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公开(公告)号：US10727642B2
公开(公告)日：2020-07-28
申请号：US15700754
申请日：2017-09-11
申请人： Cymer, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC分类号： G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20180006425A1
公开(公告)日：2018-01-04
申请号：US15700754
申请日：2017-09-11
申请人： Cymer, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC分类号： H01S3/1305 , G01J1/0228 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/036 , H01S3/0385 , H01S3/09702 , H01S3/1055 , H01S3/137 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308 , H01S3/2333
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US11050213B2
公开(公告)日：2021-06-29
申请号：US16910846
申请日：2020-06-24
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC分类号： G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20200321746A1
公开(公告)日：2020-10-08
申请号：US16910846
申请日：2020-06-24
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US09762023B2
公开(公告)日：2017-09-12
申请号：US14976829
申请日：2015-12-21
申请人： CYMER, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC分类号： G01J11/00 , G01J1/0228 , G01J1/0448 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/10046 , H01S3/10069
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US10218147B2
公开(公告)日：2019-02-26
申请号：US15457600
申请日：2017-03-13
申请人： Cymer, LLC
发明人： Tanuj Aggarwal
IPC分类号： H01S3/08 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/134 , H01S3/225 , H01S3/104 , H01S3/038 , H01S3/097 , H01S3/0971
摘要： In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
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公开(公告)号：US10090629B2
公开(公告)日：2018-10-02
申请号：US15495455
申请日：2017-04-24
申请人： Cymer, LLC
发明人： Rahul Ahlawat , Tanuj Aggarwal
摘要： A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.
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公开(公告)号：US10036963B2
公开(公告)日：2018-07-31
申请号：US15262452
申请日：2016-09-12
申请人： Cymer, LLC
发明人： Tanuj Aggarwal
CPC分类号： G03F7/70516 , G03F7/70041 , G03F7/705 , G03F7/70558
摘要： An indication of an output of an optical source of a photolithography system is accessed; an indication of an input provided to the optical source is accessed, the provided input being associated with the accessed indication of the output of the optical source; an output error is determined from an expected amount of output and the accessed indication of the output of the optical source; a local gain associated with the accessed indication of the input provided to the optical source is estimated; a gain error is determined from the estimated local gain and an expected local gain; a current value of one or more operating metrics of the optical source is estimated based on one or more of the output error and the gain error; and a gain relationship for the optical source is updated based on the estimated current value of the one or more operating metrics.
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公开(公告)号：US20190190229A1
公开(公告)日：2019-06-20
申请号：US16232321
申请日：2018-12-26
申请人： Cymer, LLC
发明人： Tanuj Aggarwal
CPC分类号： H01S3/134 , H01S3/036 , H01S3/0385 , H01S3/08009 , H01S3/08036 , H01S3/09705 , H01S3/0971 , H01S3/104 , H01S3/1305 , H01S3/225 , H01S3/2308 , H01S3/2366
摘要： In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
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公开(公告)号：US20170229832A1
公开(公告)日：2017-08-10
申请号：US15495455
申请日：2017-04-24
申请人： Cymer, LLC
发明人： Rahul Ahlawat , Tanuj Aggarwal
CPC分类号： H01S3/036 , H01S3/0014 , H01S3/097 , H01S3/0971 , H01S3/10069 , H01S3/104 , H01S3/225 , H01S3/2251 , H01S3/2253 , H01S3/2255 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determined one or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.
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