SYSTEMS AND METHODS FOR FILM DEPOSITION

    公开(公告)号:US20230002884A1

    公开(公告)日:2023-01-05

    申请号:US17779231

    申请日:2020-11-19

    Abstract: A system is described herein for film deposition includes a drum; a motor configured to rotate the drum in a direction of rotation; a target including a target material; and a holder attached to the drum. The holder is configured to accommodate a substrate and to expose the substrate to free particles of the target material sputtered from the target, and the holder has an asymmetric shape.

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