Electronic device and process for forming same
    1.
    发明授权
    Electronic device and process for forming same 有权
    电子设备及其成型工艺

    公开(公告)号:US06992326B1

    公开(公告)日:2006-01-31

    申请号:US10910496

    申请日:2004-08-03

    IPC分类号: H01L35/24

    摘要: An electronic device includes a substrate, a structure having openings, and a first electrode overlying the structure and lying within the openings. From a cross-sectional view, the structure, at the openings, has a negative slope. From a plan view, each opening has a perimeter that may or may not substantially correspond to a perimeter of an organic electronic component. The portions of the first electrode overlying the structure and lying within the openings are connected to each other. In a process for forming the electronic device, an organic active layer may be deposited within the opening, wherein the organic active layer has a liquid composition.

    摘要翻译: 电子设备包括基板,具有开口的结构和覆盖该结构并位于开口内的第一电极。 从横截面图,开口处的结构具有负斜率。 从平面图可以看出,每个开口都具有一个可能基本上对应于有机电子元件周边的周边。 覆盖结构并位于开口内的第一电极的部分彼此连接。 在形成电子器件的方法中,可以在开口内沉积有机活性层,其中有机活性层具有液体组成。

    COATED SUBSTRATE AND METHOD OF MAKING SAME
    2.
    发明申请
    COATED SUBSTRATE AND METHOD OF MAKING SAME 有权
    涂覆基材及其制备方法

    公开(公告)号:US20090072713A1

    公开(公告)日:2009-03-19

    申请号:US11721500

    申请日:2005-12-21

    IPC分类号: H01J1/62 B32B1/08 B05D5/12

    摘要: Provided are containment structures having a substrate structure having a plurality of walls extending from a surface to define a space, wherein at least one of the walls has an overall negative slope; a first layer deposited in the space having a first surface energy no greater and a second layer deposited on top of the first layer.

    摘要翻译: 提供了具有基底结构的容纳结构,该基底结构具有从表面延伸以限定空间的多个壁,其中至少一个壁具有总的负斜率; 沉积在具有不大于第一表面能的空间中的第一层和沉积在第一层顶部上的第二层。

    Coated substrate and method of making same
    3.
    发明授权
    Coated substrate and method of making same 有权
    涂布基材及其制造方法

    公开(公告)号:US08067887B2

    公开(公告)日:2011-11-29

    申请号:US11721500

    申请日:2005-12-21

    IPC分类号: H01L29/08 G09G3/10 B32B1/08

    摘要: Provided are containment structures having a substrate structure having a plurality of walls extending from a surface to define a space, wherein at least one of the walls has an overall negative slope; a first layer deposited in the space having a first surface energy no greater than 30 mN/m; and a second layer deposited on top of the first layer.

    摘要翻译: 提供了具有基底结构的容纳结构,该基底结构具有从表面延伸以限定空间的多个壁,其中至少一个壁具有总的负斜率; 沉积在具有不大于30mN / m的第一表面能的空间中的第一层; 以及沉积在第一层的顶部上的第二层。

    Process and materials for making contained layers and devices made with same
    9.
    发明授权
    Process and materials for making contained layers and devices made with same 失效
    制作含有相同层数和装置的工艺和材料

    公开(公告)号:US08309376B2

    公开(公告)日:2012-11-13

    申请号:US12738460

    申请日:2008-10-24

    IPC分类号: G03C1/72 G03C1/73

    摘要: There is provided a process for forming a contained second layer over a first layer. The process comprises forming the first layer having a first surface energy and then treating the first layer with a photocurable surface-active composition which is a fluorinated ester or fluorinated imide of an α,β-unsaturated polyacid; exposing the photocurable surface-active composition patternwise with radiation resulting in exposed areas and unexposed areas; developing the photocurable surface-active composition to remove the unexposed areas resulting in a first layer having untreated portions in the unexposed areas and treated portions in the exposed areas, where the treated portions have a second surface energy that is lower than the first surface energy; and forming the second layer on the untreated portions of the first layer. There is also provided an organic electronic device made by the process.

    摘要翻译: 提供了一种用于在第一层上形成包含的第二层的方法。 该方法包括形成具有第一表面能的第一层,然后用可光固化的表面活性组合物处理第一层,该组合物是α,β-不饱和多元酸的氟化酯或氟化酰亚胺; 用辐射曝光可光固化的表面活性组合物,导致曝光区域和未曝光区域; 显影所述光固化性表面活性组合物以除去未曝光区域,从而在未曝光区域中具有未处理部分的第一层和暴露区域中的处理部分,其中处理部分具有低于第一表面能的第二表面能; 以及在所述第一层的未处理部分上形成所述第二层。 还提供了通过该方法制造的有机电子装置。

    PROCESS FOR FORMING AN ELECTROACTIVE LAYER
    10.
    发明申请
    PROCESS FOR FORMING AN ELECTROACTIVE LAYER 有权
    形成电镀层的方法

    公开(公告)号:US20110305824A1

    公开(公告)日:2011-12-15

    申请号:US13203279

    申请日:2010-03-09

    IPC分类号: B05D5/12

    摘要: There is provided a process for vacuum drying. The process includes the steps of: depositing a liquid composition containing a film-forming material and at least one solvent onto a workpiece to form a wet layer; placing the wet layer on the workpiece into a vacuum chamber including a condenser; and treating the wet layer at a controlled temperature in the range of −25 to 80° C. and under an applied vacuum in the range of 10−6 to 1,000 Torr for a period of 1-100 minutes; wherein the condenser is maintained at a temperature at which the solvent will condense as a liquid at the applied vacuum.

    摘要翻译: 提供了真空干燥的方法。 该方法包括以下步骤:将含有成膜材料和至少一种溶剂的液体组合物沉积在工件上以形成湿层; 将湿层放置在工件上到包括冷凝器的真空室中; 并在-25〜80℃范围内的控制温度下处理湿层,并在10-6-1000托的施加真空下处理1-100分钟; 其中冷凝器保持在所施加的真空下溶剂将冷凝成液体的温度。