CMP process using slurry containing abrasive of low concentration
    1.
    发明申请
    CMP process using slurry containing abrasive of low concentration 审中-公开
    CMP工艺使用含有低浓度磨料的浆料

    公开(公告)号:US20050142988A1

    公开(公告)日:2005-06-30

    申请号:US10879030

    申请日:2004-06-30

    CPC分类号: B24B37/042

    摘要: A CMP process using a slurry containing an abrasive of low concentration is disclosed. More specifically, a planarization process is performed using the slurry containing an abrasive of low concentration of less than 0.1 wt % unlike the conventional CMP slurry, thereby improving uniformity of a CMP process in a manufacture process of a semiconductor device to secure yield and reliability of the device. Particularly, since the disclosed slurry has the more excellent effect of achieving the planarization degree than that of the conventional slurry, the thickness of deposited films before the CMP process can be reduced, and the CMP amount can also be minimized.

    摘要翻译: 公开了使用含有低浓度磨料的浆料的CMP方法。 更具体地,使用含有少于0.1重量%的低浓度的研磨剂的浆料进行平坦化处理,这与传统的CMP浆料不同,从而提高半导体器件的制造过程中的CMP工艺的均匀性,以确保半导体器件的成品率和可靠性 装置。 特别地,由于所公开的浆料具有比常规浆料获得更好的平坦化度的优异效果,所以可以减少在CMP工艺之前的沉积膜的厚度,并且还可以使CMP量最小化。

    Method for manufacturing semiconductor device
    2.
    发明申请
    Method for manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US20050196965A1

    公开(公告)日:2005-09-08

    申请号:US11006187

    申请日:2004-12-07

    摘要: The disclosure relates to a method for manufacturing a semiconductor device by performing a planarization process including a first CMP process using a slurry including 0.05˜0.5 wt % CeO2 o r MnO2 as an abrasive and a second CMP process using a slurry including SiO2 as the other abrasive regardless of order of the processes. The CMP process is performed using the first slurry having a high polishing speed in the middle of the wafer and the second slurry having a high polishing speed at the edge of the wafer, thereby decreasing the processing cost and securing the process margin to secure yield and reliability of devices

    摘要翻译: 本公开涉及一种通过执行包括使用包含0.05〜0.5重量%的CeO 2或MnO 2作为研磨剂的浆料的第一CMP工艺的平坦化工艺和使用包含SiO 2作为其它研磨剂的浆料的第二CMP工艺来制造半导体器件的方法 不管进程的顺序。 使用在晶片中间具有高抛光速度的第一浆料和在晶片边缘具有高抛光速度的第二浆料进行CMP处理,从而降低加工成本并确保加工余量以确保产量和 设备的可靠性

    Optical finger print input device
    4.
    发明申请
    Optical finger print input device 审中-公开
    光指针输入装置

    公开(公告)号:US20070196003A1

    公开(公告)日:2007-08-23

    申请号:US10593373

    申请日:2004-09-14

    IPC分类号: G06K9/00

    CPC分类号: G06K9/00046 G06K9/00899

    摘要: An optical fingerprint input device by where a mark identification is attached to one surface of a prism and reflected by light beams coming from an external light source to be incident on a lens such that erroneous recognition caused by a fingerprint afterimage of water, sweat or oil remaining on the fingerprint contact surface of the prism can be prevented to improve the security of the device, and a visual advertisement can be additionally obtained when a mark identification logo for advertisement is attached on one surface of the prism.

    摘要翻译: 一种光学指纹输入装置,其中标记识别附着到棱镜的一个表面并由来自外部光源的光束反射以入射到透镜上,使得由指纹残留水,汗或油引起的错误识别 可以防止残留在棱镜的指纹接触表面上,从而提高装置的安全性,并且当在棱镜的一个表面上附着用于广告的标识识别标识时,可以另外获得视觉广告。

    Drive unit for dish washing machines
    6.
    发明申请
    Drive unit for dish washing machines 有权
    洗碗机驱动装置

    公开(公告)号:US20060151016A1

    公开(公告)日:2006-07-13

    申请号:US11188762

    申请日:2005-07-26

    IPC分类号: B08B3/02

    摘要: A drive unit for dish washing machines includes a flow channel housing, a filter housing and an arm holder, which are thermally fused to one another to form an integral unit. Consequently, assembly of the drive unit is simplified, leakage of wash water is prevented, and pumping performance is increased. Also, the flow channel housing, the filter housing and the arm holder are concurrently fixed to a pump housing of the drive unit by fixing members. Consequently, the assembly process of the drive unit is simplified, and the coupling force between the components of the drive unit is increased.

    摘要翻译: 用于洗碗机的驱动单元包括彼此热熔合以形成整体单元的流动通道壳体,过滤器壳体和臂保持器。 因此,简化了驱动单元的组装,防止了洗涤水的泄漏,并提高了泵送性能。 此外,流动通道壳体,过滤器壳体和臂保持器通过固定构件同时固定到驱动单元的泵壳体。 因此,驱动单元的组装过程被简化,并且驱动单元的部件之间的联接力增加。

    Method of fabricating thin film transistor
    7.
    发明申请
    Method of fabricating thin film transistor 有权
    制造薄膜晶体管的方法

    公开(公告)号:US20060094172A1

    公开(公告)日:2006-05-04

    申请号:US11142502

    申请日:2005-06-02

    IPC分类号: H01L21/84

    摘要: A method of fabricating a thin film transistor, in which source and drain electrodes are formed through a solution process, thus all stages which include formation of electrodes on a substrate, formation of an insulator layer, and formation of an organic semiconductor layer are conducted through the solution process. In the method, the fabrication is simplified and a fabrication cost is reduced. It is possible to apply the organic thin film transistor to integrated circuits requiring high speed switching because of high charge mobility.

    摘要翻译: 一种制造薄膜晶体管的方法,其中通过溶液工艺形成源极和漏极,因此包括在衬底上形成电极,形成绝缘体层和形成有机半导体层的所有阶段通过 解决过程。 在该方法中,简化了制造并降低了制造成本。 由于高电荷迁移率,有机薄膜晶体管可能需要高速切换的集成电路。

    Single-phase induction motor
    9.
    发明申请
    Single-phase induction motor 审中-公开
    单相感应电动机

    公开(公告)号:US20050253549A1

    公开(公告)日:2005-11-17

    申请号:US11036016

    申请日:2005-01-18

    CPC分类号: H02P1/44

    摘要: A single-phase induction motor comprises a main winding, an auxiliary winding, and a capacitor, and further comprises a switch for controlling current flow in the motor to change the amount of current flowing through the motor, thereby changing the effective capacitance of the capacitor. This reduces the number of capacitors used in the motor, thereby reducing manufacturing costs, and also attains a high effective capacitance using a low-capacitance capacitor.

    摘要翻译: 单相感应电动机包括主绕组,辅助绕组和电容器,并且还包括用于控制电动机中的电流流动的开关,以改变流过电动机的电流量,从而改变电容器的有效电容 。 这减少了电动机中使用的电容器的数量,从而降低制造成本,并且还使用低容量电容器获得高有效电容。