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    METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANALYSIS USING OPTICAL CRITICAL DIMENSION (OCD) METROLOGY
    2.
    发明申请
    METHOD OF OPTIMIZING AN OPTICAL PARAMETRIC MODEL FOR STRUCTURAL ANALYSIS USING OPTICAL CRITICAL DIMENSION (OCD) METROLOGY 有权
    使用光学关键尺寸（OCD）方法优化结构分析的光学参数模型的方法

    公开(公告)号：US20120323356A1

    公开(公告)日：2012-12-20

    申请号：US13164398

    申请日：2011-06-20

    申请人： Thaddeus G. Dziura ,  Yung-Ho Chuang ,  Bin-Ming Benjamin Tsai ,  Xuefeng Liu ,  John J. Hench

    发明人： Thaddeus G. Dziura ,  Yung-Ho Chuang ,  Bin-Ming Benjamin Tsai ,  Xuefeng Liu ,  John J. Hench

    IPC分类号： G06F19/00 ,  G06F17/50

    CPC分类号： G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/956 ,  G01N2021/95615 ,  G03F7/70625 ,  G06F17/5009

    摘要： Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.

    摘要翻译： 描述了使用光学关键尺寸度量结构分析的光学参数模型的优化。 一种方法包括确定适合结构参数的第一光学模型。 第一个光学模型拟合是基于结构的第一个模型的数量域。 对于第一量的量域确定第一近场光响应，并且针对量的第二个不同数量的量确定第二近场光响应。 比较第一和第二近场光响应，以定位用于结构参数的高光场强度的公共区域。 该结构的第一个模型被修改以提供第二个不同的结构模型。 基于结构的第二个模型，确定结构参数的第二个不同的光学模型拟合。

    System and method for analyzing topological features on a surface
    5.
    发明授权
    System and method for analyzing topological features on a surface 失效
    用于分析表面拓扑特征的系统和方法

    公开(公告)号：US6137570A

    公开(公告)日：2000-10-24

    申请号：US107391

    申请日：1998-06-30

    申请人： Yung-Ho Chuang ,  J. Joseph Armstrong ,  David L. Brown ,  Jason Z. Lin ,  Bin-Ming Benjamin Tsai

    发明人： Yung-Ho Chuang ,  J. Joseph Armstrong ,  David L. Brown ,  Jason Z. Lin ,  Bin-Ming Benjamin Tsai

    IPC分类号： G01B11/30 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01N21/00

    CPC分类号： G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G03F7/7065 ,  G01N21/4788 ,  G01N21/95692

    摘要： Disclosed is a method and apparatus for using far field scattered and diffracted light to determine whether a collection of topological features on a surface (e.g., a semiconductor wafer) conforms to an expected condition or quality. This determination is made by comparing the far field diffraction pattern of a surface under consideration with a corresponding diffraction pattern (a "baseline"). If the baseline diffraction pattern and far field diffraction pattern varies by more than a prescribed amount or in characteristic ways, it is inferred that the surface features are defective. The method may be implemented as a die-to-die comparison of far field diffraction patterns of two dies on a semiconductor wafer. The portion of the far field scattered and diffracted light sensitive to a relevant condition or quality can also be reimaged to obtain an improved signal-to-noise ratio.

    摘要翻译： 公开了一种使用远场散射和衍射光来确定表面（例如，半导体晶片）上的拓扑特征的集合是否符合预期状态或质量的方法和装置。 通过将考虑的表面的远场衍射图与相应的衍射图案（“基线”）进行比较来进行该确定。 如果基线衍射图案和远场衍射图案变化超过规定量或以特征方式，则推断表面特征是有缺陷的。 该方法可以实现为半导体晶片上的两个管芯的远场衍射图案的管芯与管芯的比较。 对于相关条件或质量敏感的远场散射和衍射光的部分也可以被重新成像以获得改善的信噪比。

    EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers
    6.
    发明授权
    EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers 有权
    EUV高通量检测系统，用于在图案化的EUV掩模，掩模毛坯和晶片上进行缺陷检测

    公开(公告)号：US08553217B2

    公开(公告)日：2013-10-08

    申请号：US12812950

    申请日：2010-06-18

    申请人： Yung-Ho Chuang ,  Richard W. Solarz ,  David R. Shafer ,  Bin-Ming Benjamin Tsai ,  David L. Brown

    发明人： Yung-Ho Chuang ,  Richard W. Solarz ,  David R. Shafer ,  Bin-Ming Benjamin Tsai ,  David L. Brown

    IPC分类号： G01N21/00

    CPC分类号： G01N21/95 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/068 ,  G03F1/84 ,  G03F7/70616 ,  H05G2/008

    摘要： Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.

    摘要翻译： 对EUV图案化掩模，空白掩模和由EUV图案化掩模生成的图案化晶片的检查需要高倍率和在图像平面上的大视场。 EUV检查系统可以包括指向检查表面的光源，用于检测从被检查表面偏转的光的检测器和用于将来自被检查表面的光引导到检测器的光学配置。 特别地，检测器可以包括多个传感器模块。 另外，光学配置可以包括在小于5米长的光路内提供至少100倍的放大倍数的多个反射镜。 在一个实施例中，光路大约2-3米长。

    Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
    7.
    发明授权
    Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology 有权
    使用光学关键尺寸（OCD）计量优化用于结构分析的光学参数模型

    公开(公告)号：US09310296B2

    公开(公告)日：2016-04-12

    申请号：US13164398

    申请日：2011-06-20

    申请人： Thaddeus G. Dziura ,  Yung-Ho Chuang ,  Bin-ming Benjamin Tsai ,  Xuefeng Liu ,  John J. Hench

    发明人： Thaddeus G. Dziura ,  Yung-Ho Chuang ,  Bin-ming Benjamin Tsai ,  Xuefeng Liu ,  John J. Hench

    IPC分类号： G05B13/00 ,  G01N21/47 ,  G01B11/24 ,  G03F7/20 ,  G01N21/956 ,  G06F17/50

    CPC分类号： G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/956 ,  G01N2021/95615 ,  G03F7/70625 ,  G06F17/5009

    摘要： Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.

    摘要翻译： 描述了使用光学关键尺寸度量结构分析的光学参数模型的优化。 一种方法包括确定适合结构参数的第一光学模型。 第一个光学模型拟合是基于结构的第一个模型的数量域。 对于第一量的量域确定第一近场光响应，并且针对量的第二个不同数量的量确定第二近场光响应。 比较第一和第二近场光响应，以定位用于结构参数的高光场强度的公共区域。 该结构的第一个模型被修改以提供第二个不同的结构模型。 基于结构的第二个模型，确定结构参数的第二个不同的光学模型拟合。

    Ultra-broadband UV microscope imaging system with wide range zoom capability
    8.
    发明授权
    Ultra-broadband UV microscope imaging system with wide range zoom capability 有权
    超宽带紫外显微镜成像系统具有广泛的变焦能力

    公开(公告)号：US07773296B2

    公开(公告)日：2010-08-10

    申请号：US12231693

    申请日：2008-09-05

    申请人： David R. Shafer ,  Yung-Ho Chuang ,  Bin-Ming Benjamin Tsai

    发明人： David R. Shafer ,  Yung-Ho Chuang ,  Bin-Ming Benjamin Tsai

    IPC分类号： G02B15/14

    CPC分类号： G02B17/0896 ,  G02B17/023 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G02B17/086 ,  G02B17/0892 ,  G02B21/16 ,  G03F1/84 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70616 ,  G03F7/7065

    摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which includes a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

    摘要翻译： 超宽带紫外（UV）反折射成像显微镜系统，具有广泛的变焦能力。 包括反折射透镜组和变焦管透镜组的显微镜系统在深紫外波长，连续可调放大倍率和高数值孔径中具有高的光学分辨率。 该系统集成了诸如目标，管镜和变焦光学的显微镜模块，以减少部件数量，并简化系统制造过程。 优选实施例在非常广泛的深紫外光谱范围内提供优异的图像质量，与全折射变焦管透镜组合。 变焦管镜头被修改以补偿通常会限制性能的高阶色差。