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    Fluid waveguide and uses thereof
    1.
    发明申请
    Fluid waveguide and uses thereof 审中-公开
    流体波导及其用途

    公开(公告)号：US20090097808A1

    公开(公告)日：2009-04-16

    申请号：US11658339

    申请日：2005-08-01

    申请人： Daniel B. Wolfe ,  Kateri E. Paul ,  Dmitri V. Vezenov ,  Brian T. Mayers ,  Richard S. Conroy ,  Piotr Garstecki ,  Michael A. Fischbach ,  Valentine I. Vullev ,  Kam Yan Tang ,  Mara G. Prentiss ,  George M. Whitesides

    发明人： Daniel B. Wolfe ,  Kateri E. Paul ,  Dmitri V. Vezenov ,  Brian T. Mayers ,  Richard S. Conroy ,  Piotr Garstecki ,  Michael A. Fischbach ,  Valentine I. Vullev ,  Kam Yan Tang ,  Mara G. Prentiss ,  George M. Whitesides

    IPC分类号： G02B6/032

    CPC分类号： G02B6/032 ,  G02B6/10 ,  G02B6/122

    摘要： The invention relates to methods and apparatuses for guiding and emitting electromagnetic radiation from a fluid waveguide. Various methods for changing optical properties (e.g., refractive index, absorption, and fluorescence) and/or physical properties (e.g., magnetic susceptibility, electrical conductivity, and temperature) of either the waveguide core or the cladding, or both, are provided herein. In one embodiment, electromagnetic radiation is guided and/or emitted at multiple distinct wavelengths, including emission in the form of an essentially continuous band, in some cases covering at least 150 nanometers. In another embodiment, methods for splitting a waveguide core and/or the joining of at least two waveguide cores in a waveguide are provided. In yet another embodiment, the invention includes the use of thermal gradients to generate a waveguide and/or to change the properties of waveguides. Embodiments of the waveguides may be used for optical detection or spectroscopic analysis.

    摘要翻译： 本发明涉及用于引导和发射来自流体波导的电磁辐射的方法和装置。 本文提供用于改变波导芯或包层或两者的光学性质（例如，折射率，吸收和荧光）和/或物理性质（例如磁化率，导电性和温度）的各种方法。 在一个实施例中，电磁辐射是以多个不同的波长被引导和/或发射的，包括基本连续带形式的发射，在某些情况下覆盖至少150纳米。 在另一个实施例中，提供了用于在波导中分离波导芯和/或至少两个波导芯的接合的方法。 在另一个实施例中，本发明包括使用热梯度来产生波导和/或改变波导的性质。 波导的实施例可以用于光学检测或光谱分析。

    Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
    2.
    发明授权
    Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element 有权
    透明弹性体，接触模式光刻掩模，传感器和波前工程元件

    公开(公告)号：US06753131B1

    公开(公告)日：2004-06-22

    申请号：US09422611

    申请日：1999-10-21

    申请人： John A. Rogers ,  Rebecca J. Jackman ,  Kateri E. Paul ,  Olivier J. A. Schueller ,  Tricia Lynn Breen ,  George M. Whitesides

    发明人： John A. Rogers ,  Rebecca J. Jackman ,  Kateri E. Paul ,  Olivier J. A. Schueller ,  Tricia Lynn Breen ,  George M. Whitesides

    IPC分类号： G03C500

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/34 ,  G03F1/50 ,  G03F1/60 ,  G03F7/0002

    摘要： A contact-mode photolithography phase mask includes a diffracting surface having a plurality of indentations and protrusions. The protrusions are brought into contact with a surface of positive photoresist, and the surface exposed to electromagnetic radiation through the phase mask. The phase shift due to radiation passing through the indentations as opposed to the protrusions is essentially complete. Minima in intensity of electromagnetic radiation are thereby produced at boundaries between the indentations and protrusions. The elastomeric mask conforms well to the surface of photoresist and, following development, features smaller than 100 nm can be obtained. Patterns including curved portions are obtained, as well as curved and/or linear patterns on non-planar surfaces. An elastomeric transparent diffraction grating serves also as a spatial light modulator photothermal detector, strain gauge, and display device. A technique for simplified photolithography is also described. A photoreactive, contoured surface is exposed to electricmagnetic radiation and contours in the surface alters the electromagnetic radiation to promote selective surface photoreaction. The contours can act as lenses, gratings, or the like, such that the photoreactive surface itself can selectively direct uniform radiation to promote selective photoreaction within itself. A photoresist layer having a contoured surface thus can be exposed to uniform radiation, without a mask, followed by development and lift-off to create a photoresist pattern that can be used in any of a variety of ways. The invention provides methods of making contoured, photoreactive surfaces, and contoured photoreactive surfaces themselves.

    摘要翻译： 接触模式光刻相位掩模包括具有多个凹陷和突起的衍射表面。 突起与正性光致抗蚀剂的表面接触，并且表面暴露于通过相位掩模的电磁辐射。 与突起相反的通过压痕的辐射的相移基本上完成。 因此，在凹陷和突起之间的边界处产生电磁辐射强度的微小。 弹性体掩模与光致抗蚀剂的表面相适应，并且在显影之后，可以获得小于100nm的特征。 获得包括弯曲部分的图案，以及在非平面表面上的曲线和/或线性图案。 弹性透明衍射光栅还用作空间光调制器光热检测器，应变计和显示装置。 还描述了用于简化光刻的技术。 光反应的轮廓表面暴露于电磁辐射，并且表面中的轮廓改变电磁辐射以促进选择性表面光反应。 轮廓可以用作透镜，光栅等，使得光反应表面本身可以选择性地引导均匀的辐射以促进其本身内的选择性光反应。 因此，具有轮廓表面的光致抗蚀剂层可以暴露于均匀的辐射，而不需要掩模，然后显影和剥离以产生可以以各种方式中的任何一种使用的光致抗蚀剂图案。 本发明提供了制造轮廓，光反应表面和轮廓光反应表面本身的方法。

    Microlens for projection lithography and method of preparation thereof
    3.
    发明授权
    Microlens for projection lithography and method of preparation thereof 有权
    用于投影光刻的微透镜及其制备方法

    公开(公告)号：US07403338B2

    公开(公告)日：2008-07-22

    申请号：US11333764

    申请日：2006-01-17

    申请人： Ming-Hsien Wu ,  George M. Whitesides ,  Kateri E. Paul

    发明人： Ming-Hsien Wu ,  George M. Whitesides ,  Kateri E. Paul

    IPC分类号： G02B3/00 ,  G03B27/52

    CPC分类号： G02B3/0031 ,  B82Y30/00 ,  G02B1/005 ,  G02B3/0012 ,  G02B3/0018 ,  G02B3/0056 ,  G02B7/025 ,  G02B7/027 ,  G03F7/70275

    摘要： Methods and systems for effecting responses on surfaces utilizing microlens arrays including microoptical components embedded or supported by a support element and positioned from the surface at a distance essentially equal to the image distance of the microoptical component with spacer elements are disclosed. Microlens arrays can be used to manipulate incident energy or radiation having a distribution in characteristic property(s) defining an object pattern to form a corresponding image pattern on a substrate surface. The energy can be light having a pattern or a specific wavelength, intensity or polarization or coherence alignment. The image pattern can have features of order 100 nm in size or less produced from corresponding object patterns having features in the order millimeters. The size of the object pattern can be reduced by the microlens arrays described by a factor of 100 or more using a single step process to form the image patterns.

    摘要翻译： 公开了利用微透镜阵列来影响表面上的响应的方法和系统，包括由支撑元件嵌入或支撑并且基本上等于微光学部件与间隔元件的图像距离的表面定位的微光学部件。 可以使用微透镜阵列来操纵具有限定对象图案的特性的分布的入射能量或辐射，以在衬底表面上形成对应的图像图案。 能量可以是具有图案或特定波长，强度或极化或相干对准的光。 图像图案可以具有尺寸为100nm的特征，或者具有从具有毫米级的特征的相应对象图案产生的特征。 通过使用单步骤处理形成图像图案的100倍或更大的微透镜阵列可以减小对象图案的尺寸。

    Microlens for projection lithography and method of preparation thereof
    4.
    发明授权
    Microlens for projection lithography and method of preparation thereof 有权
    用于投影光刻的微透镜及其制备方法

    公开(公告)号：US07057832B2

    公开(公告)日：2006-06-06

    申请号：US10384080

    申请日：2003-03-07

    申请人： Ming-Hsien Wu ,  Kateri E. Paul ,  George M. Whitesides

    发明人： Ming-Hsien Wu ,  Kateri E. Paul ,  George M. Whitesides

    IPC分类号： G02B7/02

    CPC分类号： G02B3/0031 ,  B82Y30/00 ,  G02B1/005 ,  G02B3/0012 ,  G02B3/0018 ,  G02B3/0056 ,  G02B7/025 ,  G02B7/027 ,  G03F7/70275

    摘要： Methods and systems for effecting responses on surfaces utilizing microlens arrays including microoptical components embedded or supported by a support element and positioned from the surface at a distance essentially equal to the image distance of the microoptical component with spacer elements are disclosed. Microlens arrays can be used to manipulate incident energy or radiation having a distribution in characteristic property(s) defining an object pattern to form a corresponding image pattern on a substrate surface. The energy can be light having a pattern or a specific wavelength, intensity or polarization or coherence alignment. The image pattern can have features of order 100 nm in size or less produced from corresponding object patterns having features in the order millimeters. The size of the object pattern can be reduced by the microlens arrays described by a factor of 100 or more using a single step process to form the image patterns.

    摘要翻译： 公开了利用微透镜阵列来影响表面上的响应的方法和系统，包括由支撑元件嵌入或支撑并且基本上等于微光学部件与间隔元件的图像距离的表面定位的微光学部件。 可以使用微透镜阵列来操纵具有限定对象图案的特性的分布的入射能量或辐射，以在衬底表面上形成对应的图像图案。 能量可以是具有图案或特定波长，强度或极化或相干对准的光。 图像图案可以具有尺寸为100nm的特征，或者具有从具有毫米级的特征的相应对象图案产生的特征。 通过使用单步骤处理形成图像图案的100倍或更大的微透镜阵列可以减小对象图案的尺寸。

    Patterning using wax printing and lift off
    5.
    发明授权
    Patterning using wax printing and lift off 有权
    图案使用蜡印刷和剥离

    公开(公告)号：US07309563B2

    公开(公告)日：2007-12-18

    申请号：US10741252

    申请日：2003-12-19

    申请人： Kateri E. Paul ,  William S. Wong ,  Steven E. Ready ,  René A. Lujan

    发明人： Kateri E. Paul ,  William S. Wong ,  Steven E. Ready ,  René A. Lujan

    IPC分类号： G03C5/00

    CPC分类号： H01L21/31144 ,  H01L21/0272 ,  H01L21/0335 ,  H01L21/76802

    摘要： A method for performing a liftoff operation involves printing a liftoff pattern using low-resolution patterning techniques to form fine feature patterns. The resulting feature size is defined by the spacing between printed patterns rather than the printed pattern size. By controlling the cross-sectional profile of the printed liftoff pattern, mask structures may be formed from the liftoff operation having beneficial etch-mask aperture profiles. For example, a multi-layer printed liftoff pattern can be used to create converging aperture profiles in a patterned layer. The patterned layer can then be used as an etch mask, where the converging aperture profiles result in desirable diverging etched features.

    摘要翻译： 用于执行提升操作的方法包括使用低分辨率图案化技术打印提升图案以形成精细的特征图案。 所得到的特征尺寸由印刷图案之间的间距而不是印刷图案尺寸定义。 通过控制印刷的剥离图案的横截面轮廓，可以从具有有利的蚀刻掩模孔径轮廓的提升操作形成掩模结构。 例如，可以使用多层印刷提升图案来在图案化层中形成会聚孔径轮廓。 然后可以将图案化层用作蚀刻掩模，其中会聚孔径轮廓导致期望的发散蚀刻特征。