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公开(公告)号：US20200321746A1
公开(公告)日：2020-10-08
申请号：US16910846
申请日：2020-06-24
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20190324286A1
公开(公告)日：2019-10-24
申请号：US16503073
申请日：2019-07-03
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC分类号： G02B27/48 , G01J3/02 , H01S3/225 , H01S3/00 , G03F7/20 , H01S4/00 , G01J11/00 , G01J9/02 , G01J3/26 , G02F1/01
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US11050213B2
公开(公告)日：2021-06-29
申请号：US16910846
申请日：2020-06-24
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC分类号： G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20210239998A1
公开(公告)日：2021-08-05
申请号：US17240050
申请日：2021-04-26
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC分类号： G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/20 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US11054665B2
公开(公告)日：2021-07-06
申请号：US16503073
申请日：2019-07-03
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC分类号： G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/20 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00 , G02B19/00
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US10451890B2
公开(公告)日：2019-10-22
申请号：US15407153
申请日：2017-01-16
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC分类号： G01J3/02 , G01J3/26 , G01J9/02 , G02F1/01 , G03F7/20 , H01S3/00 , H01S4/00 , G01J11/00 , G02B19/00 , G02B27/48
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US20180203248A1
公开(公告)日：2018-07-19
申请号：US15407153
申请日：2017-01-16
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op `t Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US09762023B2
公开(公告)日：2017-09-12
申请号：US14976829
申请日：2015-12-21
申请人： CYMER, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC分类号： G01J11/00 , G01J1/0228 , G01J1/0448 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/10046 , H01S3/10069
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US11686951B2
公开(公告)日：2023-06-27
申请号：US17240050
申请日：2021-04-26
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC分类号： G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/00 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00 , G02B19/00
CPC分类号： G02B27/48 , G01J3/027 , G01J3/26 , G01J9/02 , G01J11/00 , G02F1/0121 , G03F7/70008 , G03F7/70041 , G03F7/7055 , H01S3/0085 , H01S3/225 , H01S4/00 , G01J2009/0211 , G02B19/0095 , G02F2203/18 , G03F7/70025 , G03F7/70583 , H01S3/0057
摘要： A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US10727642B2
公开(公告)日：2020-07-28
申请号：US15700754
申请日：2017-09-11
申请人： Cymer, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC分类号： G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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