摘要:
Substantially non-microcracked, porous, cordierite ceramic honeycomb bodies are provided. Although exhibiting moderately high thermal expansion (CTE) between 7×10−7 to 16×10−7/° C. (25-800° C.), the honeycomb bodies exhibit relatively high thermal shock parameter (TSP), such as TSR≧525° C. by virtue of a high MOR/E ratio, and/or low Eratio=ERT/E1000° C. and well interconnected porosity, as witnessed by a relatively high pore connectivity factor (PCF). A method of manufacturing the honeycomb ceramic structure is also provided.
摘要:
Substantially non-microcracked, porous, cordierite ceramic honeycomb bodies are provided. Although exhibiting moderately high thermal expansion (CTE) between 7×10−7 to 16×10−7/° C. (25-800° C.), the honeycomb bodies exhibit relatively high thermal shock parameter (TSP), such as TSR≧525° C. by virtue of a high MOR/E ratio, and/or low Eratio=ERT/E1000° C. and well interconnected porosity, as witnessed by a relatively high pore connectivity factor (PCF). A method of manufacturing the honeycomb ceramic structure is also provided.
摘要:
A porous cordierite ceramic honeycomb article with increased mechanical strength and thermal shock resistance. The porous cordierite ceramic honeycomb article has MA 2660 wherein MA=3645 (IA)−106 (CTE)+19 (d90)+17 (% porosity), MT=4711 (IT)+116 (CTE)−26 (d90)−28 (% porosity), and a CTE≦9×10−7/° C. in at least one direction. A method of manufacturing is also disclosed wherein the inorganic raw material mixture contains talc, an alumina-forming source, a silica-forming source, and 0-18 wt. % of a kaolin or calcined kaolin containing not more than 8 wt. % of a fine kaolin source having a median particle diameter of less than 7 μm, wherein the fired porous ceramic cordierite honeycomb article has a porosity
摘要翻译:具有增加的机械强度和耐热冲击性的多孔堇青石陶瓷蜂窝制品。 多孔堇青石陶瓷蜂窝体制品具有M≠2220或其中M A = 3645(I < /(CTE)+19(d 90)+ 17(孔隙率%),M T T = 4711(℃) )+116(CTE)-26(d 90) - 28(%孔隙率),CTE <= 9×10 -7 /℃至少在一个方向 。 还公开了一种制造方法,其中无机原料混合物含有滑石,形成氧化铝的源,二氧化硅形成源和0-18wt。 %的高岭土或煅烧高岭土含有不超过8wt。 %的中值粒径小于7μm的细高岭土源,其中烧成的多孔陶瓷堇青石蜂窝体制品的孔隙率<54%。 或者,如果大于8wt。 使用%的细高岭土源,则从1200℃至1300℃的缓慢升温速率不超过20℃/小时。
摘要:
A method for fabricating a ceramic article which includes providing a batch comprising components of (i) a mixture of inorganic raw materials comprising talc, alumina, and silica; (ii) a binder comprising a water-soluble organic binder and a fibrous silicate mineral having a high aspect ratio in combination with a large surface area; and (iii) a polar solvent; mixing the batch components to form a homogenous and plasticized mass; shaping the plasticized mass into a green body wherein the green body has improved strength; and, sintering the green body by heating to a temperature and for a time to initiate and sufficiently achieve conversion of the green body into a fired ceramic article.
摘要:
An instrumented pig comprises a foam body having an outer surface and an inner cavity in which, in use, is located a sealed unit housing at least a part of a parameter measurement apparatus configured to measure at least one parameter from which the extent of deflection of the outer surface of the foam body may be derived, the sealed unit including at least one sensor configured to generate an output signal representative of the at least one measured parameter.
摘要:
Methods for deposition of metal films consisting essentially of Co, Mn, Ru or a lanthanide on surfaces using metal coordination complexes are provided. The precursors used in the process include a 2-methylimine pyrrolyl ligand and/or N,N′-diisopropylformamidinato ligand. The precursors may also contain cyclopentadienyl, pentamethylcyclopentadienyl or pyrrolyl groups.
摘要:
Described are methods and apparatuses for the stabilization of precursors, which can be used for the deposition of manganese-containing films. Certain methods and apparatus relate to lined ampoules and/or 2-electron donor ligands.
摘要:
Provided are precursors and methods of using same to deposit film consisting essentially of nickel. Certain methods comprise providing a substrate surface; exposing the substrate surface to a vapor comprising a precursor having a structure represented by formula (I): wherein R1 is t-butyl and each R2 is each independently any C1-C3 alkyl group; and exposing the substrate to a reducing gas to provide a film consisting essentially of nickel on the substrate surface.
摘要:
Provided are methods of depositing films comprising alloys of aluminum, which may be suitable as N-metal films. Certain methods comprise exposing a substrate surface to a metal halide precursor comprising a metal halide selected from TiCl4, TaCl5 and HfCl4 to provide a metal halide at the substrate surface; purging metal halide; exposing the substrate surface to an alkyl aluminum precursor comprising one or more of dimethyaluminum hydride, diethylhydridoaluminum, methyldihydroaluminum, and an alkyl aluminum hydrides of the formula [(CxHy)3-aAlHa]n, wherein x has a value of 1 to 3, y has a value of 2x+2, a has a value of 1 to 2, and n has a value of 1 to 4; and exposing the substrate surface to an alane-containing precursor comprising one or more of dimethylethylamine alane, methylpyrrolidinealane, di(methylpyrolidine)alane, and trimethyl amine alane borane. Other methods comprise exposing a substrate surface to a metal precursor and trimethyl amine alane borane.
摘要翻译:提供了沉积包括铝合金的膜的方法,其可以适合作为N-金属膜。 某些方法包括将衬底表面暴露于包含选自TiCl 4,TaCl 5和HfCl 4的金属卤化物的金属卤化物前体,以在衬底表面提供金属卤化物; 清洗金属卤化物; 将基材表面暴露于包含一种或多种二氢化铝氢化物,二乙基氢化铝,甲基二氢铝和式[(C x H y)3-a AlHa] n的烷基铝氢化物的烷基铝前体,其中x具有1至3的值,y 具有2x + 2的值,a具有1至2的值,并且n具有1至4的值; 并将基材表面暴露于含有二甲基乙基胺丙烷,甲基吡咯烷烃,二(甲基吡咯烷)甲烷和三甲基胺丙烷硼烷中的一种或多种的含Alane的前体。 其他方法包括将基底表面暴露于金属前体和三甲基胺丙烷硼烷。
摘要:
Described are methods of depositing a metal film by chemical reaction on a substrate. The method comprises: exposing the substrate to flows of a first reactant gas comprising a group 2 metal and a second reactant gas comprising a halide to form a first layer containing a metal halide on the substrate; exposing the substrate to a third reactant gas comprising an oxidant to form a second layer containing a metal peroxide or metal hydroxide on the substrate during; exposing the substrate to heat or a plasma to convert the metal peroxide or metal hydroxide to metal oxide. The method may be repeated to form the metal oxide film absent any metal carbonate impurity.