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公开(公告)号：US06495906B2
公开(公告)日：2002-12-17
申请号：US10078046
申请日：2002-02-07
申请人： Douglas M. Smith , Teresa Ramos , Kevin H. Roderick , Stephen Wallace , James Drage , Hui-Jung Wu , Neil Viernes , Lisa B. Brungardt
发明人： Douglas M. Smith , Teresa Ramos , Kevin H. Roderick , Stephen Wallace , James Drage , Hui-Jung Wu , Neil Viernes , Lisa B. Brungardt
IPC分类号： H01L2358
CPC分类号： H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02343 , H01L21/02359 , H01L21/3105 , H01L21/3125 , H01L21/31695 , Y10T428/31663
摘要： The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.
摘要翻译： 本发明涉及低介电常数纳米多孔二氧化硅薄膜及其制造方法。 具有适合于生产集成电路的晶片，其表面上存在多个凸起线和/或电子元件的衬底具有相对较高的孔隙率低介电常数的含硅聚合物膜组合物 。
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2.发明授权Nanoporous dielectric films with graded density and process for making such films 失效具有梯度密度的纳米多孔介电膜和制造这种膜的方法公开(公告)号：US06455130B1
公开(公告)日：2002-09-24
申请号：US09706027
申请日：2000-11-03
IPC分类号： B32B328
CPC分类号： H01L21/31695 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02343 , H01L21/7682 , H01L23/5222 , H01L23/5329 , H01L2221/1047 , H01L2924/0002 , Y10T428/24537 , Y10T428/24595 , Y10T428/249978 , Y10T428/249979 , H01L2924/00
摘要： The present invention relates to nanoporous dielectric films and to a process for their manufacture. A substrate having a plurality of raised lines on its surface is provided with a relatively high porosity, low dielectric constant, silicon containing polymer composition positioned between the raised lines and a relatively low porosity, high dielectric constant, silicon containing composition positioned on the lines.
摘要翻译： 本发明涉及纳米多孔介电膜及其制造方法。 在其表面上具有多个凸起线的基底设置有相对较高的孔隙率，低介电常数，位于凸起线之间的含硅聚合物组合物和位于该线上的较低孔隙率，高介电常数的含硅组合物。
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公开(公告)号：US06503850B1
公开(公告)日：2003-01-07
申请号：US09046473
申请日：1998-03-25
申请人： Stephen Wallace , Douglas M. Smith , Teresa Ramos , Kevin H. Roderick , James S. Drage , Lisa Beth Brungardt
发明人： Stephen Wallace , Douglas M. Smith , Teresa Ramos , Kevin H. Roderick , James S. Drage , Lisa Beth Brungardt
IPC分类号： H01L21469
CPC分类号： H01L21/02203 , B01J13/0091 , C01B33/1585 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02343 , H01L21/31695
摘要： The present invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. A precursor of an alkoxysilane, and low and high volatility solvents are mixed at a pH of about 2-5, raised to a pH of about 8 or above with a low volatility base and deposited on a semiconductor substrate. After exposure to atmospheric moisture, a nanoporous dielectric film is produced on the substrate.
摘要翻译： 本发明涉及纳米多孔介电膜及其制造方法。 这种膜可用于集成电路的生产。 将烷氧基硅烷的前体和低挥发性溶剂和低挥发性溶剂以约2-5的pH混合，以低挥发性碱升高至约8或更高的pH并沉积在半导体衬底上。 在暴露于大气湿度之后，在衬底上产生纳米多孔介电膜。
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公开(公告)号：US6048804A
公开(公告)日：2000-04-11
申请号：US54262
申请日：1998-04-03
IPC分类号： C01B33/12 , C23C18/12 , H01L21/314 , H01L21/316 , H01L21/208
CPC分类号： H01L21/31695 , C23C18/1212 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02343
摘要： A process for forming a nanoporous dielectric coating on a substrate. The process follows the steps of blending an alkoxysilane with a solvent composition and optional water; depositing the mixture onto a substrate while evaporating at least a portion of the solvent composition; placing the substrate in a sealed chamber and evacuating the chamber to a pressure below atmospheric pressure; exposing the substrate to water vapor at a pressure below atmospheric pressure and then exposing the substrate to base vapor.
摘要翻译： 一种在衬底上形成纳米多孔电介质涂层的方法。 该方法遵循将烷氧基硅烷与溶剂组合物和任选的水共混的步骤; 将混合物沉积在基材上同时蒸发至少一部分溶剂组合物; 将基板放置在密封室中并将室抽空至低于大气压的压力; 在低于大气压的压力下将基底暴露于水蒸汽，然后将基底暴露于基础蒸气。
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公开(公告)号：US06395651B1
公开(公告)日：2002-05-28
申请号：US09111084
申请日：1998-07-07
申请人： Douglas M. Smith , Teresa Ramos , Kevin H. Roderick , Stephen Wallace , James Drage , Hui-Jung Wu , Neil Viernes , Lisa B. Brungardt
发明人： Douglas M. Smith , Teresa Ramos , Kevin H. Roderick , Stephen Wallace , James Drage , Hui-Jung Wu , Neil Viernes , Lisa B. Brungardt
IPC分类号： H01L2131
CPC分类号： H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02343 , H01L21/02359 , H01L21/3105 , H01L21/3125 , H01L21/31695 , Y10T428/31663
摘要： The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.
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公开(公告)号：US6022812A
公开(公告)日：2000-02-08
申请号：US111083
申请日：1998-07-07
IPC分类号： C23C16/42 , B05D3/04 , B05D7/24 , C23C18/12 , H01L21/314 , H01L21/316
CPC分类号： C23C18/1212 , B05D1/60 , B05D3/046 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02263 , H01L21/02337 , H01L21/02343 , H01L21/31695
摘要： A process for the manufacture of nanoporous silica dielectric films by vapor deposition of silica precursors on a substrate. The process provides for vaporizing at least one alkoxysilane composition; depositing the vaporized alkoxysilane composition onto a substrate; exposing the deposited alkoxysilane composition to a water vapor, and either an acid or a base vapor; and drying the exposed alkoxysilane composition, thereby forming a relatively high porosity, low dielectric constant, silicon containing polymer composition on the substrate.
摘要翻译： 一种用于通过在基底上气相沉积二氧化硅前体来制造纳米多孔二氧化硅介电膜的方法。 该方法提供了蒸发至少一种烷氧基硅烷组合物; 将蒸发的烷氧基硅烷组合物沉积到基底上; 将沉积的烷氧基硅烷组合物暴露于水蒸汽，以及酸或碱蒸气; 并干燥暴露的烷氧基硅烷组合物，由此在基材上形成相对较高的孔隙率低介电常数的含硅聚合物组合物。
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公开(公告)号：US06968711B2
公开(公告)日：2005-11-29
申请号：US10165753
申请日：2002-06-06
申请人： Douglas M. Smith , Tamara L. O'Brien , Kevin H. Roderick , Lois X. Warren , Richard G. Perkes , Vanessa Sinclair , Quentin Shrimpton
发明人： Douglas M. Smith , Tamara L. O'Brien , Kevin H. Roderick , Lois X. Warren , Richard G. Perkes , Vanessa Sinclair , Quentin Shrimpton
CPC分类号： C09K5/047 , F25B17/02 , F25B17/08 , F25D11/003 , F25D2201/126 , F25D2201/14 , F25D2331/804 , Y02B40/34
摘要： Novel sorption cooling devices capable of providing cooling over an extended period of time are disclosed. The sorption cooling devices are particularly useful for temperature-controlled shipping containers that are required to maintain a temperature below ambient for a time sufficient to complete delivery of the container and its contents. The shipping containers can be utilized to cost-effectively transport temperature-sensitive products.
摘要翻译： 公开了能够在长时间内提供冷却的小型吸附冷却装置。 吸附冷却装置对于温度低于环境温度所需的温度控制运输容器特别有用，时间足以完成容器及其内容物的输送。 运输集装箱可用于成本有效地运输温度敏感的产品。
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公开(公告)号：US20090000312A1
公开(公告)日：2009-01-01
申请号：US12043022
申请日：2008-03-05
CPC分类号： F25D31/006 , F25D2331/805
摘要： A method and apparatus for the rapid cooling of a container and its contents, such as a beverage container. A heat transfer fluid is thermally contacted with the beverage container, where the heat transfer fluid has a temperature of less than 0° C. The heat transfer fluid can be physically separated from the container, such as by flowing the heat transfer fluid through a heat exchanger that surrounds the container. The cooling parameters can be controlled such that the container and its contents are rapidly cooled without freezing of the contents.
摘要翻译： 用于快速冷却容器及其内容物如饮料容器的方法和装置。 传热流体与饮料容器热接触，其中传热流体具有小于0℃的温度。传热流体可以与容器物理分离，例如通过使传热流体流过热量 交换器围绕容器。 可以控制冷却参数，使得容器及其内容物在不冻结内容物的情况下快速冷却。
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公开(公告)号：US06584797B1
公开(公告)日：2003-07-01
申请号：US09876841
申请日：2001-06-06
IPC分类号： F25D308
CPC分类号： F25D11/003 , C09K5/047 , F25B17/02 , F25B17/08 , F25D2201/126 , F25D2201/14 , F25D2331/804
摘要： A temperature-controlled container utilizing a sorption cooling unit to maintain the temperature within the container. The sorption cooling unit cools the interior of the container and rejects waste heat to the exterior. The sorption cooling unit provides a lightweight and low volume alternative to the traditional gel pack cooling systems that are commonly used in the modern shipping industry for shipping containers.
摘要翻译： 使用吸附冷却单元的温度控制容器将温度保持在容器内。 吸附冷却单元冷却容器的内部并且将废热排除在外部。 吸附式冷却装置提供了一种重量轻且体积小的替代传统凝胶组件冷却系统，这些系统通常用于运输集装箱的现代航运业。
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公开(公告)号：US20090001086A1
公开(公告)日：2009-01-01
申请号：US12102703
申请日：2008-04-14
IPC分类号： B65D83/72
CPC分类号： B65D81/3851
摘要： A container insert for providing a thermally insulated enclosure. The container insert includes a bottom panel, side panels and end panels that are interconnected by a plastic backing sheet. The side panels and end panels can be pivoted upwardly to form side walls and end walls. The plastic backing sheet covers the seams between adjacent insulation panels to provide a moisture barrier. The plastic backing sheet can also urge adjacent panels together to reduce the gap between adjacent panels and improve thermal performance.
摘要翻译： 一种用于提供绝热外壳的容器插入件。 容器插入件包括底板，侧板和端板，其通过塑料背衬片相互连接。 侧板和端板可以向上枢转以形成侧壁和端壁。 塑料背衬板覆盖相邻绝缘板之间的接缝以提供防潮层。 塑料背衬片还可以将相邻的面板推到一起以减少相邻面板之间的间隙并改善热性能。
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