Methods of processing semiconductor wafer backsides having light emitting devices (LEDS) thereon and leds so formed
    4.
    发明申请
    Methods of processing semiconductor wafer backsides having light emitting devices (LEDS) thereon and leds so formed 有权
    处理其上具有发光器件(LEDS)的半导体晶片背面和如此形成的LED的方法

    公开(公告)号:US20050151138A1

    公开(公告)日:2005-07-14

    申请号:US10987135

    申请日:2004-11-12

    摘要: Processing a semiconductor wafer can include forming a plurality of Light Emitting Devices (LED) on a semiconductor wafer having a first thickness. The plurality of LEDs on the wafer are brought into contact with a surface of a carrier to couple the wafer to the carrier. The first thickness of the wafer is reduced to a second thickness that is less than the first thickness by processing the backside of the wafer. The carrier is separated from the plurality of LEDs on the wafer and the wafer is cut to separate the plurality of LEDs from one another. Related devices are also disclosed.

    摘要翻译: 处理半导体晶片可以包括在具有第一厚度的半导体晶片上形成多个发光器件(LED)。 使晶片上的多个LED与载体的表面接触以将晶片耦合到载体。 通过处理晶片的背面,将晶片的第一厚度减小到小于第一厚度的第二厚度。 载体与晶片上的多个LED分离,并且切割晶片以将多个LED彼此分离。 还公开了相关设备。

    High efficiency group III nitride-silicon carbide light emitting diode
    5.
    发明申请
    High efficiency group III nitride-silicon carbide light emitting diode 有权
    高效率III族氮化硅 - 碳化硅发光二极管

    公开(公告)号:US20060060877A1

    公开(公告)日:2006-03-23

    申请号:US10951042

    申请日:2004-09-22

    IPC分类号: H01L33/00

    CPC分类号: H01L33/36 H01L33/007

    摘要: A method and resulting structures are disclosed for fabricating a high efficiency high extraction light emitting diode suitable for packaging. The method includes the steps of adding a light emitting active portion of wide-bandgap semiconductor material to a conductive silicon carbide substrate, joining the added active portion to a conductive sub-mounting structure, and removing a portion of the silicon carbide substrate opposite the added active portion to thereby reduce the overall thickness of the joined substrate, active portion and sub-mounting structure. The resulting the sub-mounting structure can be joined to a lead frame with the active portion positioned between the silicon carbide substrate and the sub-mounting structure to thereby use the sub-mounting structure to separate the active portion from the lead frame and avoid undesired electrical contact between the active portion and the lead frame.

    摘要翻译: 公开了一种制造适用于包装的高效率高抽提发光二极管的方法和结果。 该方法包括以下步骤:将宽带隙半导体材料的发光有源部分添加到导电碳化硅基板,将添加的有源部分接合到导电子安装结构,并且将与添加的相邻的碳化硅基板相对的一部分 从而减小接合的基板,有源部分和副安装结构的整体厚度。 所得到的子安装结构可以连接到引线框架,其中有源部分位于碳化硅基板和子安装结构之间,从而使用子安装结构将有源部分与引线框架分开,并避免不必要的 有源部分和引线框架之间的电接触。

    METHODS OF MANUFACTURING LIGHT EMITTING DIODES INCLUDING BARRIER LAYERS/SUBLAYERS
    8.
    发明申请
    METHODS OF MANUFACTURING LIGHT EMITTING DIODES INCLUDING BARRIER LAYERS/SUBLAYERS 有权
    制造发光二极体的方法,包括障碍层/子层

    公开(公告)号:US20070161137A1

    公开(公告)日:2007-07-12

    申请号:US11688605

    申请日:2007-03-20

    IPC分类号: H01L21/00

    摘要: Semiconductor light emitting devices, such as light emitting diodes, include a substrate, an epitaxial region on the substrate that includes a light emitting region such as a light emitting diode region, and a multilayer conductive stack including a reflector layer, on the epitaxial region. A barrier layer is provided on the reflector layer and extending on a sidewall of the reflector layer. The multilayer conductive stack can also include an ohmic layer between the reflector and the epitaxial region. The barrier layer further extends on a sidewall of the ohmic layer. The barrier layer can also extend onto the epitaxial region outside the multilayer conductive stack. The barrier layer can be fabricated as a series of alternating first and second sublayers.

    摘要翻译: 诸如发光二极管的半导体发光器件包括衬底,在衬底上的包括诸如发光二极管区域的发光区域的外延区域和在外延区域上包括反射器层的多层导电堆叠。 阻挡层设置在反射器层上并在反射器层的侧壁上延伸。 多层导电叠层还可以包括在反射器和外延区之间的欧姆层。 阻挡层进一步在欧姆层的侧壁上延伸。 阻挡层还可以延伸到多层导电叠层外的外延区域上。 阻挡层可以制成一系列交替的第一和第二子层。

    Methods of treating a silicon carbide substrate for improved epitaxial deposition and resulting structures and devices
    9.
    发明申请
    Methods of treating a silicon carbide substrate for improved epitaxial deposition and resulting structures and devices 有权
    处理碳化硅衬底以改善外延沉积以及所得结构和器件的方法

    公开(公告)号:US20060033111A1

    公开(公告)日:2006-02-16

    申请号:US11243581

    申请日:2005-10-05

    IPC分类号: H01L31/0312

    摘要: A silicon carbide structure is disclosed that is suitable for use as a substrate in the manufacture of electronic devices such as light emitting diodes. The structure includes a silicon carbide wafer having a first and second surface and having a predetermined conductivity type and an initial carrier concentration; a region of implanted dopant atoms extending from the first surface into the silicon carbide wafer to a predetermined depth, with the region having a higher carrier concentration than the initial carrier concentration in the remainder of the wafer; and an epitaxial layer on the first surface of the silicon carbide wafer.

    摘要翻译: 公开了一种碳化硅结构,其适用于制造诸如发光二极管的电子器件中的基板。 该结构包括具有第一表面和第二表面并具有预定导电类型和初始载流子浓度的碳化硅晶片; 注入掺杂剂原子的区域从第一表面延伸到碳化硅晶片到预定深度,该区域具有比晶片剩余部分中的初始载流子浓度更高的载流子浓度; 以及在碳化硅晶片的第一表面上的外延层。