Technique for Monitoring and Controlling a Plasma Process
    1.
    发明申请
    Technique for Monitoring and Controlling a Plasma Process 失效
    监测和控制等离子体工艺技术

    公开(公告)号:US20070227231A1

    公开(公告)日:2007-10-04

    申请号:US11678524

    申请日:2007-02-23

    IPC分类号: G01N27/26 G01N33/00

    CPC分类号: H01J37/32422 H01J37/32935

    摘要: A time-of-flight ion sensor for monitoring ion species in a plasma includes a housing. A drift tube is positioned in the housing. An extractor electrode is positioned in the housing at a first end of the drift tube so as to attract ions from the plasma. A plurality of electrodes is positioned at a first end of the drift tube proximate to the extractor electrode. The plurality of electrodes is biased so as to cause at least a portion of the attracted ions to enter the drift tube and to drift towards a second end of the drift tube. An ion detector is positioned proximate to the second end of the drift tube. The ion detector detects arrival times associated with the at least the portion of the attracted ions.

    摘要翻译: 用于监测等离子体中的离子种类的飞行时间离子传感器包括壳体。 漂移管位于外壳中。 提取器电极位于漂移管的第一端处的壳体中,以便从等离子体吸引离子。 多个电极位于漂移管的靠近提取器电极的第一端。 多个电极被偏置,以使至少一部分吸引的离子进入漂移管并漂移到漂移管的第二端。 离子检测器位于漂移管的第二端附近。 离子检测器检测与吸引的离子的至少一部分相关联的到达时间。

    Technique for monitoring and controlling a plasma process
    2.
    发明申请
    Technique for monitoring and controlling a plasma process 失效
    监测和控制等离子体工艺的技术

    公开(公告)号:US20070210248A1

    公开(公告)日:2007-09-13

    申请号:US11371907

    申请日:2006-03-10

    IPC分类号: H01J49/40

    CPC分类号: H01J49/40 H01J37/32935

    摘要: An in-situ ion sensor is disclosed for monitoring ion species in a plasma chamber. The ion sensor may comprise: a drift tube; an extractor electrode and a plurality of electrostatic lenses disposed at a first end of the drift tube, wherein the extractor electrode is biased to attract ions from a plasma in the plasma chamber, and wherein the plurality of electrostatic lenses cause at least one portion of the attracted ions to enter the drift tube and drift towards a second end of the drift tube within a limited divergence angle; an ion detector disposed at the second end of the drift tube, wherein the ion detector detects arrival times associated with the at least one portion of the attracted ions; and a housing for the extractor, the plurality of electrostatic lenses, the drift tube, and the ion detector, wherein the housing accommodates differential pumping between the ion sensor and the plasma chamber.

    摘要翻译: 公开了用于监测等离子体室中的离子种类的原位离子传感器。 离子传感器可以包括:漂移管; 提取器电极和设置在漂移管的第一端处的多个静电透镜,其中所述提取器电极被偏置以从所述等离子体室中的等离子体吸引离子,并且其中所述多个静电透镜引起所述静电透镜的至少一部分 吸引离子进入漂移管并在有限的发散角内漂移到漂移管的第二端; 设置在所述漂移管的第二端处的离子检测器,其中所述离子检测器检测与所述吸引离子的所述至少一部分相关联的到达时间; 以及用于提取器,多个静电透镜,漂移管和离子检测器的壳体,其中壳体容纳离子传感器和等离子体室之间的差分泵浦。

    Technique for Monitoring and Controlling A PLasma Process
    3.
    发明申请
    Technique for Monitoring and Controlling A PLasma Process 审中-公开
    监测和控制PLasma过程的技术

    公开(公告)号:US20090283670A1

    公开(公告)日:2009-11-19

    申请号:US12272537

    申请日:2008-11-18

    IPC分类号: B01D59/44 H01J49/00

    CPC分类号: H01J37/32422 H01J37/32935

    摘要: A time-of-flight ion sensor for monitoring ion species in a plasma includes a housing. A drift tube is positioned in the housing. An extractor electrode is positioned in the housing at a first end of the drift tube so as to attract ions from the plasma. A plurality of electrodes is positioned at a first end of the drift tube proximate to the extractor electrode. The plurality of electrodes is biased so as to selectively attract ions to enter the drift tube and to drift towards a second end of the drift tube. An ion detector is positioned proximate to the second end of the drift tube. The ion detector detects arrival times associated with the at least the portion of the attracted ions.

    摘要翻译: 用于监测等离子体中的离子种类的飞行时间离子传感器包括壳体。 漂移管位于外壳中。 提取器电极位于漂移管的第一端处的壳体中,以便从等离子体吸引离子。 多个电极位于漂移管的靠近提取器电极的第一端。 多个电极被偏置以选择性地吸引离子进入漂移管并漂移到漂移管的第二端。 离子检测器位于漂移管的第二端附近。 离子检测器检测与吸引的离子的至少一部分相关联的到达时间。

    Technique for monitoring and controlling a plasma process
    4.
    发明授权
    Technique for monitoring and controlling a plasma process 失效
    监测和控制等离子体工艺的技术

    公开(公告)号:US07476849B2

    公开(公告)日:2009-01-13

    申请号:US11371907

    申请日:2006-03-10

    IPC分类号: H01J49/40 G01N27/26 G01N33/00

    CPC分类号: H01J49/40 H01J37/32935

    摘要: An in-situ ion sensor is disclosed for monitoring ion species in a plasma chamber. The ion sensor may comprise: a drift tube; an extractor electrode and a plurality of electrostatic lenses disposed at a first end of the drift tube, wherein the extractor electrode is biased to attract ions from a plasma in the plasma chamber, and wherein the plurality of electrostatic lenses cause at least one portion of the attracted ions to enter the drift tube and drift towards a second end of the drift tube within a limited divergence angle; an ion detector disposed at the second end of the drift tube, wherein the ion detector detects arrival times associated with the at least one portion of the attracted ions; and a housing for the extractor, the plurality of electrostatic lenses, the drift tube, and the ion detector, wherein the housing accommodates differential pumping between the ion sensor and the plasma chamber.

    摘要翻译: 公开了用于监测等离子体室中的离子种类的原位离子传感器。 离子传感器可以包括:漂移管; 提取器电极和设置在漂移管的第一端处的多个静电透镜,其中所述提取器电极被偏置以从所述等离子体室中的等离子体吸引离子,并且其中所述多个静电透镜引起所述静电透镜的至少一部分 吸引离子进入漂移管并在有限的发散角内漂移到漂移管的第二端; 设置在所述漂移管的第二端处的离子检测器,其中所述离子检测器检测与所述吸引离子的所述至少一部分相关联的到达时间; 以及用于提取器,多个静电透镜,漂移管和离子检测器的壳体,其中壳体容纳离子传感器和等离子体室之间的差分泵浦。

    Technique for monitoring and controlling a plasma process
    5.
    发明授权
    Technique for monitoring and controlling a plasma process 失效
    监测和控制等离子体工艺的技术

    公开(公告)号:US07453059B2

    公开(公告)日:2008-11-18

    申请号:US11678524

    申请日:2007-02-23

    IPC分类号: G01N27/26 G01N33/00 H01J49/40

    CPC分类号: H01J37/32422 H01J37/32935

    摘要: A time-of-flight ion sensor for monitoring ion species in a plasma includes a housing. A drift tube is positioned in the housing. An extractor electrode is positioned in the housing at a first end of the drift tube so as to attract ions from the plasma. A plurality of electrodes is positioned at a first end of the drift tube proximate to the extractor electrode. The plurality of electrodes is biased so as to cause at least a portion of the attracted ions to enter the drift tube and to drift towards a second end of the drift tube. An ion detector is positioned proximate to the second end of the drift tube. The ion detector detects arrival times associated with the at least the portion of the attracted ions.

    摘要翻译: 用于监测等离子体中的离子种类的飞行时间离子传感器包括壳体。 漂移管位于外壳中。 提取器电极位于漂移管的第一端处的壳体中,以便从等离子体吸引离子。 多个电极位于漂移管的靠近提取器电极的第一端。 多个电极被偏置,以使至少一部分吸引的离子进入漂移管并漂移到漂移管的第二端。 离子检测器位于漂移管的第二端附近。 离子检测器检测与吸引的离子的至少一部分相关联的到达时间。

    Technique and apparatus for monitoring ion mass, energy, and angle in processing systems
    6.
    发明授权
    Technique and apparatus for monitoring ion mass, energy, and angle in processing systems 有权
    用于监控处理系统中离子质量,能量和角度的技术和设备

    公开(公告)号:US08698107B2

    公开(公告)日:2014-04-15

    申请号:US12987950

    申请日:2011-01-10

    IPC分类号: H01J37/30

    摘要: A time-of-flight (TOF) ion sensor system for monitoring an angular distribution of ion species having an ion energy and incident on a substrate includes a drift tube wherein the ion sensor system is configured to vary an angle of the drift tube with respect to a plane of the substrate. The drift tube may have a first end configured to receive a pulse of ions from the ion species wherein heavier ions and lighter ions of the pulse of ions arrive in packets at a second end of the drift tube. An ion detector may be disposed at the second end of the ion sensor, wherein the ion detector is configured to detect the packets of ions derived from the pulse of ions and corresponding to respective different ion masses.

    摘要翻译: 用于监测具有离子能并入射在衬底上的离子种类的角分布的飞行时间(TOF)离子传感器系统包括漂移管,其中离子传感器系统被配置为相对于漂移管的角度改变 到基板的平面。 漂移管可以具有构造成从离子物质接收离子脉冲的第一端,其中离子脉冲的较重离子和较轻离子在漂移管的第二端处分组到达。 离子检测器可以设置在离子传感器的第二端处,其中离子检测器被配置为检测源自离子脉冲的离子的分组并且对应于各个不同的离子质量。

    TECHNIQUE AND APPARATUS FOR MONITORING ION MASS, ENERGY, AND ANGLE IN PROCESSING SYSTEMS
    7.
    发明申请
    TECHNIQUE AND APPARATUS FOR MONITORING ION MASS, ENERGY, AND ANGLE IN PROCESSING SYSTEMS 有权
    用于监控处理系统中离子质量,能量和角度的技术和装置

    公开(公告)号:US20120175518A1

    公开(公告)日:2012-07-12

    申请号:US12987950

    申请日:2011-01-10

    IPC分类号: H01J49/00

    摘要: A time-of-flight (TOF) ion sensor system for monitoring an angular distribution of ion species having an ion energy and incident on a substrate includes a drift tube wherein the ion sensor system is configured to vary an angle of the drift tube with respect to a plane of the substrate. The drift tube may have a first end configured to receive a pulse of ions from the ion species wherein heavier ions and lighter ions of the pulse of ions arrive in packets at a second end of the drift tube. An ion detector may be disposed at the second end of the ion sensor, wherein the ion detector is configured to detect the packets of ions derived from the pulse of ions and corresponding to respective different ion masses.

    摘要翻译: 用于监测具有离子能并入射在衬底上的离子种类的角分布的飞行时间(TOF)离子传感器系统包括漂移管,其中离子传感器系统被配置为相对于漂移管的角度改变 到基板的平面。 漂移管可以具有构造成从离子物质接收离子脉冲的第一端,其中离子脉冲的较重离子和较轻离子在漂移管的第二端处分组到达。 离子检测器可以设置在离子传感器的第二端处,其中离子检测器被配置为检测源自离子脉冲的离子的分组并且对应于各个不同的离子质量。

    Plasma Potential Modulated ION Implantation Apparatus
    8.
    发明申请
    Plasma Potential Modulated ION Implantation Apparatus 审中-公开
    等离子体电位调制离子注入装置

    公开(公告)号:US20130287963A1

    公开(公告)日:2013-10-31

    申请号:US13457455

    申请日:2012-04-26

    IPC分类号: C23C14/48

    摘要: An ion implantation apparatus including a first plasma chamber, a second plasma chamber and an extraction electrode disposed therebetween. The first and second plasma chambers configured to house respective plasmas in response to the introduction of a different feed gases therein. The extraction electrode is electrically isolated from the plasma chamber. An extraction voltage is applied to the first plasma chamber above a bias potential used to generate the plasma therein. The extraction voltage drives the plasma potential to accelerate the ions in the first plasma to a desired implant energy. The accelerated ions pass through an aperture in the extraction electrode and are directed toward a substrate housed within the second plasma chamber for implantation.

    摘要翻译: 一种离子注入装置,包括第一等离子体室,第二等离子体室和设置在其间的提取电极。 第一和第二等离子体室被配置为响应于其中引入不同的进料气体来容纳各个等离子体。 提取电极与等离子体室电隔离。 提供电压施加到第一等离子体室以上用于在其中产生等离子体的偏置电位。 提取电压驱动等离子体电位以将第一等离子体中的离子加速到期望的注入能量。 加速离子通过引出电极中的孔,并且被引向容纳在第二等离子体室内用于注入的衬底。

    BIASING SYSTEM FOR A PLASMA PROCESSING APPARATUS
    10.
    发明申请
    BIASING SYSTEM FOR A PLASMA PROCESSING APPARATUS 有权
    用于等离子体加工设备的偏心系统

    公开(公告)号:US20140106571A1

    公开(公告)日:2014-04-17

    申请号:US13649159

    申请日:2012-10-11

    摘要: A plasma processing apparatus includes a process chamber housing defining a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate plasma in the process chamber, and a biasing system. The biasing system is configured to bias the platen to attract ions from the plasma towards the workpiece during a first processing time interval and configured to bias the platen to repel ions from the platen towards interior surfaces of the process chamber housing during a cleaning time interval. The cleaning time interval is separate from the first processing time interval and occurring after the first processing time interval.

    摘要翻译: 等离子体处理装置包括限定处理室的处理室壳体,位于处理室中的用于支撑工件的压板,被配置为在处理室中产生等离子体的源和偏置系统。 偏置系统被配置为偏压压板以在第一处理时间间隔期间从等离子体离开工件以吸引离子,并且构造成在清洁时间间隔期间偏压压板以从压板排向离开处理室壳体的内表面。 清洁时间间隔与第一处理时间间隔分开,并且在第一处理时间间隔之后发生。