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    Methods for annealing block copolymers and articles manufactured therefrom
    5.
    发明授权
    Methods for annealing block copolymers and articles manufactured therefrom 有权
    由此制备嵌段共聚物和制品的方法

    公开(公告)号：US09394411B2

    公开(公告)日：2016-07-19

    申请号：US14580300

    申请日：2014-12-23

    申请人： Dow Global Technologies LLC ,  ROHM AND HAAS ELECTRONIC MATERIALS LLC

    发明人： Shih-Wei Chang ,  Jong Keun Park ,  John W. Kramer ,  Erin B. Vogel ,  Phillip D. Hustad ,  Peter Trefonas, III

    IPC分类号： C08G77/442 ,  B29C71/00 ,  B29C71/02 ,  B29C59/14 ,  B81C1/00 ,  G03F7/00 ,  B29C59/02

    CPC分类号： C08G77/442 ,  B29C59/14 ,  B29C71/0009 ,  B29C71/02 ,  B29C2059/023 ,  B29C2071/022 ,  B81C1/00 ,  G03F7/0002

    摘要： Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; where the vinyl aromatic monomer has at least one alkyl substitution on an aromatic ring; a second block derived from a siloxane monomer; where a chi parameter that measures interactions between the first block and the second block is 0.03 to 0.18 at a temperature of 200° C. Disclosed herein is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing a siloxane monomer; and where the block copolymer has a chi parameter of 0.03 to 0.18 at a temperature of 200° C.; where the chi parameter is a measure of interactions between the first block and the second block of the copolymer.

    摘要翻译： 本文公开了包含衍生自乙烯基芳族单体的第一嵌段的嵌段共聚物; 其中乙烯基芳族单体在芳环上具有至少一个烷基取代; 衍生自硅氧烷单体的第二嵌段; 其中测量第一块和第二嵌段之间的相互作用的chi参数在200℃的温度下为0.03至0.18。本文公开了一种方法，其包括聚合乙烯基芳族单体以形成第一嵌段; 并将第二嵌段聚合到所述第一嵌段上以形成嵌段共聚物; 其中第二嵌段通过聚合硅氧烷单体得到; 嵌段共聚物在200℃的温度下的chi参数为0.03〜0.18。 其中chi参数是共聚物的第一嵌段和第二嵌段之间相互作用的量度。

    Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device
    8.
    发明授权
    Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device 有权
    包含含有光酸产生剂的端基的聚合物，包含聚合物的光致抗蚀剂，以及制造器件的方法

    公开(公告)号：US09052589B2

    公开(公告)日：2015-06-09

    申请号：US14012174

    申请日：2013-08-28

    申请人： Dow Global Technologies LLC

    发明人： John W. Kramer ,  Daniel J. Arriola

    IPC分类号： G03F7/004 ,  G03F7/20 ,  C08F2/38 ,  G03F7/039 ,  C08F220/28 ,  C08F220/18 ,  C08F220/38

    CPC分类号： G03F7/0041 ,  C08F2/38 ,  C08F220/28 ,  C08F2220/1891 ,  C08F2220/387 ,  C08F2438/03 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  C08F2220/282 ,  C08F2220/1866 ,  C08F220/24

    摘要： A polymer comprises the polymerized product of unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of the foregoing monomers, with a chain transfer agent of Formula (I); wherein in Formula (I), Z is a y valent C1-20 organic group, L is a heteroatom or a single bond, A1 and A2 are each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently C1-40 alkylene, C3-40 cycloalkylene, C6-40 arylene, or C7-40 aralkylene, and A1 contains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, X1 is a single bond, —O—, —S—, —C(═O)—O—, —O—C(═O)—, —O—C(═O)—O—, —C(═O)—NR—, —NR—C(═O)—, —NR—C(═O)—NR—, —S(═O)2—O—, —O—S(═O)2—O—, —NR—S(═O)2—, or —S(═O)2—NR, wherein R is H, C1-10 alkyl, C3-10 cycloalkyl or C6-10 aryl, Y− is an anionic group, G+ is a metallic or non-metallic cation, and y is an integer of 1 to 6. A photoresist composition comprising the polymer, a coated substrate, comprising a layer of the photoresist composition, and a method of forming an electronic device from the photoresist, are also disclosed.

    摘要翻译： 聚合物包含不饱和单体的聚合产物，其包含酸可脱保护的单体，可溶于碱的单体，含内酯的单体，产生光致酸的单体或包含至少一种前述单体的组合与链转移 式（I）的试剂; 其中在式（I）中，Z是一价C 1-20有机基团，L是杂原子或单键，A1和A2各自独立地为含酯或非酯，并且为氟化或非氟化的，并且独立地为 C 1-4亚烷基，C 3-40亚环烷基，C 6-40亚芳基或C 3-40亚芳基，并且A1含有与硫连接点的腈，酯或芳基取代基α，X1是单键，-O - ， - S - ， - C（= O）-O-，-O-C（= O） - ， - O-C（= O）-O-，-C（= -C（= O） - ， - NR-C（= O）-NR - ， - S（= O）2-O-，-O-S（= O）2-O-，-NR-S O）2-或-S（= O）2 -NR，其中R是H，C 1-10烷基，C 3-10环烷基或C 6-10芳基，Y-是阴离子基团，G +是金属或非金属， 金属阳离子，y为1〜6的整数。包含聚合物的光致抗蚀剂组合物，包含光致抗蚀剂组合物的层的涂布基材，以及从该光刻胶形成电子器件的方法 抗拒，也被披露。

    COMPOSITION CONTAINING AMINIUM RADICAL CATION
    9.
    发明申请
    COMPOSITION CONTAINING AMINIUM RADICAL CATION 审中-公开

    公开(公告)号：US20190252618A1

    公开(公告)日：2019-08-15

    申请号：US16329839

    申请日：2017-10-20

    申请人： Dow Global Technologies LLC

    发明人： Robert David Grigg ,  Liam P. Spencer ,  John W. Kramer ,  David D. Devore ,  Brian Goodfellow ,  Chun Liu ,  Sukrit Mukhopadhyay ,  Thomas H. Peterson ,  William H. H. Woodward ,  Anatoliy N. Sokolov

    IPC分类号： H01L51/00 ,  H01L51/50

    CPC分类号： H01L51/0042 ,  H01L51/008 ,  H01L51/0081 ,  H01L51/0082 ,  H01L51/5056 ,  H01L51/5088

    摘要： Provided is an organic light-emitting diode comprising a substrate, an anode layer, optionally one or more hole injection layers, one or more hole transport layers, optionally one or more electron blocking layers, an emitting layer, optionally one or more hole blocking layers, optionally one or more electron transport layers, an electron injection layer, and a cathode, wherein either the hole injection layer, or the hole transport layer, or both of the hole injection layer and the hole transport layer, or layer that functions as both a hole injection layer and a hole transport layer, comprises a polymer that comprises one or more triaryl aminium radical cations having the structure (S1) wherein each of R11, R12, R13, R14, R15, R21, R22, R23, R24, R25, R31, R32, R33, R34, and R35 is independently selected from the group consisting of hydrogen, deuterium halogens, amine groups, hydroxyl groups, sulfonate groups, nitro groups, and organic groups, wherein two or more of R11, R12, R13, R14, R15, R21, R22, R23, R24, R25, R31, R32, R33, R34, and R35 are optionally connected to each other to form a ring structure; wherein one or more of R11, R12, R13, R14, R15, R21, R22, R23, R24, R25, R31, R32, R33, R34, and R35 is covalently bound to the polymer, and wherein A is an anion.