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    Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
    1.
    发明授权
    Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester 失效
    苯并内酯环化合物的重氮酯和使用重氮酯的正性光致抗蚀剂组合物和元素

    公开(公告)号：US5221592A

    公开(公告)日：1993-06-22

    申请号：US847527

    申请日：1992-03-06

    申请人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    发明人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    IPC分类号： G03F7/022

    CPC分类号： G03F7/022 ,  Y10S430/168

    摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on the benzolactone ring compound has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.

    摘要翻译： 一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中苯并内酯环化合物上的至少一个羟基已用由60至100摩尔％2的重氮磺酰氯酯化， 1,4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。

    Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride
    2.
    发明授权
    Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride 失效
    使用苯并内酯环化合物和重氮磺酰氯的重氮酯制造正性光致抗蚀剂图像的方法

    公开(公告)号：US5348842A

    公开(公告)日：1994-09-20

    申请号：US42362

    申请日：1993-04-02

    申请人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    发明人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    IPC分类号： G03F7/022 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

    CPC分类号： G03F7/022 ,  Y10S430/168

    摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on benzolactone ring has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.

    摘要翻译： 一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中至少一个苯甲酸内酯环上的羟基已经被重氮化磺酰氯酯化，重氮磺酰氯由60至100摩尔％ 4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。

    Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers
    7.
    发明授权
    Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers 失效
    使用含有低金属含量对甲酚低聚物的光敏组合物的图像形成

    公开(公告)号：US5858627A

    公开(公告)日：1999-01-12

    申请号：US920564

    申请日：1997-08-29

    申请人： M. Dalil Rahman ,  Dinesh N. Khanna ,  Daniel Aubin ,  Douglas McKenzie

    发明人： M. Dalil Rahman ,  Dinesh N. Khanna ,  Daniel Aubin ,  Douglas McKenzie

    IPC分类号： G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  G03F7/38

    CPC分类号： G03F7/023 ,  G03F7/0236

    摘要： Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.

    摘要翻译： 制备包含对甲酚低聚物的重氮酯的光敏剂的方法，其中对甲酚环上的至少一个羟基已用重氮磺酰氯酯化，包括约60-100摩尔％2,1,4 或2,1,5-重氮磺酰氯，或其混合物; 以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀感光的量的光敏剂的混合物，水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以光致抗蚀剂组合物的量存在 足以形成基本均匀的光致抗蚀剂组合物和合适的溶剂。

    Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
    9.
    发明授权
    Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition 失效
    含有低金属对甲酚低聚物的醌酮二氮化物组合物及其制备方法

    公开(公告)号：US5837417A

    公开(公告)日：1998-11-17

    申请号：US366635

    申请日：1994-12-30

    申请人： M. Dalil Rahman ,  Dinesh N. Khanna ,  Daniel Aubin ,  Douglas McKenzie

    发明人： M. Dalil Rahman ,  Dinesh N. Khanna ,  Daniel Aubin ,  Douglas McKenzie

    IPC分类号： G03F7/022 ,  G03F7/023 ,  H01L21/027

    CPC分类号： G03F7/023 ,  G03F7/0236

    摘要： Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.

    摘要翻译： 制备包含对甲酚低聚物的重氮酯的光敏剂的方法，其中对甲酚环上的至少一个羟基已用重氮磺酰氯酯化，包括约60-100摩尔％2,1,4 或2,1,5-重氮磺酰氯，或其混合物; 以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀感光的量的光敏剂的混合物，水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以光致抗蚀剂组合物的量存在 足以形成基本均匀的光致抗蚀剂组合物和合适的溶剂。

    Composition for stripping photoresist and organic materials from substrate surfaces
    10.
    发明授权
    Composition for stripping photoresist and organic materials from substrate surfaces 失效
    用于从基材表面剥离光致抗蚀剂和有机材料的组合物

    公开(公告)号：US06368421B1

    公开(公告)日：2002-04-09

    申请号：US09113892

    申请日：1998-07-10

    申请人： Joseph E. Oberlander ,  Mark S. Slezak ,  Dinesh N. Khanna ,  Dana L. Durham ,  Lawrence F. Spinicelli

    发明人： Joseph E. Oberlander ,  Mark S. Slezak ,  Dinesh N. Khanna ,  Dana L. Durham ,  Lawrence F. Spinicelli

    IPC分类号： B08B304

    CPC分类号： G03F7/426

    摘要： The invention relates to the field of microelectronics, such as integrated circuits, and more particularly to compositions and methods of removing photoresists or other organic materials from the surfaces of substrates used in the fabrication of integrated circuits. In particular the present invention relates to amine-free stripping compositions comprising solvent and surfactant that can effectively remove organic materials without corroding the underlying substrate, and the invention also relates to methods for removing these organic materials with the novel stripping composition.

    摘要翻译： 本发明涉及微电子学领域，例如集成电路，更具体地涉及从用于制造集成电路的衬底表面去除光致抗蚀剂或其它有机材料的组合物和方法。 特别地，本发明涉及不含无溶剂和表面活性剂的无胺汽提组合物，其可有效去除有机材料而不腐蚀下面的基底，本发明还涉及用新的汽提组合物除去这些有机材料的方法。