得由光刻系统发射的光化辐射通过曝光掩模照射曝光目标的敏感表面。 测量在曝光掩模的特征的几何图像内的敏感表面的区域在由于耀斑期间暴露于光化辐射的程度。

公开(公告)号：US20050270523A1

公开(公告)日：2005-12-08

申请号：US10860853

申请日：2004-06-04

申请人： Bo Wu ,  Abdurrahman Sezginer

发明人： Bo Wu ,  Abdurrahman Sezginer

IPC分类号： G01N21/88 ,  G03F1/14 ,  G03F7/20

CPC分类号： G03F7/70941 ,  G03F1/44 ,  G03F7/70591

摘要： A method of measuring flare in an optical lithographic system utilizes an exposure mask with first and second discrete opaque features each having rotational symmetry of order greater than four and of different respective areas. The exposure mask is positioned in the lithographic system such that actinic radiation emitted by the lithographic system illuminates the sensitive surface of an exposure target through the exposure mask. The extent to which regions of the sensitive surface that are within the geometric image of a feature of the exposure mask are exposed to actinic radiation during due to flare is measured.

摘要翻译： 一种在光学平版印刷系统中测量光斑的方法利用具有第一和第二离散不透明特征的曝光掩模，每个不透明特征具有大于四的旋转对称性以及不同的相应区域。 曝光掩模位于光刻系统中，使得由光刻系统发射的光化辐射通过曝光掩模照射曝光目标的敏感表面。 测量在曝光掩模的特征的几何图像内的敏感表面的区域在由于耀斑期间暴露于光化辐射的程度。

公开(公告)号：US07189481B2

公开(公告)日：2007-03-13

申请号：US10933090

申请日：2004-09-01

申请人： Bo Wu ,  Abdurrahman Sezginer ,  Franz X. Zach

发明人： Bo Wu ,  Abdurrahman Sezginer ,  Franz X. Zach

IPC分类号： G03F9/00

CPC分类号： G03F7/70941 ,  G03F1/44 ,  G03F7/70591

摘要： Flare of an imaging system is measured using resist by employing the imaging system to directly expose a first part of the resist at an image plane of the imaging system to a first dose of radiation and to indirectly expose a second part of the resist as a result of flare. The imaging system exposes the second part of the resist to a second dose of radiation. Flare of the imaging system is determined from a pattern that is formed in the second part of the resist.

摘要翻译： 使用抗蚀剂通过使用成像系统将成像系统的图像平面处的抗蚀剂的第一部分直接暴露于第一剂量的辐射并且间接暴露抗蚀剂的第二部分来测量成像系统的耀斑，结果 的耀斑。 成像系统将抗蚀剂的第二部分暴露于第二剂量的辐射。 从形成在抗蚀剂的第二部分的图案确定成像系统的光斑。