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    Crystalline Silicon Formation Apparatus
    1.
    发明申请
    Crystalline Silicon Formation Apparatus 有权
    结晶硅形成装置

    公开(公告)号：US20110142730A1

    公开(公告)日：2011-06-16

    申请号：US12637403

    申请日：2009-12-14

    申请人： C.W. Lan ,  Kimsam-Hsieh ,  Wen-Huai Yu ,  Bruce Hsu ,  Ya-Lu Tsai ,  Wen-Ching Hsu ,  Szu-Hau Ho

    发明人： C.W. Lan ,  Kimsam-Hsieh ,  Wen-Huai Yu ,  Bruce Hsu ,  Ya-Lu Tsai ,  Wen-Ching Hsu ,  Szu-Hau Ho

    IPC分类号： B01D9/00

    CPC分类号： C30B28/06 ,  C30B29/06

    摘要： In a crystalline silicon formation apparatus, a quick cooling method is applied to the bottom of a crucible to control a growth orientation of a polycrystalline silicon grain, such that the crystal grain forms twin boundary, and the twin boundary is a symmetric grain boundary, and the crystal grain is solidified and grown upward in unidirection to form a complete polycrystalline silicon, such that defects or impurities will not form in the polycrystalline silicon easily.

    摘要翻译： 在结晶硅形成装置中，将快速冷却方法施加到坩埚的底部，以控制多晶硅晶粒的生长取向，使得晶粒形成双边界，并且双边界是对称晶界，并且 晶粒被固化并单向向上生长以形成完整的多晶硅，使得难以在多晶硅中形成缺陷或杂质。

    Section forming method & construction for wafer ingot growth
    3.
    发明申请
    Section forming method & construction for wafer ingot growth 审中-公开
    晶圆锭生长的截面成形方法与结构

    公开(公告)号：US20070119366A1

    公开(公告)日：2007-05-31

    申请号：US11508864

    申请日：2006-08-24

    申请人： C.W. Lan ,  Wen-Ching Hsu ,  Kimsam Hsieh ,  Leif Wang ,  Ya Ho

    发明人： C.W. Lan ,  Wen-Ching Hsu ,  Kimsam Hsieh ,  Leif Wang ,  Ya Ho

    IPC分类号： C30B7/00 ,  C30B17/00 ,  C30B21/02

    CPC分类号： C30B15/22 ,  C30B7/00 ,  C30B29/06 ,  C30B29/40 ,  C30B29/48

    摘要： A method and construction of growing wafer ingot by having a thermal shield disposed on an opening of a crucible, an opening approximating a polygonal contour disposed on the thermal shield to control gas current, heat conduction and heat radiation in ingot growth, an isotherm of condensation temperature in ingot growth approaching a polygonal form to grow the ingot into a form approximating the preset sectional form of a polygon for minimizing the material to be cut off in the subsequent process of slicing wafer ingot into chips.

    摘要翻译： 通过将坩埚上的热屏蔽设置在坩埚的开口上的近似多边形轮廓的开口，以控制锭生长中的气流，热传导和热辐射，冷凝等温线，生长晶圆锭的方法和结构 晶锭生长中的温度接近多边形，以使锭生长成近似于多边形的预设截面形状的形式，以使在将晶片锭切片成芯片的后续过程中要切断的材料最小化。

    Crystal growth device
    4.
    发明授权
    Crystal growth device 有权
    晶体生长装置

    公开(公告)号：US09163326B2

    公开(公告)日：2015-10-20

    申请号：US13479497

    申请日：2012-05-24

    申请人： Chung-Wen Lan ,  Bruce Hsu ,  Wen-Huai Yu ,  Wen-Chieh Lan ,  Yu-Min Yang ,  Kai-Yuan Pai ,  Wen-Ching Hsu

    发明人： Chung-Wen Lan ,  Bruce Hsu ,  Wen-Huai Yu ,  Wen-Chieh Lan ,  Yu-Min Yang ,  Kai-Yuan Pai ,  Wen-Ching Hsu

    IPC分类号： C30B11/00 ,  C30B21/02

    CPC分类号： C30B11/003 ,  C30B11/007 ,  C30B21/02 ,  Y10T117/1092

    摘要： A crystal growth device includes a crucible and a heater setting. The crucible has a bottom and a top opening. The heater setting surrounds the crucible and is movable relative to the crucible along a top-bottom direction of the crucible and between first and second positions. The heater setting includes a first temperature heating zone and a second temperature heating zone higher in temperature than the first temperature heating zone. The heater setting is in the first position when the crucible is in the second temperature heating zone and in the second position when the crucible is in the first temperature heating zone.

    摘要翻译： 晶体生长装置包括坩埚和加热器设置。 坩埚具有底部和顶部开口。 加热器设置围绕坩埚并且可以相对于坩埚沿着坩埚的顶部 - 底部方向以及在第一和第二位置之间移动。 加热器设置包括温度高于第一温度加热区的第一温度加热区和第二温度加热区。 当坩埚处于第二温度加热区域时，加热器设置处于第一位置，并且当坩埚处于第一温度加热区域时处于第二位置。

    Crystal Growth Device
    5.
    发明申请
    Crystal Growth Device 有权
    晶体生长装置

    公开(公告)号：US20130133569A1

    公开(公告)日：2013-05-30

    申请号：US13479497

    申请日：2012-05-24

    申请人： Chung-Wen Lan ,  Bruce Hsu ,  Wen-Huai Yu ,  Wen-Chieh Lan ,  Yu-Min Yang ,  Kai-Yuan Pai ,  Wen-Ching Hsu

    发明人： Chung-Wen Lan ,  Bruce Hsu ,  Wen-Huai Yu ,  Wen-Chieh Lan ,  Yu-Min Yang ,  Kai-Yuan Pai ,  Wen-Ching Hsu

    IPC分类号： C30B11/00

    CPC分类号： C30B11/003 ,  C30B11/007 ,  C30B21/02 ,  Y10T117/1092

    摘要： A crystal growth device includes a crucible and a heater setting. The crucible has a bottom and a top opening. The heater setting surrounds the crucible and is movable relative to the crucible along a top-bottom direction of the crucible and between first and second positions. The heater setting includes a first temperature heating zone and a second temperature heating zone higher in temperature than the first temperature heating zone. The heater setting is in the first position when the crucible is in the second temperature heating zone and in the second position when the crucible is in the first temperature heating zone.

    摘要翻译： 晶体生长装置包括坩埚和加热器设置。 坩埚具有底部和顶部开口。 加热器设置围绕坩埚并且可以相对于坩埚沿着坩埚的顶部 - 底部方向以及在第一和第二位置之间移动。 加热器设置包括温度高于第一温度加热区的第一温度加热区和第二温度加热区。 当坩埚处于第二温度加热区域时，加热器设置处于第一位置，并且当坩埚处于第一温度加热区域时处于第二位置。

    METHOD OF MANUFACTURING CRYSTALLINE SILICON INGOT
    6.
    发明申请
    METHOD OF MANUFACTURING CRYSTALLINE SILICON INGOT 有权
    制造晶体硅的方法

    公开(公告)号：US20110303143A1

    公开(公告)日：2011-12-15

    申请号：US13098051

    申请日：2011-04-29

    申请人： Chung-Wen Lan ,  Ya-Lu Tsai ,  Sung-Lin Hsu ,  Chao-Kun Hsieh ,  Wen-Chieh Lan ,  Wen-Ching Hsu

    发明人： Chung-Wen Lan ,  Ya-Lu Tsai ,  Sung-Lin Hsu ,  Chao-Kun Hsieh ,  Wen-Chieh Lan ,  Wen-Ching Hsu

    IPC分类号： C30B11/02 ,  C01B33/021

    CPC分类号： C30B11/14 ,  C30B11/00 ,  C30B11/002 ,  C30B11/003 ,  C30B11/02 ,  C30B28/06 ,  C30B29/06

    摘要： An approach is provided for a method to manufacture a crystalline silicon ingot. The method comprises providing a mold formed for melting and cooling a silicon feedstock by using a directional solidification process, disposing a barrier layer inside the mold, disposing one or more silicon crystal seeds on the barrier layer, loading the silicon feedstock on the silicon crystal seeds, heating the mold to obtain a silicon melt, and cooling the mold by the directional solidification process to solidify the silicon melt into a silicon ingot. The mold is heated until the silicon feedstock is fully melted and the silicon crystal seeds are at least partially melted.

    摘要翻译： 提供了一种制造晶体硅锭的方法。 该方法包括提供通过使用定向凝固方法熔化和冷却硅原料而形成的模具，在模具内设置阻挡层，在阻挡层上设置一个或多个硅晶体种子，将硅原料装载到硅晶种上 ，加热模具以获得硅熔体，并通过定向凝固工艺冷却模具，将硅熔体固化成硅锭。 将模具加热直到硅原料完全熔化，硅晶体晶种至少部分熔化。

    Crystalline silicon ingot and method of fabricating the same
    10.
    发明授权
    Crystalline silicon ingot and method of fabricating the same 有权
    结晶硅锭及其制造方法

    公开(公告)号：US09133565B2

    公开(公告)日：2015-09-15

    申请号：US13430131

    申请日：2012-03-26

    申请人： Wen-Chieh Lan ,  Yong-Cheng Yu ,  Wen-Huai Yu ,  Sung-Lin Hsu ,  Wen-Ching Hsu

    发明人： Wen-Chieh Lan ,  Yong-Cheng Yu ,  Wen-Huai Yu ,  Sung-Lin Hsu ,  Wen-Ching Hsu

    IPC分类号： C30B11/02 ,  C30B11/14 ,  C30B29/06 ,  C30B11/00

    CPC分类号： C30B11/02 ,  C30B11/00 ,  C30B11/14 ,  C30B29/06

    摘要： A crystalline silicon ingot and a method of manufacturing the same are provided. Using a crystalline silicon seed layer, the crystalline silicon ingot is formed by a directional solidification process. The crystalline silicon seed layer is formed of multiple primary monocrystalline silicon seeds and multiple secondary monocrystalline silicon seeds. Each of the primary monocrystalline silicon seeds has a first crystal orientation different from (100). Each of the secondary monocrystalline silicon seeds has a second crystal orientation different from the first crystal orientation. Each of the primary monocrystalline silicon seeds is adjacent to at least one of the secondary monocrystalline silicon seeds, and separate from the others of the primary monocrystalline silicon seeds.

    摘要翻译： 提供一种晶体硅锭及其制造方法。 使用结晶硅籽晶层，通过定向凝固工艺形成晶体硅锭。 晶体硅种子层由多个初级单晶硅晶种和多个次级单晶硅晶种形成。 每个初级单晶硅种子具有不同于（100）的第一晶体取向。 每个次级单晶硅种子具有不同于第一晶体取向的第二晶体取向。 每个初级单晶硅种子与次级单晶硅种子中的至少一种相邻，并与主要单晶硅晶种的其它晶体分离。