摘要:
An ammonia purification system includes a hydrocarbon removal station that removes hydrocarbons from gaseous ammonia via adsorption, a moisture removal station that removes water from gaseous ammonia via adsorption, and a distillation station including a distillation column connected with a condenser to facilitate removal of impurities from ammonia and condensation of gaseous ammonia to form a purified liquid ammonia product. The system further includes a storage tank to receive purified ammonia, a remote station connected with the storage tank, and a vaporizer connected with the storage tank. The vaporizer is configured to receive and vaporize liquid ammonia from the storage tank and deliver gaseous ammonia back to the storage tank so as to facilitate pumping of the ammonia to the remote station based upon a vapor pressure established within the storage tank.
摘要:
Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical to a point of use or to another integral block are provided. More particularly, the integral blocks include a recharge container block, a pressurization gas block, a purge gas block, a waste recovery block, a vacuum block, a solvent supply block, a degas block, a control block, and a filtration block. Various integral blocks may be selected to form a chemical delivery system, which is particularly suited for a given application. A chemical delivery system will typically comprise a chemical container block, a chemical delivery block, and a point of use in line with the chemical container block and chemical delivery block, as well as one or more integral blocks. The invention also relates to a method for delivering an ultrapure chemical from a chemical container to a point of use, by connecting a chemical container block, containing an ultrapure chemical, to a chemical delivery block and introducing the ultrapure chemical to a point of use. The methods may also include the use of one or more integral blocks. The chemical delivery systems and methods of the invention may be used in a variety of applications. In particular, the invention may be used in electronics fabrication, optical fiber manufacture or semiconductor manufacture.
摘要:
An ammonia purification system includes a hydrocarbon removal station that removes hydrocarbons from gaseous ammonia via adsorption, a moisture removal station that removes water from gaseous ammonia via adsorption, and a distillation station including a distillation column connected with a condenser to facilitate removal of impurities from ammonia and condensation of gaseous ammonia to form a purified liquid ammonia product. The system further includes a storage tank to receive purified ammonia, a remote station connected with the storage tank, and a vaporizer connected with the storage tank. The vaporizer is configured to receive and vaporize liquid ammonia from the storage tank and deliver gaseous ammonia back to the storage tank so as to facilitate pumping of the ammonia to the remote station based upon a vapor pressure established within the storage tank.
摘要:
An apparatus and method for holding a solid precursor in a sublimator such that the solid precursor can be vaporized for saturating a carrier gas. The apparatus may include alternating disks or shelves that form inner and outer passages, as well as spaces between the disks for fluidicly coupling the passages to create a winding, tortuous fluid flow path through the sublimator for optimizing solid vapor saturation. The method may include directing a carrier gas into a sublimation chamber, around the first shelf in the outer passage, over the first shelf in the space, around the second shelf in the inner passage, and back out of the sublimation chamber.
摘要:
Briefly, this invention uses one or more pressure vessels having installed therein on its inside a balloon of flexible and non-expandable wall to smoothly and continuously deliver a chemical to any end user without contamination and gas dissolution. Since the balloon installed inside the pressure vessel isolates a high pressure gas from the chemicals, gas dissolution in the chemical and the resulted gas bubble problems are effectively eliminated. Further, contaminants in the high pressure gas which fills the balloon will not be transferred into the chemical and the extremely toxic chemical will not be transferred into the gas to be exhausted as a serious environmental issue. Unlike the vacuum/pressure system, the contamination by the ambient air leaking into the system is avoided because the disclosed delivery system is always with the pressure higher or equal to the ambient pressure.
摘要:
A chemical manufacturing system includes an air compressor configured to receive and pressurize a stream of air to a selected pressure, an air separation unit configured to receive pressurized air from the air compressor and generate a stream of oxygen and a stream of nitrogen at selected purity levels from the pressurized air, a chemical generation system configured to receive at least the stream of oxygen from the air separation unit, and a reactant supply to provide a reactant to the chemical generation system. During system operation, the reactant is oxidized to form a product within the chemical generation system. In one embodiment, the reactant is paraxylene, and the chemical generation system produces a terephthalic acid product.
摘要:
Apparatus and processes are presented to contact a dry, preferably high purity inert gas with a chemical composition in a pressure vessel, or a wetting composition, to form a wet inert gas, which is then used to pressurize the chemical composition out of the pressure vessel. No additional space is needed for an external humidifier. Since a very small amount of vapor is needed to form a wet inert gas, the composition of chemical composition will not be significantly affected.
摘要:
Systems and methods of purifying a silicon-containing material include the step of directing the silicon-containing material in a liquid state through an adsorption unit including an adsorbent material to facilitate adsorption of at least one component from the silicon-containing material. Alternatively, the silicon-containing material is directed, in liquid state and/or gaseous state, through two or more purification units, including an adsorption unit, a vaporization unit, a filter unit and a condenser. The silicon-containing material can be a low-k silicon-containing material such as trimethylsilane, tetramethylsilane, dimethyldimethoxysilane, tetramethylcyclotetrasiloxane, octamethylcyclotetrasiloxane, dimethylphenyl silane, and dimethyldivinyl silane.