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1.发明授权Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom 失效使用离子交换催化剂在极性溶剂中的酚醛清漆树脂中的金属离子还原，并由其制备光致抗蚀剂组合物
公开(公告)号：US5521052A
公开(公告)日：1996-05-28
申请号：US365659
申请日：1994-12-30
CPC分类号： C08G8/04 , G03F7/004 , Y10S430/106 , Y10S438/948
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble, film forming novolak resins having an extremely low level of metal ions, utilizing treated anion and cation exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resin and for producing semiconductor devices using such photoresist compositions.
摘要翻译： 本发明提供了利用处理过的阴离子和阳离子交换树脂生产具有极低水平金属离子的水不溶性水溶性成膜酚醛清漆树脂的方法。 还提供了一种用于生产具有来自这种酚醛清漆树脂的非常低水平的金属离子并且使用这种光致抗蚀剂组合物制造半导体器件的光致抗蚀剂组合物的方法。
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2.发明授权Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers 失效使用含有低金属含量对甲酚低聚物的光敏组合物的图像形成
公开(公告)号：US5858627A
公开(公告)日：1999-01-12
申请号：US920564
申请日：1997-08-29
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027 , G03F7/38
CPC分类号： G03F7/023 , G03F7/0236
摘要： Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.
摘要翻译： 制备包含对甲酚低聚物的重氮酯的光敏剂的方法，其中对甲酚环上的至少一个羟基已用重氮磺酰氯酯化，包括约60-100摩尔％2,1,4 或2,1,5-重氮磺酰氯，或其混合物; 以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀感光的量的光敏剂的混合物，水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以光致抗蚀剂组合物的量存在 足以形成基本均匀的光致抗蚀剂组合物和合适的溶剂。
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3.发明授权Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition 失效含有低金属对甲酚低聚物的醌酮二氮化物组合物及其制备方法
公开(公告)号：US5837417A
公开(公告)日：1998-11-17
申请号：US366635
申请日：1994-12-30
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/023 , G03F7/0236
摘要： Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.
摘要翻译： 制备包含对甲酚低聚物的重氮酯的光敏剂的方法，其中对甲酚环上的至少一个羟基已用重氮磺酰氯酯化，包括约60-100摩尔％2,1,4 或2,1,5-重氮磺酰氯，或其混合物; 以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀感光的量的光敏剂的混合物，水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以光致抗蚀剂组合物的量存在 足以形成基本均匀的光致抗蚀剂组合物和合适的溶剂。
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公开(公告)号：US20110151376A1
公开(公告)日：2011-06-23
申请号：US12646191
申请日：2009-12-23
申请人： M. Dalil Rahman , Douglas McKenzie , Huirong Yao , JoonYeon Cho , Yi Yi , Guanyang Lin
发明人： M. Dalil Rahman , Douglas McKenzie , Huirong Yao , JoonYeon Cho , Yi Yi , Guanyang Lin
CPC分类号： C09D165/00 , C08G2261/141 , C08G2261/1422 , C08G2261/3424 , C08G2261/42 , C08G2261/50 , C08G2261/76 , C08L65/00 , G03F7/091 , H01L21/0276 , H01L21/3081
摘要： The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): A-Bn (1) where A is a fused aromatic ring and B has a structure (2), where R1 is C1-C4alkyl and R2 is C1-C4alkylThe invention further relates to a process for forming an image using the composition.
摘要翻译： 本发明涉及一种抗反射涂料组合物，其包含能够由交联剂交联的交联剂和可交联聚合物，其中可交联聚合物包含由结构（1）表示的单元：其中A是稠合芳族化合物 环和B具有结构（2），其中R 1是C 1 -C 4烷基，R 2是C 1 -C 4烷基。本发明还涉及使用该组合物形成图像的方法。
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公开(公告)号：US20090280435A1
公开(公告)日：2009-11-12
申请号：US12115776
申请日：2008-05-06
CPC分类号： G03F7/091
摘要： The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R1 to R9 is independently selected from H and C1-C6 alkyl, R′ and R″ is independently selected from H and C1-C6 alkyl, X is C1-C6 alkylene, Y is C1-C6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.
摘要翻译： 本发明涉及包含聚合物，交联剂和热酸发生剂的抗反射涂料组合物，其中聚合物包含至少一个结构单元（1），至少一个结构单元（2）和至少一个结构结构 （3），其中R 1至R 9独立地选自H和C 1 -C 6烷基，R'和R“独立地选自H和C 1 -C 6烷基，X是C 1 -C 6亚烷基，Y是C 1 -C 6亚烷基。 本发明还涉及一种用于对涂覆在抗反射涂层组合物上的光致抗蚀剂进行成像的方法。
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公开(公告)号：US20100151392A1
公开(公告)日：2010-06-17
申请号：US12332501
申请日：2008-12-11
申请人： M. Dalil Rahman , Yi Yi , Douglas McKenzie , Clement Anyadiegwu , Ping-Hung Lu
发明人： M. Dalil Rahman , Yi Yi , Douglas McKenzie , Clement Anyadiegwu , Ping-Hung Lu
CPC分类号： G03F7/091 , C08G61/02 , C08G2261/342 , C08L83/04 , C09D165/00
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer, a linking component, a crosslinker, and an acid generator. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及包含聚合物，连接组分，交联剂和酸产生剂的有机旋涂可涂抗反射涂料组合物。 本发明还涉及用于对本发明组合物进行成像的方法。
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公开(公告)号：US20090246691A1
公开(公告)日：2009-10-01
申请号：US12060307
申请日：2008-04-01
申请人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
发明人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2. where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure. 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.
摘要翻译： 本发明涉及一种抗反射组合物，其包含热酸产生剂和环氧聚合物，其包含至少一个结构单元1，至少一个结构单元，其中R1至R12独立地选自氢和C1-C4烷基， 结构体。 1具有选自顺式，反式或其混合物的构型，x和y是聚合物中单体单元的摩尔％。 本发明还涉及一种用于制造微电子器件的方法。
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8.发明授权公开(公告)号：US06610465B2
公开(公告)日：2003-08-26
申请号：US09833226
申请日：2001-04-11
IPC分类号： G03F732
CPC分类号： B01J20/28033 , B01J20/28004 , B01J20/28028 , B01J20/2803 , B01J20/28085 , B01J47/018 , B01J47/133 , C08F6/02 , C08F6/16 , G03F7/0395
摘要： The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).
摘要翻译： 本发明提供一种适用于光致抗蚀剂组合物的成膜树脂的制造方法，包括以下步骤：（a）在成膜剂中提供成膜树脂的溶液; （b）提供以下两个过滤片：（i）含有固定有微粒过滤助剂和粒状离子交换树脂颗粒的自支撑纤维基质的过滤片，其中颗粒助滤剂和离子交换树脂颗粒基本上分布 均匀地遍布所述基质的横截面; 和（ii）含有固定有颗粒助滤剂和粘合剂树脂的纤维自支撑基质的过滤片; （c）用步骤（a）的溶剂冲洗步骤（b）的过滤片; 和（d）使成膜树脂的溶液通过步骤（c）的冲洗过的滤纸。
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9.发明授权Spin-on compositions of soluble metal oxide carboxylates and methods of their use 有权可溶性金属氧化物羧酸盐的旋转组合物及其使用方法公开(公告)号：US09201305B2
公开(公告)日：2015-12-01
申请号：US13930711
申请日：2013-06-28
申请人： M. Dalil Rahman , Venkata Gopal Reddy Chada , Huirong Yao , Clement Anyadiegwu , Douglas McKenzie
发明人： M. Dalil Rahman , Venkata Gopal Reddy Chada , Huirong Yao , Clement Anyadiegwu , Douglas McKenzie
IPC分类号： H01L21/033 , G03F7/09 , H01L21/027 , C23C18/06 , C23C18/12 , C23C18/14
CPC分类号： G03F7/092 , C23C18/06 , C23C18/1216 , C23C18/14 , G03F7/09 , G03F7/091 , H01L21/0276
摘要： The present disclosure relates to spin-on compositions containing at least one metal oxide dicarboxylate and an organic solvent into which the metal oxide dicarboxylate is soluble or colloidally stable. The dicarboxylate is capable of decomposing during heat treatment to give a cured metal oxide film. The present disclosure also relates to method of using the spin-on compositions.
摘要翻译： 本公开内容涉及含有至少一种金属氧化物二羧酸盐和有机溶剂的旋涂组合物，其中金属氧化物二羧酸盐可溶于或胶体稳定。 二羧酸盐能够在热处理期间分解，得到固化的金属氧化物膜。 本公开还涉及使用旋涂组合物的方法。
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公开(公告)号：US07989144B2
公开(公告)日：2011-08-02
申请号：US12060307
申请日：2008-04-01
申请人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
发明人： M. Dalil Rahman , David Abdallah , Rhuzi Zhang , Douglas McKenzie
IPC分类号： G03F7/11 , G03F7/30 , B29C59/16 , C08F291/02
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.
摘要翻译： 本发明涉及包含热酸产生剂和环氧聚合物的抗反射组合物，其包含至少一个结构单元1，至少一个结构单元2，其中R 1至R 12独立地选自氢和C 1 -C 4烷基， 结构1具有选自顺式，反式或其混合物的构型，x和y是聚合物中单体单元的摩尔％。 本发明还涉及一种用于制造微电子器件的方法。
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