摘要:
A slurry supply system with multiple supply modules and a flushing module concurrently coupled to the multiple supply modules is provided. Each supply module includes a slurry reservoir and at least one delivery line connecting to the slurry reservoir, wherein each delivery line is oriented toward a chemical mechanical polishing apparatus. The flushing module includes a flushing liquid reservoir and multiple flushing lines connecting to the flushing liquid reservoir, wherein each flushing line is coupled to each delivery line thereby the flush module can selectively flush one of the delivery lines.
摘要:
A taste-masking oral dosage form. The taste-masking oral dosage form comprises a pharmaceutically active ingredient, and a starch, wherein the pharmaceutically active ingredient is packaged by the starch to form a microparticle. A method of preparing the taste-masking oral dosage form is also disclosed.
摘要:
The present invention related to an injector is provided. The injector includes a case body, a dose setting, a first engagement, a second engagement, an elasticity element, and a button. The dose setting is used to preset a dose. The first engagement is connected with the dose setting. The elasticity element is connected between the first engagement and the second engagement. When the elasticity element is in an extension state, the first engagement and the second engagement are separated. When the button is pushed, the elasticity element is entered into a compress state to combine the first engagement and the second engagement, and then push the dose setting.
摘要:
A chemical mechanical polishing device used to polish a wafer according to the present invention includes a polishing table, a polishing pad, a slurry supply device, a wafer carrier and a high-pressure liquid cleaning device. The polishing pad is disposed on the polishing table to polish the wafer. The slurry supply device is disposed on the polishing table to supply the slurry. In addition, the wafer carrier is disposed the polishing table to carry the wafer in such a manner that the wafer is brought into contact with the polishing pad. Besides, the high-pressure cleaning device is disposed on the polishing table to remove the impurities on the polishing pad by high-pressure liquid.
摘要:
The present invention provides a fast-disintegrating tablet (RDT) and the method of preparing the RDT. The RDT contains a plurality of microcapsules which contains an active pharmaceutical ingredient surrounded by a polymeric matrix formed by a hydrogel. The microcapsules are separated from each other by a surfactant, particularly lecithin. The RDT is particularly suitable for use as a drug delivery system for antiacid or antiulcer drugs, such as famotidine. The RDT is further characterized by their its fast disintegration time of about 3 second to 3 minutes.
摘要:
A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.
摘要:
A curable organopolysiloxane composition comprises the following: (A) an organopolysiloxane having at least two silicon-bonded alkenyl groups and having an average unit formula (I): (R12SiO2/2)a(R23SiO1/2)b(R3SiO3/2)c(SiO4/2)d(CH2CH2)e; (B) a branched organopolysiloxane having at least one silicon-bonded alkenyl group and having a siloxane unit of formula R4SiO3/2; (C) an organopolysiloxane having an average unit formula (II) being capped with H: (R52SiO2/2)f(R63SiO1/2)g(R7SiO3/2)h(SiO4/2)i(CH2CH2)j; and (D) a catalyst, wherein R1 to R7 and a to j are as defined in the specification.
摘要:
A curable organopolysiloxane composition comprises the following: (A) an organopolysiloxane having at least two silicon-bonded alkenyl groups and having an average unit formula (I): (R12SiO2/2)a(R23SiO1/2)b(R3SiO3/2)c(SiO4/2)d(CH2CH2)e; (B) a branched organopolysiloxane having at least one silicon-bonded alkenyl group and having a siloxane unit of formula R4SiO3/2; (C) an organopolysiloxane having an average unit formula (II) being capped with H: (R52SiO2/2)f(R63SiO1/2)g(R7SiO3/2)h(SiO4/2)i(CH2CH2)j; and (D) a catalyst, wherein R1 to R7 and a to j are as defined in the specification.
摘要:
Enhanced transdermal composition comprising a niosome, which retains within its structure a cyclodextrin inclusion complex of a steroidal active agent and a vesicle of nonionic surfactant are provided herein, which increases the permeability of dermal tissue to transdermally administered steroidal active agents. Methods for producing the enhanced transdermal composition as well as its application are also provided.
摘要:
A chemical mechanical polishing machine and a fabrication process using the same. The chemical mechanical polishing machine comprises a retainer ring having a plurality of slurry passages at the bottom of the retainer ring. The retainer ring further comprises a circular path. By conducting the slurry through the slurry passages and the circular, a wafer is planarized within the chemical mechanical polishing machine.