公开(公告)号：US20100155801A1

公开(公告)日：2010-06-24

申请号：US12317507

申请日：2008-12-22

申请人： Brian S. Doyle ,  Dinesh Somasekhar ,  Gilbert Dewey ,  Satyarth Suri

发明人： Brian S. Doyle ,  Dinesh Somasekhar ,  Gilbert Dewey ,  Satyarth Suri

IPC分类号： H01L29/94 ,  H01L29/06 ,  H01L21/8242

CPC分类号： H01L28/90 ,  H01L27/10894 ,  H01L27/10897

摘要： An integrated circuit includes a semiconducting substrate (110), electrically conductive layers (120) over the semiconducting substrate, and a capacitor (130) at least partially embedded within the semiconducting substrate such that the capacitor is entirely underneath the electrically conductive layers. A storage node voltage is on an outside layer (132) of the capacitor. In the same or another embodiment, the integrated circuit may act as a 1T-1C embedded memory cell including the semiconducting substrate, an electrically insulating stack (160) over the semiconducting substrate, a transistor (140) including a source/drain region (142) within the semiconducting substrate and a gate region (141) above the semiconducting substrate, a trench (111) extending through the electrically insulating layers and into the semiconducting substrate, a first electrically insulating layer (131) located within the trench, and the capacitor located within the trench interior to the first electrically insulating layer.

摘要翻译： 集成电路包括半导体衬底（110），半导体衬底上的导电层（120）和至少部分地嵌入在半导体衬底内的电容器（130），使得电容器完全在导电层的下面。 存储节点电压位于电容器的外层（132）上。 在相同或另一个实施例中，集成电路可以用作包括半导体衬底的1T-1C嵌入式存储单元，半导体衬底上的电绝缘堆叠（160），包括源极/漏极区域（142）的晶体管（140） ）和在半导体衬底上方的栅极区（141），延伸穿过电绝缘层并进入半导体衬底的沟槽（111），位于沟槽内的第一电绝缘层（131）和电容器 位于第一电绝缘层的沟槽内部。

公开(公告)号：US08030197B2

公开(公告)日：2011-10-04

申请号：US12435382

申请日：2009-05-04

申请人： Brian S. Doyle ,  Gilbert Dewey ,  Ravi Pillarisetty ,  Nick Lindert ,  Uday Shah ,  Dinesh Somasekhar

发明人： Brian S. Doyle ,  Gilbert Dewey ,  Ravi Pillarisetty ,  Nick Lindert ,  Uday Shah ,  Dinesh Somasekhar

IPC分类号： H01L21/3205 ,  H01L21/4763

CPC分类号： H01L21/823456 ,  H01L21/82345 ,  H01L21/823462 ,  H01L29/4236 ,  H01L29/49 ,  H01L29/51 ,  H01L29/66545 ,  H01L29/66583 ,  H01L29/66621 ,  H01L29/7833 ,  H01L29/7834

摘要： Embodiments of the invention relate to a method of fabricating logic transistors using replacement metal gate (RMG) logic flow with modified process to form recessed channel array transistors (RCAT) on a common semiconductor substrate. An embodiment comprises forming an interlayer dielectric (ILD) layer on a semiconductor substrate, forming a first recess in the ILD layer of a first substrate region, forming a recessed channel in the ILD layer and in the substrate of a second substrate region, depositing a first conformal high-k dielectric layer in the first recess and a second conformal high-k dielectric layer in the recessed channel, and filling the first recess with a first gate metal and the recessed channel with a second gate metal.

摘要翻译： 本发明的实施例涉及使用具有修改过程的替代金属栅（RMG）逻辑流来制造逻辑晶体管的方法，以在公共半导体衬底上形成凹陷沟道阵列晶体管（RCAT）。 一个实施例包括在半导体衬底上形成层间绝缘层（ILD）层，在第一衬底区域的ILD层中形成第一凹槽，在第一衬底区域的ILD层和衬底中形成凹陷沟道， 第一凹部中的第一共形高k电介质层和凹陷沟道中的第二共形高k电介质层，并且用第一栅极金属填充第一凹槽，并且利用第二栅极金属填充凹陷沟道。

公开(公告)号：US20110260244A1

公开(公告)日：2011-10-27

申请号：US13178974

申请日：2011-07-08

申请人： Brian S. Doyle ,  Gilbert Dewey ,  Ravi Pillarisetty ,  Nick Lindert ,  Uday Shah ,  Dinesh Somasekhar

发明人： Brian S. Doyle ,  Gilbert Dewey ,  Ravi Pillarisetty ,  Nick Lindert ,  Uday Shah ,  Dinesh Somasekhar

IPC分类号： H01L27/092

CPC分类号： H01L21/823456 ,  H01L21/82345 ,  H01L21/823462 ,  H01L29/4236 ,  H01L29/49 ,  H01L29/51 ,  H01L29/66545 ,  H01L29/66583 ,  H01L29/66621 ,  H01L29/7833 ,  H01L29/7834

摘要： Embodiments of the invention relate to a method of fabricating logic transistors using replacement metal gate (RMG) logic flow with modified process to form recessed channel array transistors (RCAT) on a common semiconductor substrate. An embodiment comprises forming an interlayer dielectric (ILD) layer on a semiconductor substrate, forming a first recess in the ILD layer of a first substrate region, forming a recessed channel in the ILD layer and in the substrate of a second substrate region, depositing a first conformal high-k dielectric layer in the first recess and a second conformal high-k dielectric layer in the recessed channel, and filling the first recess with a first gate metal and the recessed channel with a second gate metal.

摘要翻译： 本发明的实施例涉及使用具有修改过程的替代金属栅（RMG）逻辑流来制造逻辑晶体管的方法，以在公共半导体衬底上形成凹陷沟道阵列晶体管（RCAT）。 一个实施例包括在半导体衬底上形成层间绝缘层（ILD）层，在第一衬底区域的ILD层中形成第一凹槽，在第一衬底区域的ILD层和衬底中形成凹陷沟道， 第一凹部中的第一共形高k电介质层和凹陷沟道中的第二共形高k电介质层，并且用第一栅极金属填充第一凹槽，并且利用第二栅极金属填充凹陷沟道。

公开(公告)号：US20100276757A1

公开(公告)日：2010-11-04

申请号：US12435382

申请日：2009-05-04

申请人： Brian S. Doyle ,  Gilbert Dewey ,  Ravi Pillarisetty ,  Nick Lindert ,  Uday Shah ,  Dinesh Somasekhar

发明人： Brian S. Doyle ,  Gilbert Dewey ,  Ravi Pillarisetty ,  Nick Lindert ,  Uday Shah ,  Dinesh Somasekhar

IPC分类号： H01L27/088 ,  H01L21/8234

CPC分类号： H01L21/823456 ,  H01L21/82345 ,  H01L21/823462 ,  H01L29/4236 ,  H01L29/49 ,  H01L29/51 ,  H01L29/66545 ,  H01L29/66583 ,  H01L29/66621 ,  H01L29/7833 ,  H01L29/7834

摘要： Embodiments of the invention relate to a method of fabricating logic transistors using replacement metal gate (RMG) logic flow with modified process to form recessed channel array transistors (RCAT) on a common semiconductor substrate. An embodiment comprises forming an interlayer dielectric (ILD) layer on a semiconductor substrate, forming a first recess in the ILD layer of a first substrate region, forming a recessed channel in the ILD layer and in the substrate of a second substrate region, depositing a first conformal high-k dielectric layer in the first recess and a second conformal high-k dielectric layer in the recessed channel, and filling the first recess with a first gate metal and the recessed channel with a second gate metal.

摘要翻译： 本发明的实施例涉及使用具有修改过程的替代金属栅（RMG）逻辑流来制造逻辑晶体管的方法，以在公共半导体衬底上形成凹陷沟道阵列晶体管（RCAT）。 一个实施例包括在半导体衬底上形成层间绝缘层（ILD）层，在第一衬底区域的ILD层中形成第一凹槽，在第一衬底区域的ILD层和衬底中形成凹陷沟道， 第一凹部中的第一共形高k电介质层和凹陷沟道中的第二共形高k电介质层，并且用第一栅极金属填充第一凹槽，并且利用第二栅极金属填充凹陷沟道。

公开(公告)号：US20100163945A1

公开(公告)日：2010-07-01

申请号：US12319101

申请日：2008-12-30

申请人： Jack T. Kavalieros ,  Niloy Mukherjee ,  Gilbert Dewey ,  Dinesh Somasekhar ,  Brian S. Doyle

发明人： Jack T. Kavalieros ,  Niloy Mukherjee ,  Gilbert Dewey ,  Dinesh Somasekhar ,  Brian S. Doyle

IPC分类号： H01L27/108 ,  H01L21/8242

CPC分类号： H01L29/66181 ,  H01L27/10832 ,  H01L27/10861 ,  H01L27/10867 ,  H01L27/1087 ,  H01L27/10876 ,  H01L28/90 ,  H01L29/66666 ,  H01L29/7827

摘要： An embedded memory cell includes a semiconducting substrate (110), a transistor (120) having a source/drain region (121) at least partially embedded in the semiconducting substrate, and a capacitor (130) at least partially embedded in the semiconducting substrate. The capacitor includes a first electrode (131) and a second electrode (132) that are electrically isolated from each other by a first electrically insulating material (133). The first electrode is electrically connected to the semiconducting substrate and the second electrode is electrically connected to the source/drain region of the transistor.

摘要翻译： 嵌入式存储单元包括半导体衬底（110），具有至少部分地嵌入在半导体衬底中的源极/漏极区域（121）的晶体管（120）以及至少部分地嵌入在半导体衬底中的电容器（130）。 电容器包括通过第一电绝缘材料（133）彼此电绝缘的第一电极（131）和第二电极（132）。 第一电极电连接到半导体衬底，第二电极电连接到晶体管的源极/漏极区域。

公开(公告)号：US07999298B2

公开(公告)日：2011-08-16

申请号：US12319101

申请日：2008-12-30

申请人： Jack T. Kavalieros ,  Niloy Mukherjee ,  Gilbert Dewey ,  Dinesh Somasekhar ,  Brian S. Doyle

发明人： Jack T. Kavalieros ,  Niloy Mukherjee ,  Gilbert Dewey ,  Dinesh Somasekhar ,  Brian S. Doyle

IPC分类号： H01L27/108

CPC分类号： H01L29/66181 ,  H01L27/10832 ,  H01L27/10861 ,  H01L27/10867 ,  H01L27/1087 ,  H01L27/10876 ,  H01L28/90 ,  H01L29/66666 ,  H01L29/7827

摘要： An embedded memory cell includes a semiconducting substrate (110), a transistor (120) having a source/drain region (121) at least partially embedded in the semiconducting substrate, and a capacitor (130) at least partially embedded in the semiconducting substrate. The capacitor includes a first electrode (131) and a second electrode (132) that are electrically isolated from each other by a first electrically insulating material (133). The first electrode is electrically connected to the semiconducting substrate and the second electrode is electrically connected to the source/drain region of the transistor.

摘要翻译： 嵌入式存储单元包括半导体衬底（110），具有至少部分地嵌入在半导体衬底中的源极/漏极区域（121）的晶体管（120）以及至少部分地嵌入在半导体衬底中的电容器（130）。 电容器包括通过第一电绝缘材料（133）彼此电绝缘的第一电极（131）和第二电极（132）。 第一电极电连接到半导体衬底，第二电极电连接到晶体管的源极/漏极区域。

公开(公告)号：US08785907B2

公开(公告)日：2014-07-22

申请号：US13722746

申请日：2012-12-20

申请人： Niti Goel ,  Niloy Mukherjee ,  Seung Hoon Sung ,  Van H. Le ,  Matthew V. Metz ,  Jack T. Kavalieros ,  Ravi Pillarisetty ,  Sanaz K. Gardner ,  Sansaptak Dasgupta ,  Willy Rachmady ,  Benjamin Chu-Kung ,  Marko Radosavljevic ,  Gilbert Dewey ,  Marc C. French ,  Jessica Kachian ,  Satyarth Suri ,  Robert S. Chau

发明人： Niti Goel ,  Niloy Mukherjee ,  Seung Hoon Sung ,  Van H. Le ,  Matthew V. Metz ,  Jack T. Kavalieros ,  Ravi Pillarisetty ,  Sanaz K. Gardner ,  Sansaptak Dasgupta ,  Willy Rachmady ,  Benjamin Chu-Kung ,  Marko Radosavljevic ,  Gilbert Dewey ,  Marc C. French ,  Jessica Kachian ,  Satyarth Suri ,  Robert S. Chau

IPC分类号： H01L29/06

CPC分类号： H01L21/764 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/02494 ,  H01L21/02507 ,  H01L21/02532 ,  H01L21/76232

摘要： An embodiment includes depositing a material onto a substrate where the material includes a different lattice constant than the substrate (e.g., III-V or IV epitaxial (EPI) material on a Si substrate). An embodiment includes an EPI layer formed within a trench having walls that narrow as the trench extends upwards. An embodiment includes an EPI layer formed within a trench using multiple growth temperatures. A defect barrier, formed in the EPI layer when the temperature changes, contains defects within the trench and below the defect barrier. The EPI layer above the defect barrier and within the trench is relatively defect free. An embodiment includes an EPI layer annealed within a trench to induce defect annihilation. An embodiment includes an EPI superlattice formed within a trench and covered with a relatively defect free EPI layer (that is still included in the trench). Other embodiments are described herein.

摘要翻译： 实施例包括将材料沉积到衬底上，其中材料包括与衬底（例如Si衬底上的III-V或IV外延（EPI）材料）不同的晶格常数。 一个实施例包括形成在沟槽内的EPI层，其具有随着沟槽向上延伸而变窄的壁。 实施例包括使用多个生长温度在沟槽内形成的EPI层。 当温度变化时，在EPI层中形成的缺陷屏障在沟槽内和缺陷屏障之下包含缺陷。 缺陷屏障之上和沟槽内的EPI层相对无缺陷。 一个实施方案包括在沟槽内退火以引发缺陷湮灭的EPI层。 一个实施例包括形成在沟槽内并覆盖有相对无缺陷的EPI层（仍包含在沟槽中）的EPI超晶格。 本文描述了其它实施例。

公开(公告)号：US20140084239A1

公开(公告)日：2014-03-27

申请号：US13629148

申请日：2012-09-27

申请人： Marko Radosavljevic ,  Gilbert Dewey ,  Benjamin Chu-Kung ,  Dipanjan Basu ,  Sanaz K. Gardner ,  Satyarth Suri ,  Ravi Pillarisetty ,  Niloy Mukherjee ,  Han Wui Then ,  Robert S. Chau

发明人： Marko Radosavljevic ,  Gilbert Dewey ,  Benjamin Chu-Kung ,  Dipanjan Basu ,  Sanaz K. Gardner ,  Satyarth Suri ,  Ravi Pillarisetty ,  Niloy Mukherjee ,  Han Wui Then ,  Robert S. Chau

IPC分类号： H01L29/78 ,  H01L29/267 ,  H01L29/06

CPC分类号： H01L29/0665 ,  B82Y10/00 ,  B82Y40/00 ,  H01L29/0673 ,  H01L29/068 ,  H01L29/201 ,  H01L29/401 ,  H01L29/42392 ,  H01L29/66469 ,  H01L29/775 ,  H01L29/785 ,  H01L29/78696 ,  H01L2924/0002 ,  H01L2924/00

摘要： Non-planar semiconductor devices having channel regions with low band-gap cladding layers are described. For example, a semiconductor device includes a vertical arrangement of a plurality of nanowires disposed above a substrate. Each nanowire includes an inner region having a first band gap and an outer cladding layer surrounding the inner region. The cladding layer has a second, lower band gap. A gate stack is disposed on and completely surrounds the channel region of each of the nanowires. The gate stack includes a gate dielectric layer disposed on and surrounding the cladding layer and a gate electrode disposed on the gate dielectric layer. Source and drain regions are disposed on either side of the channel regions of the nanowires.

摘要翻译： 描述具有低带隙包层的沟道区的非平面半导体器件。 例如，半导体器件包括布置在衬底上方的多个纳米线的垂直布置。 每个纳米线包括具有第一带隙的内部区域和围绕内部区域的外部包层。 包层具有第二较低带隙。 栅堆叠设置在每个纳米线的沟道区上并完全包围。 栅极堆叠包括设置在包层上并围绕着包层的栅极电介质层和设置在栅极介电层上的栅电极。 源区和漏区设置在纳米线的沟道区的两侧。

公开(公告)号：US20140175378A1

公开(公告)日：2014-06-26

申请号：US13722746

申请日：2012-12-20

申请人： Niti Goel ,  Niloy Mukherjee ,  Seung Hoon Sung ,  Van Le ,  Matthew Metz ,  Jack Kavalieros ,  RAVI PILLARISETTY ,  Sanaz Gardner ,  SANSAPTAK DASGUPTA ,  Willy Rachmady ,  BENJAMIN CHU-KUNG ,  MARKO RADOSAVLJEVIC ,  Gilbert Dewey ,  Marc French ,  JESSICA KACHIAN ,  SATYARTH SURI ,  Robert Chau

发明人： Niti Goel ,  Niloy Mukherjee ,  Seung Hoon Sung ,  Van Le ,  Matthew Metz ,  Jack Kavalieros ,  RAVI PILLARISETTY ,  Sanaz Gardner ,  SANSAPTAK DASGUPTA ,  Willy Rachmady ,  BENJAMIN CHU-KUNG ,  MARKO RADOSAVLJEVIC ,  Gilbert Dewey ,  Marc French ,  JESSICA KACHIAN ,  SATYARTH SURI ,  Robert Chau

IPC分类号： H01L21/20 ,  H01L21/764

CPC分类号： H01L21/764 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/02494 ,  H01L21/02507 ,  H01L21/02532 ,  H01L21/76232

摘要： An embodiment includes depositing a material onto a substrate where the material includes a different lattice constant than the substrate (e.g., III-V or IV epitaxial (EPI) material on a Si substrate). An embodiment includes an EPI layer formed within a trench having walls that narrow as the trench extends upwards. An embodiment includes an EPI layer formed within a trench using multiple growth temperatures. A defect barrier, formed in the EPI layer when the temperature changes, contains defects within the trench and below the defect barrier. The EPI layer above the defect barrier and within the trench is relatively defect free. An embodiment includes an EPI layer annealed within a trench to induce defect annihilation. An embodiment includes an EPI superlattice formed within a trench and covered with a relatively defect free EPI layer (that is still included in the trench). Other embodiments are described herein.

摘要翻译： 实施例包括将材料沉积到衬底上，其中材料包括与衬底（例如Si衬底上的III-V或IV外延（EPI）材料）不同的晶格常数。 一个实施例包括形成在沟槽内的EPI层，其具有随着沟槽向上延伸而变窄的壁。 实施例包括使用多个生长温度在沟槽内形成的EPI层。 当温度变化时，在EPI层中形成的缺陷屏障在沟槽内和缺陷屏障之下包含缺陷。 缺陷屏障之上和沟槽内的EPI层相对无缺陷。 一个实施方案包括在沟槽内退火以引发缺陷湮灭的EPI层。 一个实施例包括形成在沟槽内并覆盖有相对无缺陷的EPI层（仍包含在沟槽中）的EPI超晶格。 本文描述了其它实施例。

公开(公告)号：US08785909B2

公开(公告)日：2014-07-22

申请号：US13629148

申请日：2012-09-27

申请人： Marko Radosavljevic ,  Gilbert Dewey ,  Benjamin Chu-Kung ,  Dipanjan Basu ,  Sanaz K. Gardner ,  Satyarth Suri ,  Ravi Pillarisetty ,  Niloy Mukherjee ,  Han Wui Then ,  Robert S. Chau

发明人： Marko Radosavljevic ,  Gilbert Dewey ,  Benjamin Chu-Kung ,  Dipanjan Basu ,  Sanaz K. Gardner ,  Satyarth Suri ,  Ravi Pillarisetty ,  Niloy Mukherjee ,  Han Wui Then ,  Robert S. Chau

IPC分类号： H01L29/06 ,  B82Y10/00 ,  H01L29/78

CPC分类号： H01L29/0665 ,  B82Y10/00 ,  B82Y40/00 ,  H01L29/0673 ,  H01L29/068 ,  H01L29/201 ,  H01L29/401 ,  H01L29/42392 ,  H01L29/66469 ,  H01L29/775 ,  H01L29/785 ,  H01L29/78696 ,  H01L2924/0002 ,  H01L2924/00

摘要： Non-planar semiconductor devices having channel regions with low band-gap cladding layers are described. For example, a semiconductor device includes a vertical arrangement of a plurality of nanowires disposed above a substrate. Each nanowire includes an inner region having a first band gap and an outer cladding layer surrounding the inner region. The cladding layer has a second, lower band gap. A gate stack is disposed on and completely surrounds the channel region of each of the nanowires. The gate stack includes a gate dielectric layer disposed on and surrounding the cladding layer and a gate electrode disposed on the gate dielectric layer. Source and drain regions are disposed on either side of the channel regions of the nanowires.

摘要翻译： 描述具有低带隙包层的沟道区的非平面半导体器件。 例如，半导体器件包括布置在衬底上方的多个纳米线的垂直布置。 每个纳米线包括具有第一带隙的内部区域和围绕内部区域的外部包层。 包层具有第二较低带隙。 栅堆叠设置在每个纳米线的沟道区上并完全包围。 栅极堆叠包括设置在包层上并围绕着包层的栅极电介质层和设置在栅极介电层上的栅电极。 源区和漏区设置在纳米线的沟道区的两侧。