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    Antimicrobial Dental Materials
    2.
    发明申请
    Antimicrobial Dental Materials 审中-公开
    抗菌牙科材料

    公开(公告)号：US20110275675A1

    公开(公告)日：2011-11-10

    申请号：US13097100

    申请日：2011-04-29

    申请人： Kai Rist ,  Ulrich Salz ,  Volker Rheinberger

    发明人： Kai Rist ,  Ulrich Salz ,  Volker Rheinberger

    IPC分类号： A01N43/40 ,  A01P1/00 ,  C07D401/06

    CPC分类号： A61K6/0005 ,  A61K6/0008 ,  A61K6/0067 ,  A61K6/0088 ,  A61K6/0091 ,  A61K6/0205 ,  A61K6/0023 ,  C08L33/10 ,  C08L33/26 ,  A61K6/0017 ,  A61K6/083 ,  C08L33/08

    摘要： Dental material which contains an antimicrobial active ingredient according to general formula (I), in which R1=H, C1 to C3 alkylene residue; R2=a linear or branched C4 to C20 alkylene residue; R3=a C6 to C20 alkylene residue; and A−=Cl−, Br−, I−, F−, OH−, alkyl and aryl alcoholate, thiolate, NO3−, BO33−, PO43−, HPO42−, H2PO4−, alkyl and aryl phosphate, alkyl and aryl phosphonate, PF6−, TiF62−, BF4−, acetylacetonate, β-diketonate or anion of a β-keto ester. The dental material is suitable in particular as tooth filling material, material for inlays or onlays, tooth cement, enamel/dentine adhesive, veneering material for crowns and bridges, or as material for false teeth.

    摘要翻译： 含有根据通式（I）的抗微生物活性成分的牙科材料，其中R1 = H，C1-C3亚烷基残基; R2 =直链或支链C4至C20亚烷基残基; R3 = C6〜C20亚烷基残基; 和A- = Cl-，Br-，I-，F-，OH-，烷基和芳基醇化物，硫醇盐，NO 3 - ，BO 33-，PO 43 - ，HPO 42 - ，H 2 PO 4 - ，烷基和芳基磷酸酯，烷基和芳基膦酸酯 ，PF6-，TiF62-，BF4-，乙酰丙酮化物和β-酮酸酯或β-酮酯的阴离子。 牙科材料特别适用于牙齿填充材料，嵌体或镶嵌材料，牙膏，牙釉质/牙质粘合剂，冠和桥的饰面材料，或作为假牙的材料。

    Photopolymerizable dental materials with bisacylphosphine oxides as initiators
    3.
    发明授权
    Photopolymerizable dental materials with bisacylphosphine oxides as initiators 有权
    具有双酰基氧化膦作为引发剂的光聚合牙科材料

    公开(公告)号：US07714034B2

    公开(公告)日：2010-05-11

    申请号：US11385058

    申请日：2006-03-21

    申请人： Norbert Moszner ,  Volker M. Rheinberger ,  Ulrich Salz ,  Heinrich Gruber ,  Robert Liska ,  Beate Ganster ,  Gerald Ullrich

    发明人： Norbert Moszner ,  Volker M. Rheinberger ,  Ulrich Salz ,  Heinrich Gruber ,  Robert Liska ,  Beate Ganster ,  Gerald Ullrich

    IPC分类号： C08F2/50 ,  A61K6/00 ,  A61K6/083

    CPC分类号： A61K6/083 ,  A61K6/0023 ,  C08L33/00

    摘要： Polymerizable dental material which contains at least one radically-polymerizable monomer and at least one bisacylphosphine oxide of the Formula I, in which R1 is a linear or branched C2 to C14 alkyl residue, which can be interrupted by one or more O atoms, PG-Y—R2—X— or a substituted or unsubstituted, aromatic C6 to C14 radical; R2 is absent or a linear or branched C1 to C20 alkylene radical, which can be interrupted by one or more O atoms; R3 is H, a linear or branched C1 to C6 alkyl residue or PG-Y—R2—X—; R4 is a linear or branched C1-C6 alkyl or —O—C1-C6 alkyl residue; R5 is H or PG-Y—R2—X—; R6 is H or PG-Y—R213 X—; PG is a polymerizable group; X is absent, O or S; Y is absent, O, S, an ester, amide or urethane group; the bisacylphosphine oxide having at least one PG-Y—R2—X group and X and/or Y being absent if R2 is absent.

    摘要翻译： 含有至少一种可自由基聚合的单体和至少一种式I的双酰基氧化膦的可聚合的牙科材料，其中R 1是可被一个或多个O原子间隔的直链或支链C 2至C 14烷基残基，PG- Y-R2-X或取代或未取代的芳族C 6至C 14基; R2不存在或可被一个或多个O原子中断的直链或支链C1至C20亚烷基; R3是H，直链或支链C1至C6烷基残基或PG-Y-R2-X-; R4是直链或支链C1-C6烷基或-O-C1-C6烷基残基; R5是H或PG-Y-R2-X-; R6是H或PG-Y-R213 X-; PG是可聚合基团; X不存在，O或S; Y不存在，O，S，酯，酰胺或氨基甲酸酯基; 如果R2不存在，则具有至少一个PG-Y-R2-X基团的双酰基氧化膦和X和/或Y不存在。

    Polymerizable compositions with acylgermanium compounds
    4.
    发明申请
    Polymerizable compositions with acylgermanium compounds 有权
    具有酰基锗化合物的可聚合组合物

    公开(公告)号：US20080277814A1

    公开(公告)日：2008-11-13

    申请号：US11902865

    申请日：2007-09-26

    申请人： Norbert Moszner ,  Ulrich Salz ,  Urs Karl Fischer ,  Robert Liska ,  Heinrich Gruber ,  Beate Ganster

    发明人： Norbert Moszner ,  Ulrich Salz ,  Urs Karl Fischer ,  Robert Liska ,  Heinrich Gruber ,  Beate Ganster

    IPC分类号： A61C13/087

    CPC分类号： C08F2/50 ,  A61K6/083 ,  C08F4/72 ,  Y10S522/908 ,  C08L33/00

    摘要： Composition with at least one polymerizable binder and at least one polymerization initiator, which contains at least one acylgermanium compound according to general Formula (I), in which R0 is a substituted or unsubstituted C1-18-alkyl radical or an acyl group; R1 and R2 are H, an acyl group or have one of the meanings given for R3; R3 is a branched or linear C1-18-alkyl radical which can be unsubstituted or substituted one or more times by —O—, —NH—, —NR—, —S— or interrupted by other groups, trimethylsilyl, hal-(CH3)2Si—[OSi(CH3)2]r−, (CH3)3Si—[OSi(CH3)2]r—, —COOH, —COO—R10, —CO—NR11R12, —CO-vinyl, —CO-phenyl, phenyl-C1-4-alkyl, phenyl, naphthyl or biphenyl, C5-12 cycloalkyl, a 5 or 6-membered O, S or N-containing heterocyclic ring, halogen, OH, an aromatic C6-30 radical which can be substituted or unsubstituted and/or interrupted by O, S or —NR—, or a branched, cyclic or linear C1-20 alkyl, -alkenyl, -alkoxy or -alkenoxy radical; m is 1, 2 or 3; n is 0 or 1 and p is 0 or 1; wherein in each case two of the radicals R0, R1, R2 or R3 can be connected to each other accompanied by the formulation of a 5 to 8 member ring; and the use of acylegermanium compounds of Formula (I), for example, as initiator for radical polymerization.

    摘要翻译： 含有至少一种可聚合粘合剂和至少一种聚合引发剂的组合物，其含有至少一种根据通式（I）的酰基锗化合物，其中R 0是取代或未取代的C 1 -18-烷基或酰基; R 1和R 2均为H，酰基或具有R 3给出的含义之一; R 3是支链或直链C 1-18 - 烷基，其可以是未取代的或被-O - ， - NH-，-NR- ，-S-或被其它基团中断，三甲基甲硅烷基，卤代（CH 3）2 Si- [OSi（CH 3）3） （CH 3）3 Si- [OSi（CH 3）3） -COOH，-COO-R 10，-CO-NR， - ， - SO 2 - ， - 11- 12，-CO-乙烯基，-CO-苯基，苯基-C 1-4 - 烷基，苯基，萘基或联苯基，C

    Dental materials based on radically polymerizable macromers with antimicrobial effect
    5.
    发明申请
    Dental materials based on radically polymerizable macromers with antimicrobial effect 有权
    基于可自由基聚合的大分子单体的牙科材料具有抗菌作用

    公开(公告)号：US20070254979A1

    公开(公告)日：2007-11-01

    申请号：US11502420

    申请日：2006-08-11

    申请人： Ulrich Salz ,  Jorg Zimmermann ,  Dirk Poppe ,  Volker Rheinberger ,  Jorg Tiller ,  Christian Waschinski

    发明人： Ulrich Salz ,  Jorg Zimmermann ,  Dirk Poppe ,  Volker Rheinberger ,  Jorg Tiller ,  Christian Waschinski

    IPC分类号： A61K6/08

    CPC分类号： A61K6/0017 ,  A61K6/0023 ,  A61K6/083 ,  A61K6/09 ,  C08L33/00 ,  C08L75/16

    摘要： Dental material which contains at least one compound of the formula [PG]m-R1-Z-SP—Y—R2—[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR′, CONH CONR′, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; R2=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR′, CONH CONR′, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; PG=a radically polymerizable group; SP=a polymeric spacer which is selected from polyethylene glycol, polypropylene glycol, polyglycerol, polyalkyloxazoline, polyethyleneimine, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, polyvinyl acetate, poly-(2-hydroxyethyl)acrylate, poly-(2-hydroxyethyl)methacrylate groups, hydrophilic polypeptide groups and copolymers of the corresponding monomers; WG=antimicrobially active group; Z=is absent, O, S, an ester, amide or urethane group; Y=is absent, O, S, an ester, amide or urethane group, and which has a molecular weight of at least 1.000.

    摘要翻译： 含有至少一种式[PG] m -R 1的化合物的牙科材料-Z-SP-YR 2 - [WG] 其中m = 1,2或3; p = 1,2或3; R 1不存在，可以被O，S中断一次或多次的直链或支链C 1至C 20亚烷基 ，NH，SiR'，CONH CONR'，COO和/或OCONH，取代或未取代的芳族C 6至C 14个基团或其组合; R 2不存在，可以被O，S中断一次或多次的直链或支链C 1至C 20亚烷基 ，NH，SiR'，CONH CONR'，COO和/或OCONH，取代或未取代的芳族C 6至C 14个基团或其组合; PG =自由基聚合性基团; SP =选自聚乙二醇，聚丙二醇，聚甘油，聚烷基恶唑啉，聚乙烯亚胺，聚丙烯酸，聚甲基丙烯酸，聚乙烯醇，聚乙酸乙烯酯，聚（2-羟乙基）丙烯酸酯，聚（2-羟乙基）甲基丙烯酸酯 基团，亲水性多肽组和相应单体的共聚物; WG =抗微生物活性组; Z =不存在，O，S，酯，酰胺或氨基甲酸酯基; Y =不存在，O，S，酯，酰胺或氨基甲酸酯基，其分子量至少为1.000。

    X-ray opaque dental materials
    7.
    发明授权
    X-ray opaque dental materials 失效
    X光透镜牙科材料

    公开(公告)号：US5780668A

    公开(公告)日：1998-07-14

    申请号：US450812

    申请日：1995-05-25

    申请人： Volker Rheinberger ,  Norbert Moszner ,  Ulrich Salz

    发明人： Volker Rheinberger ,  Norbert Moszner ,  Ulrich Salz

    IPC分类号： A61K6/083 ,  C07C69/76 ,  C07C69/78 ,  C07C69/84 ,  C07C69/92 ,  C07C229/54 ,  C07C229/56 ,  C07C229/60 ,  C07C229/64 ,  C07C233/54 ,  C07C233/69 ,  C07C233/75 ,  C08F20/26 ,  C08F20/30 ,  C08F20/34 ,  C08F20/36 ,  C08F220/30 ,  C08F290/00 ,  C08F290/06 ,  C07C69/767 ,  A61C5/08 ,  C07C235/42 ,  C07C235/88

    CPC分类号： A61K6/083 ,  C07C233/54 ,  C07C69/76 ,  C08F220/30

    摘要： X-ray opaque esters or amides of iodosubstituted benzoic acid according to formula I and polymers and dental materials produced therefrom. ##STR1## R.sup.1 =hydrogen or C.sub.1 to C.sub.3 alkyl, preferably H or CH.sub.3 ; R.sup.2 =straight-chain or branched C.sub.1 to C.sub.6 alkylene, oxyalkylene or arylene, preferably C.sub.2 to C.sub.4 alkylene and particularly preferably --CH.sub.2 --CH.sub.2 -- and --CH.sub.2 CH(--)CH.sub.2 --; X=O or NH, preferably O; R.sup.3 -R.sup.7 =at least 3 iodine substituents, preferably in R.sup.3, R.sup.4 and R.sup.6 or R.sup.3, R.sup.5 and R.sup.7 position, the other groups are hydrogen, C.sub.1 to C.sub.6 alkyl, C.sub.1 to C.sub.6 alkoxy, --Cl, --Br, --OH, --NH.sub.2, --N(C.sub.1 to C.sub.6 alkyl).sub.2 or --NH--CO--(C.sub.1 to C.sub.6 alkyl), preferably R.sup.3, R.sup.4, and R.sup.6 are=I and R.sup.5 and R.sup.7 =H, or R.sup.3, R.sup.5 and R.sup.7 =I and R.sup.4 and R.sup.6 =--NH(COCH.sub.3); n=1, 2 or 3, preferably 1 or 2. The benzoic acid esters and amides according to the invention can be well polymerized radically or anionically, the polymers are well soluble in the usual dental monomers. Dental materials produced from the monomers or polymers are characterized in that the X-ray opaque component is bonded covalently into the polymeric matrix material and cannot therefore be washed out. Furthermore, excellent X-ray opacity can be achieved without using fillers.

    摘要翻译： 根据式I的碘取代苯甲酸的X-射线不透明酯或酰胺和由其制备的聚合物和牙科材料。 式I R1 =氢或C1至C3烷基，优选H或CH3; R2 =直链或支链C1至C6亚烷基，氧化烯或亚芳基，优选C2至C4亚烷基，特别优选-CH2-CH2-和-CH2CH（ - ）CH2-; X = O或NH，优选O; R3-R7 =至少3个碘取代基，优选在R3，R4和R6或R3，R5和R7位置，其他基团是氢，C1至C6烷基，C1至C6烷氧基，-Cl，-Br，-OH， -NH 2，-N（C 1至C 6烷基）2或-NH-CO-（C 1至C 6烷基），优选R 3，R 4和R 6为= I且R 5和R 7 = H，或R 3，R 5和R 7 = 和R 4和R 6 = -NH（COCH 3）; n = 1,2或3，优选1或2.根据本发明的苯甲酸酯和酰胺可以完全聚合或阴离子聚合，这些聚合物在通常的牙科单体中很好地溶解。 由单体或聚合物生产的牙科材料的特征在于，X射线不透明组分共价键合到聚合物基体材料中，因此不能被洗掉。 此外，可以在不使用填料的情况下实现优异的X射线不透明度。

    DENTAL MATERIALS BASED ON MONOMERS HAVING DEBONDING-ON-DEMAND PROPERTIES
    9.
    发明申请
    DENTAL MATERIALS BASED ON MONOMERS HAVING DEBONDING-ON-DEMAND PROPERTIES 有权

    公开(公告)号：US20140329929A1

    公开(公告)日：2014-11-06

    申请号：US14343297

    申请日：2012-09-10

    申请人： Norbert Moszner ,  Iris Lamparth ,  Thorsten Bock ,  Urs Karl Fischer ,  Ulrich Salz ,  Volker Rheinberger ,  Robert Liska

    发明人： Norbert Moszner ,  Iris Lamparth ,  Thorsten Bock ,  Urs Karl Fischer ,  Ulrich Salz ,  Volker Rheinberger ,  Robert Liska

    IPC分类号： A61K6/083

    CPC分类号： A61K6/0835 ,  A61K6/0002 ,  A61K6/0023 ,  A61K6/083 ,  C07D239/47 ,  C07F3/06 ,  C08F122/22 ,  C08L33/00

    摘要： The invention relates to a dental restorative material which comprises a thermolabile or photolabile polymerizable compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]1  Formula I, in which T represents a thermolabile or photolabile group, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, wherein at least one Z1 or Z2 is a polymerizable group, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical and k, l, m and n in each case independently are 1, 2 or 3.