MOLD FOR NANOIMPRINT LITHOGRAPHY
    1.
    发明申请
    MOLD FOR NANOIMPRINT LITHOGRAPHY 审中-公开
    模具用于NANOIMPRINT LITHOGRAPHY

    公开(公告)号:US20130164442A1

    公开(公告)日:2013-06-27

    申请号:US13712211

    申请日:2012-12-12

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00

    Abstract: The present invention relates to a method for manufacturing a nanoimprint lithography mold. The method comprises an initial step of depositing, on a mechanical support, a layer of a phase-changing material having a volume variation of at least 2% between a crystalline phase and an amorphous phase. The method is characterized in that it also comprises a step of personalization of the mold, achieved by making the layer of phase-changing material transition locally from its crystalline phase to its amorphous phase in order to form relief patterns therein.The invention comprises such a mold as well as a method for modifying such a mold.

    Abstract translation: 本发明涉及一种纳米压印光刻模的制造方法。 该方法包括在机械支撑件上沉积在结晶相和非晶相之间具有至少2%的体积变化的相变材料层的初始步骤。 该方法的特征还在于它还包括通过使相变层从其结晶相局部转变成其非晶相而实现的模具的个性化步骤,以便在其中形成浮雕图案。 本发明包括这种模具以及用于修改这种模具的方法。

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