Insulating glazing
    2.
    发明授权

    公开(公告)号:US10100572B2

    公开(公告)日:2018-10-16

    申请号:US13805470

    申请日:2011-06-23

    摘要: The invention relates to triple glazing comprising at least one glass sheet that has a system of layers on one side which are produced using sputtering and include at least one metal layer that reflects infrared radiation. The at least one glass sheet has a set of low-emission layers on the other side, said set of layers comprising one or more oxide layers that are deposited using gas phase pyrolysis. The disclosed glazing has a minimum light transmittance of 60 percent (standard EN 410, illuminant D65 at 2°) with 4 mm thick glass sheets.

    TRANSPARENT GLASS SUBSTRATE HAVING A COATING OF CONSECUTIVE LAYERS
    3.
    发明申请
    TRANSPARENT GLASS SUBSTRATE HAVING A COATING OF CONSECUTIVE LAYERS 有权
    透明玻璃衬底,具有相互作用层的涂层

    公开(公告)号:US20140087101A1

    公开(公告)日:2014-03-27

    申请号:US14119332

    申请日:2012-05-23

    IPC分类号: C03C17/34 E06B3/66

    摘要: The invention relates to a transparent glass substrate having a coating including, in order: a first reflected color neutralization layer; a low-emissivity second layer essentially made up of SnO2:F and having a thickness between 455 and 800 nm; and a third layer that is essentially made up of SiOx, x being less than or equal to 2, and has a thickness between 40 and 65 nm or between 140 and 180 nm. The invention also relates to a double glass sheet and a triple glass sheet, manufactured from such a glass substrate, and to a window comprising said glass sheets.

    摘要翻译: 本发明涉及具有涂层的透明玻璃基板,其顺序为:第一反射色中和层; 基本上由SnO 2:F组成并具有455和800nm之间的厚度的低辐射率第二层; 以及基本上由SiOx,x小于或等于2构成的第三层,并且具有40至65nm或140至180nm之间的厚度。 本发明还涉及由这种玻璃基板制造的双层玻璃板和三重玻璃板,以及包括所述玻璃板的窗。

    METHOD AND DEVICE FOR POLARIZING A DBD ELECTRODE
    4.
    发明申请
    METHOD AND DEVICE FOR POLARIZING A DBD ELECTRODE 有权
    用于极化DBD电极的方法和装置

    公开(公告)号:US20120258260A1

    公开(公告)日:2012-10-11

    申请号:US13511163

    申请日:2010-11-23

    IPC分类号: C23C16/503

    摘要: The invention relates to a device for treating the surface of a substrate by means of dielectric barrier discharge for generating a filamentary plasma, including a reaction chamber comprising a mixture having a composition such that, when in contact with the plasma, the mixture decomposes and generates species capable of deposition in the form of a layer mostly or totally on the substrate, wherein at least two electrodes area provided in said chamber, with one electrode being subjected to a high AC voltage, and are arranged on either side of the substrate, at least one dielectric barrier (DBD) arranged between said at least two electrodes, and a THT/HF transformer comprising a secondary circuit, in which a direct current (DC) power source is provided in series in the secondary circuit such that the chemical species generated in the plasma in the form of electrically positive or negative ions are selectively attracted by the target substrate inserted in the reaction chamber and arranged between said at least two electrodes, and repelled by electrodes having a corresponding charge.

    摘要翻译: 本发明涉及一种用于通过用于产生丝状等离子体的电介质阻挡放电来处理衬底表面的装置,包括反应室,该反应室包括具有如下组成的混合物:当与等离子体接触时,混合物分解并产生 能够以基本上或完全在基底上的层的形式沉积的物质,其中设置在所述腔室中的至少两个电极区域,其中一个电极经受高A​​C电压,并且布置在衬底的任一侧上, 布置在所述至少两个电极之间的至少一个介电阻挡层(DBD)和包括次级电路的THT / HF变压器,其中在次级电路中串联地提供直流(DC)电源,使得产生的化学物质 电离正离子等离子体被插入反应室内的目标基板选择性地吸引并排列 在所述至少两个电极之间,并被具有相应电荷的电极排斥。

    Method and device for polarizing a DBD electrode
    5.
    发明授权
    Method and device for polarizing a DBD electrode 有权
    用于极化DBD电极的方法和装置

    公开(公告)号:US09401265B2

    公开(公告)日:2016-07-26

    申请号:US13511163

    申请日:2010-11-23

    摘要: The invention relates to a device for treating the surface of a substrate by means of dielectric barrier discharge for generating a filamentary plasma, including a reaction chamber comprising a mixture having a composition such that, when in contact with the plasma, the mixture decomposes and generates species capable of deposition in the form of a layer mostly or totally on the substrate, wherein at least two electrodes area provided in said chamber, with one electrode being subjected to a high AC voltage, and are arranged on either side of the substrate, at least one dielectric barrier (DBD) arranged between said at least two electrodes, and a THT/HF transformer comprising a secondary circuit, in which a direct current (DC) power source is provided in series in the secondary circuit such that the chemical species generated in the plasma in the form of electrically positive or negative ions are selectively attracted by the target substrate inserted in the reaction chamber and arranged between said at least two electrodes, and repelled by electrodes having a corresponding charge.

    摘要翻译: 本发明涉及一种用于通过用于产生丝状等离子体的电介质阻挡放电来处理衬底表面的装置,包括反应室,该反应室包括具有如下组成的混合物:当与等离子体接触时,混合物分解并产生 能够以基本上或完全在基底上的层的形式沉积的物质,其中设置在所述腔室中的至少两个电极区域,其中一个电极经受高A​​C电压,并且布置在衬底的任一侧上, 布置在所述至少两个电极之间的至少一个介电阻挡层(DBD)和包括次级电路的THT / HF变压器,其中在次级电路中串联地提供直流(DC)电源,使得产生的化学物质 电离正离子等离子体被插入反应室内的目标基板选择性地吸引并排列 在所述至少两个电极之间,并被具有相应电荷的电极排斥。

    Process for depositing films simultaneously onto both sides of a substrate
    6.
    发明授权
    Process for depositing films simultaneously onto both sides of a substrate 有权
    同时将薄膜沉积在基材的两面上的工艺

    公开(公告)号:US09005718B2

    公开(公告)日:2015-04-14

    申请号:US13054090

    申请日:2009-07-16

    摘要: A process for the simultaneous deposition of films onto both sides of a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (106, 206) or making said substrate run therethrough, in which chamber at least two electrodes (110, 210) are placed. At least one dielectric barrier (14, 114) is placed between these at least two electrodes (110, 210). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma (112, 212) on each side of the substrate between the at least two electrodes (110, 210).

    摘要翻译: 一种用于将薄膜同时沉积到基底(2)的两侧上的方法,其特别地包括将基底(2)引入反应室(106,206)或使所述基底穿过其中,其中至少两个 放置电极(110,210)。 至少一个电介质阻挡层(14,114)被放置在这些至少两个电极(110,210)之间。 可变电感器(L)与包括至少两个电极的电路并联放置在变压器的次级电路中。 产生高频电压,所述电压使得其在至少两个电极(110,210)之间的衬底的每一侧上产生丝状等离子体(112,212)。

    Process and installation for depositing films onto a substrate
    7.
    发明授权
    Process and installation for depositing films onto a substrate 有权
    用于将薄膜沉积到基底上的工艺和安装

    公开(公告)号:US08753723B2

    公开(公告)日:2014-06-17

    申请号:US13054284

    申请日:2009-07-16

    摘要: A process for depositing a film onto a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (6, 106, 206), in which at least two electrodes (10, 110, 210) are placed. A high-frequency electrical voltage is generated, said voltage being such that it generates filamentary plasma (12, 112, 212) between the two electrodes (10, 110, 210). An adjustable inductor (L) placed in parallel with the inductor of the installation generating the electrical voltage is employed so as to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112, 212).

    摘要翻译: 一种用于将膜沉积到基底(2)上的方法,其特征在于,特别地将基底(2)引入反应室(6,106,206)中,其中放置了至少两个电极(10,110,210) 。 产生高频电压,所述电压使得它在两个电极(10,110,210)之间产生丝状等离子体(12,112,212)。 采用与产生电压的装置的电感并联放置的可调节电感器(L),以减小所产生的电压和电流之间的相移并增加电流在等离子体中流动的时间(12 ,112,212)。

    PROCESS AND INSTALLATION FOR SURFACE PREPARATION BY DIELECTRIC BARRIER DISCHARGE
    8.
    发明申请
    PROCESS AND INSTALLATION FOR SURFACE PREPARATION BY DIELECTRIC BARRIER DISCHARGE 有权
    电介质放电的表面处理工艺及其安装

    公开(公告)号:US20110174333A1

    公开(公告)日:2011-07-21

    申请号:US13054311

    申请日:2009-07-16

    IPC分类号: C25F1/00

    摘要: A process for surface preparation of a substrate (2), which comprises introducing or running a substrate (2) into a reaction chamber (6, 106). A dielectric barrier (14, 114) is placed between electrodes (1, 10, 110). A high-frequency electrical voltage is generated, to generate filamentary plasma (12, 112). Molecules (8, 108) are introduced into the reaction chamber (6, 106). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112).

    摘要翻译: 一种用于表面制备基底(2)的方法,其包括将基底(2)引入或运行到反应室(6,106)中。 介电阻挡层(14,114)被放置在电极(1,10,110)之间。 产生高频电压,以产生丝状等离子体(12,112)。 将分子(8,108)引入反应室(6,106)中。 与等离子体接触时,它们产生典型的与基底表面反应的活性物质。 采用与设备的电感并联放置的可调电感器(L)来减小所产生的电压和电流之间的相移并增加电流在等离子体(12,112)中流动的时间。

    Process and installation for surface preparation by dielectric barrier discharge
    9.
    发明授权
    Process and installation for surface preparation by dielectric barrier discharge 有权
    介质阻挡放电用于表面处理的工艺和安装

    公开(公告)号:US08470095B2

    公开(公告)日:2013-06-25

    申请号:US13054311

    申请日:2009-07-16

    IPC分类号: C23G16/4405

    摘要: A process for surface preparation of a substrate (2), which comprises introducing or running a substrate (2) into a reaction chamber (6, 106). A dielectric barrier (14, 114) is placed between electrodes (1, 10, 110). A high-frequency electrical voltage is generated, to generate filamentary plasma (12, 112). Molecules (8, 108) are introduced into the reaction chamber (6, 106). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112).

    摘要翻译: 一种用于表面制备基底(2)的方法,其包括将基底(2)引入或运行到反应室(6,106)中。 介电阻挡层(14,114)被放置在电极(1,10,110)之间。 产生高频电压,以产生丝状等离子体(12,112)。 将分子(8,108)引入反应室(6,106)中。 与等离子体接触时,它们产生典型的与基底表面反应的活性物质。 采用与设备的电感并联放置的可调电感器(L)来减小所产生的电压和电流之间的相移并增加电流在等离子体(12,112)中流动的时间。

    Coated substrate with high reflectance
    10.
    发明授权
    Coated substrate with high reflectance 有权
    涂层基材具有高反射率

    公开(公告)号:US07776460B2

    公开(公告)日:2010-08-17

    申请号:US11923809

    申请日:2007-10-25

    IPC分类号: B32B9/00 B32B17/06

    摘要: A transparent coated substrate with high reflectance, especially for use as in exterior glazing panels for buildings, is provided by a substrate carrying a coating stack comprising a pyrolytically-formed main layer containing oxides of tin and antimony, in which the main layer has a geometric thickness of at least 250 nm and the stack includes an outer reflective layer having a geometric thickness in the range 30 to 150 nm and a refractive index in the range 2.0 to 2.8, whereby the so-coated substrate has a reflectance (RL) of more than 10%.

    摘要翻译: 具有高反射率的透明涂层基材,特别是用作建筑物的外部玻璃板,由承载包括含有氧化锡和锑的热解形成的主层的涂层的基材提供,其中主层具有几何 至少250nm的厚度,并且该堆叠包括几何厚度在30至150nm范围内且折射率在2.0至2.8范围内的外部反射层,由此涂覆的基底的反射率(RL)更大 超过10%。