公开(公告)号：US4923716A

公开(公告)日：1990-05-08

申请号：US248651

申请日：1988-09-26

申请人： Duncan W. Brown ,  James D. Parsons

发明人： Duncan W. Brown ,  James D. Parsons

IPC分类号： C23C16/32

CPC分类号： C23C16/325

摘要： Silicon carbide is deposted by chemical vapor deposition from a vapor source having a single molecular species that provides both the silicon and the carbon. The molecular species has the composition C.sub.n Si.sub.n H.sub.m, where m ranges from 2n+1 to 4n+1 inclusive and n ranges from 2 to 6 inclusive, and exhibits a primary pyrolysis mechanism producing reactive fragments containing both silicon and carbon atoms. Unbalanced decomposition paths are avoided. The silicon and carbon atoms are necessarily codeposited in equal numbers and at equal rates onto the substrate, producing stoichiometric deposited silicon carbide. Preferred molecular sources include H.sub.3 SiCH.sub.2 CH.sub.2 SiH.sub.3, a silacycloalkane of the form (--SiH.sub.2 CH.sub.2 --).sub.p, where p is 2, 3, 4, or 5, and a cyclic structure of the form (--SiH(CH.sub.3)--).sub.q, where q is 4 or 5.

摘要翻译： 碳化硅通过化学气相沉积从具有提供硅和碳的单一分子种类的蒸气源中沉淀出来。 分子种类具有CnSinHm的组成，其中m范围为2n + 1至4n + 1，n为2至6，包括端值在内，并且表现出产生含有硅和碳原子的反应性片段的初级热解机理。 避免了不平衡的分解路径。 硅和碳原子必须以相等的数量和相等的速率共沉积到衬底上，产生化学计量沉积的碳化硅。 优选的分子源包括H3SiCH2CH2SiH3，（-SiH2CH2-）p形式的硅环烷烃，其中p为2,3,4或5，以及形式（-SiH（CH3） - ）q的环状结构，其中q为 4或5。

公开(公告)号：US4853148A

公开(公告)日：1989-08-01

申请号：US29631

申请日：1987-03-24

申请人： Glenn M. Tom ,  Duncan W. Brown

发明人： Glenn M. Tom ,  Duncan W. Brown

IPC分类号： B01D53/28 ,  B01J20/02 ,  B01J20/22 ,  C01B7/00 ,  C01B7/07 ,  C01B7/09 ,  C01B7/13 ,  C01B7/19 ,  C01G1/06

CPC分类号： C01B7/197 ,  B01D53/28 ,  C01B7/0718 ,  C01B7/093 ,  C01B7/135 ,  C01G1/06 ,  Y10S34/01

摘要： A process for drying a gaseous hydrogen halide of the formula HX, wherein X is selected from the group consisting of bromine, chlorine, fluorine, and iodine, to remove water impurity therefrom, comprising:contacting the water impurity-containing gaseous hydrogen halide with a scavenger including a support having associated therewith one or more members of the group consisting of:(a) an active scavenging moiety selected from one or more members of the group consisting of:(i) metal halide compounds dispersed in the support, of the formula MX.sub.y ; and(ii) metal halide pendant functional groups of the formula -MX.sub.y-1 covalently bonded to the support, wherein M is a y-valent metal, and y is an integer whose value is from 1 to 3;(b) corresponding partially or fully alkylated compounds and/or pendant functional groups, of the metal halide compounds and/or pendant functional groups of (a);wherein the alkylated compounds and/or pendant functional groups, when present, are reactive with the gaseous hydrogen halide to form the corresponding halide compounds and/or pendant functional groups of (a); andM being selected such that the heat of formation, .DELTA.H.sub.f of its hydrated halide, MX.sub.y.(H.sub.2 O).sub.n, is governed by the relationship:.DELTA.H.sub.f .gtoreq.n.times.10.1 kilocalories/mole of such hydrated halide compoundwherein n is the number of water molecules bound to the metal halide in the metal halide hydrate.Also disclosed is an appertaining scavenger composition and a contacting apparatus wherein the scavenger is deployed in a bed for contacting with the water impurity-containing gaseous hydrogen halide.

公开(公告)号：US5453494A

公开(公告)日：1995-09-26

申请号：US181800

申请日：1994-01-18

申请人： Peter S. Kirlin ,  Duncan W. Brown ,  Robin A. Gardiner

发明人： Peter S. Kirlin ,  Duncan W. Brown ,  Robin A. Gardiner

IPC分类号： C23C16/18 ,  C23C16/40 ,  C23C16/448 ,  G01T5/08 ,  G02B6/02 ,  G02B6/036 ,  H01L39/24 ,  C06F5/00 ,  C07D213/22 ,  H01B12/00

CPC分类号： G02B6/02 ,  C23C16/18 ,  C23C16/40 ,  C23C16/408 ,  C23C16/409 ,  C23C16/4481 ,  C23C16/4483 ,  C23C16/45561 ,  H01L39/2441

摘要： Metal organic chemical vapor deposition (MOCVD) source reagents useful for formation of metal-containing films, such as thin film copper oxide high temperature superconductor (HTSC) materials. The source reagents have the formula MAyX wherein: M is a metal such as Cu, Ba, Sr, La, Nd, Ce, Pr, Sm, Eu, Th, Gd, Tb, Dy, Ho, Er, Tm Yb, Lu Bi, Tl, Y or Pb; A is a monodentate or multidentate organic ligand; y is 2 or 3; MAy is a stable sub-complex at STP conditions; and X is a monodentate or multidentate ligand coordinated to M and containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O, and F. The ligand A may for example be selected from beta-diketonates, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases. The complexes of the invention utilize monodentate or multidentate ligands to provide additional coordination to the metal atom, so that the resulting complex is of enhanced volatility characteristics, and enhanced suitability for MOCVD applications.

摘要翻译： 用于形成含金属膜的金属有机化学气相沉积（MOCVD）源试剂，如薄膜氧化铜高温超导体（HTSC）材料。 所述源试剂具有下式：其中：M是金属如Cu，Ba，Sr，La，Nd，Ce，Pr，Sm，Eu，Th，Gd，Tb，Dy，Ho，Er，Tm Yb，Lu Bi ，Tl，Y或Pb; A是单齿或多齿有机配体; y为2或3; 在STP条件下，MAy是一个稳定的子复合体; 并且X是与M配位且含有独立地选自元素C，N，H，S，O和F的原子的一个或多个原子的单齿或多齿配体。配体A可以例如选自 β-二酮酸酯，环戊二烯基，烷基，全氟烷基，醇盐，全氟烷氧基化物和希夫碱。 本发明的络合物利用单齿或多齿配位体为金属原子提供额外的配位，使得所得复合物具有增强的挥发性特征，并且增强了对MOCVD应用的适用性。

公开(公告)号：US5280012A

公开(公告)日：1994-01-18

申请号：US918141

申请日：1992-07-22

申请人： Peter S. Kirlin ,  Duncan W. Brown ,  Robin A. Gardiner

发明人： Peter S. Kirlin ,  Duncan W. Brown ,  Robin A. Gardiner

IPC分类号： C23C16/18 ,  C23C16/40 ,  C23C16/448 ,  G01T5/08 ,  G02B6/02 ,  G02B6/036 ,  H01L39/24 ,  C23C16/00 ,  B05D5/12

CPC分类号： C23C16/18 ,  C23C16/40 ,  C23C16/408 ,  C23C16/409 ,  C23C16/4481 ,  C23C16/4483 ,  C23C16/45561 ,  G02B6/02 ,  H01L39/2441 ,  Y10S505/73 ,  Y10S505/734

摘要： This invention is directed to the metal organic chemical vapor deposition (MOCVD) formation of copper oxide superconductor materials. Various source reagents of Group II elements suitable for high temperature superconductor (HTSC) material formation are described, including beta-diketonates, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases, as well as complexes of such Group II compounds, utilizing monodentate or multidentate ligands to provide additional coordination to the Group IIA atom, so that the resulting complex is of enhanced volatility characteristics, and enhanced suitability for MOCVD applications. Also disclosed are methods of synthesizing such compounds and complexes, including a method of making Group II metal beta-diketonate compounds having enhanced thermal stability characteristics.

摘要翻译： 本发明涉及氧化铜超导材料的金属有机化学气相沉积（MOCVD）的形成。 描述了适用于高温超导体（HTSC）材料形成的II族元素的各种源试剂，包括β-二酮酸酯，环戊二烯基，烷基，全氟烷基，烷氧基，全氟烷氧基和席夫碱，以及这些II族化合物的配合物，利用 单齿或多齿配体，以提供与IIA族原子的额外配位，使得所得复合物具有增强的挥发性特征，并增强了对MOCVD应用的适用性。 还公开了合成这种化合物和络合物的方法，包括制备具有增强的热稳定性特征的II族金属β-二酮化合物的方法。

公开(公告)号：US4983363A

公开(公告)日：1991-01-08

申请号：US163792

申请日：1988-03-03

申请人： Glenn M. Tom ,  Duncan W. Brown

发明人： Glenn M. Tom ,  Duncan W. Brown

IPC分类号： B01J20/32 ,  C01B6/06 ,  C01B21/04 ,  C01B23/00 ,  C01B25/06

CPC分类号： C01B23/00 ,  B01J20/3204 ,  B01J20/321 ,  B01J20/3234 ,  B01J20/3246 ,  B01J20/3248 ,  B01J20/3255 ,  B01J20/3265 ,  B01J20/3282 ,  C01B21/0427 ,  C01B25/06 ,  C01B6/065

摘要： An apparatus for purifying a gaseous mixture comprising arsine, phosphine, ammonia, and/or inert gases, to remove Lewis acid and/or oxidant impurities therefrom, comprising a vessel containing a bed of a scavenger, the scavenger including a support having associated therewith an anion which is effective to remove such impurities, such anion being selected from one or more members of the group consisting of: (i) carbanions whose corresponding protonated compounds have a pK.sub.a value of from about 22 to about 36; and (ii) anions formed by reaction of such carbanions with the primary component of the mixture.

摘要翻译： 一种用于净化包含胂，膦，氨和/或惰性气体的气体混合物以从其中除去路易斯酸和/或氧化剂杂质的装置，包括含有清除剂床的容器，所述清除剂包括与其相关的载体 有效除去这些杂质的阴离子，这种阴离子选自以下组成的一个或多个成员：（i）其对应的质子化合物的pKa值为约22至约36的碳阴离子; 和（ii）通过这种碳阴离子与混合物的主要组分的反应形成的阴离子。

公开(公告)号：US6126996A

公开(公告)日：2000-10-03

申请号：US990943

申请日：1997-12-15

申请人： Peter S. Kirlin ,  Duncan W. Brown ,  Thomas W. Baum ,  Brian A. Vaarstra ,  Robin A. Gardiner

发明人： Peter S. Kirlin ,  Duncan W. Brown ,  Thomas W. Baum ,  Brian A. Vaarstra ,  Robin A. Gardiner

IPC分类号： H01L21/31 ,  C07F1/08 ,  C07F3/00 ,  C07F3/04 ,  C07F5/00 ,  C07F7/00 ,  C07F7/28 ,  C07F9/00 ,  C07F11/00 ,  C07F19/00 ,  C23C16/00 ,  C23C16/18 ,  C23C16/30 ,  C23C16/40 ,  C23C16/448 ,  G01T5/08 ,  G02B6/02 ,  G02B6/036 ,  H01L39/24

CPC分类号： C23C16/18 ,  C07F19/005 ,  C07F3/003 ,  C07F5/003 ,  C07F7/006 ,  C07F9/005 ,  C23C16/30 ,  C23C16/305 ,  C23C16/40 ,  C23C16/408 ,  C23C16/409 ,  C23C16/4481 ,  C23C16/4483 ,  C23C16/45561 ,  H01L39/2441

摘要： A metalorganic complex of the formula:MA.sub.Y Xwherein:M is a y-valent metal;A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAY with X;y is an integer having a value of 2, 3 or 4;each of the A ligands may be the same or different; andX is a monodentate or multidentate ligand coordinated to M and containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F.The metal M may be selected from the group consisting of Cu, Ba, Sr, La, Nd, Ce, Pr, Sm, Eu, Th, Gd, Th, Dy, Ho, Er, Tm, Yb, Lu, Bi, Tl, Y, Pb, Ni, Pd, Pt, Al, Ga, In, Ag, Au, Co, Rh, Ir, Fe, Ru, Sn, Li, Na, K, Rb, Cs, Ca, Mg, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W. A may be selected from the group consisting of .beta.-diketonates and their sulfur and nitrogen analogs, .beta.-ketoesters and their sulfur and nitrogen analogs, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases. X may for example comprise a ligand such as tetraglyme, tetrahydrofuran, bipyridine, crown ether, or thioether.

摘要翻译： 下式的金属有机络合物：其中：M为Y价金属; A是与M配位的单齿或多齿有机配体，其允许MAY与X的络合; y是值为2,3或4的整数; 每个A配体可以相同或不同; 并且X是与M配位并含有独立地选自元素C，N，H，S，O和F的原子的一个或多个原子的单齿或多齿配体。金属M可以选自 的Cu，Ba，Sr，La，Nd，Ce，Pr，Sm，Eu，Th，Gd，Th，Dy，Ho，Er，Tm，Yb，Lu，Bi，Tl，Y，Pb，Ni，Pd，Pt ，Al，Ga，In，Ag，Au，Co，Rh，Ir，Fe，Ru，Sn，Li，Na，K，Rb，Cs，Ca，Mg，Ti，Zr，Hf，V，Nb，Ta，Cr ，Mo和W.A可以选自β-二酮类及其硫和氮类似物，β-酮酯及其硫和氮类似物，环戊二烯基，烷基，全氟烷基，烷氧基化物，全氟烷氧化物和席夫碱。 X可以例如包括配体如四甘醇二甲醚，四氢呋喃，联吡啶，冠醚或硫醚。

公开(公告)号：US6027547A

公开(公告)日：2000-02-22

申请号：US080536

申请日：1998-05-18

申请人： Glenn M. Tom ,  Duncan W. Brown

发明人： Glenn M. Tom ,  Duncan W. Brown

IPC分类号： B01D53/04

CPC分类号： B01D53/0415 ,  B01D53/02 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/108 ,  B01D2253/25 ,  B01D2253/306 ,  B01D2257/20 ,  B01D2257/304 ,  B01D2257/406 ,  B01D2257/553 ,  B01D2257/93 ,  B01D2258/0216 ,  B01D2259/40088 ,  B01D2259/4525 ,  B01D2259/4541

摘要： A fluid storage and dispensing system, comprising: a fluid storage and dispensing vessel constructed and arranged for selective dispensing of fluid therefrom; a solid-phase support in the vessel; and an affinity medium on the solid-phase support, wherein the affinity medium reversibly takes up the fluid when contacted therewith, and from which the fluid is disengagable under dispensing conditions. The affinity medium may be a liquid, oil, gel, or solid (porous solid, thin film solid, or bulk solid). The system of the invention may be employed for the storage and dispensing of fluids such as hydride, halide and dopant gases for manufacturing of semiconductor products.

摘要翻译： 一种流体储存和分配系统，包括：构造和布置用于从其中选择性分配流体的流体储存和分配容器; 船上固相支撑; 和固相载体上的亲和介质，其中所述亲和介质在与其接触时可逆地吸收流体，并且在分配条件下流体可以从其中分离。 亲和介质可以是液体，油，凝胶或固体（多孔固体，薄膜固体或本体固体）。 本发明的系统可用于储存和分配诸如用于制造半导体产品的氢化物，卤化物和掺杂剂气体的流体。

公开(公告)号：US5919522A

公开(公告)日：1999-07-06

申请号：US835768

申请日：1997-04-08

申请人： Thomas H. Baum ,  Gregory T. Stauf ,  Peter S. Kirlin ,  Duncan W. Brown ,  Robin A. Gardiner ,  Gautam Bhandari ,  Brian A. Vaartstra

发明人： Thomas H. Baum ,  Gregory T. Stauf ,  Peter S. Kirlin ,  Duncan W. Brown ,  Robin A. Gardiner ,  Gautam Bhandari ,  Brian A. Vaartstra

IPC分类号： C07C49/12 ,  C07C211/14 ,  C23C16/18 ,  C23C16/40 ,  C23C16/448 ,  C23C16/00

CPC分类号： C23C16/18 ,  C23C16/40 ,  C23C16/409 ,  C23C16/4481

摘要： A method of forming a thin film of BaSrTiO.sub.3 on a substrate in a chemical vapor deposition zone, with transport of a metal precursor composition for the metal-containing film to the chemical vapor deposition zone via a liquid delivery apparatus including a vaporizer. A liquid precursor material is supplied to the liquid delivery apparatus for vaporization thereof to yield the vapor-phase metal precursor composition. The vapor-phase metal precursor composition is flowed to the chemical vapor deposition zone for deposition of metal on the substrate to form the metal-containing film. The liquid precursor material includes a metalorganic polyamine complex, the use of which permits the achievement of sustained operation of the liquid delivery chemical vapor deposition process between maintenance events, due to the low decomposition levels achieved in the vaporization of the polyamine-complexed precursor.

摘要翻译： 一种在化学气相沉积区中在衬底上形成BaSrTiO3薄膜的方法，该方法通过包括蒸发器的液体输送装置将含金属膜的金属前体组合物输送到化学气相沉积区。 将液体前体材料供给到液体输送装置中以使其蒸发以产生气相金属前体组合物。 气相金属前体组合物流到化学气相沉积区，用于在基底上沉积金属以形成含金属膜。 液体前体材料包括金属有机多胺络合物，其用途允许在维持事件之间实现液体输送化学气相沉积工艺的持续操作，这是由于在多胺络合的前体的蒸发中实现的低分解水平。

公开(公告)号：US5015411A

公开(公告)日：1991-05-14

申请号：US494976

申请日：1990-03-16

申请人： Glenn M. Tom ,  Duncan W. Brown

发明人： Glenn M. Tom ,  Duncan W. Brown

IPC分类号： B01J20/32 ,  C01B6/06 ,  C01B21/04 ,  C01B23/00 ,  C01B25/06

CPC分类号： C01B6/065 ,  B01J20/08 ,  B01J20/223 ,  B01J20/3078 ,  B01J20/3204 ,  B01J20/3265 ,  C01B21/0427 ,  C01B23/00 ,  C01B25/06 ,  B01J2220/56 ,  B01J2220/64 ,  B01J2220/66

摘要： A scavenger for purifying inert gas mixtures to remove Lewis acid and oxidant impurities therefrom, comprising (i) an inert inorganic support, and (ii) an active scavenging species on the support, formed by deposition thereon of an organometallic precursor and pyrolysis thereof at a selected elevated temperature. The organometallic precursor is an alkyl metal compound comprising a metal of Group IA, IIA, and/or IIIA, wherein the pyrolysis temperature may range from about 150.degree. C. to about 250.degree. C., depending on the specific alkyl metal compound employed as the precursor. Also disclosed are: a corresponding method of making the scavenger; a process for purifying inert gases by contacting same with the scavenger; and a vessel containing a bed of the scavenger, useful as an apparatus for purifying inert gases.

摘要翻译： 一种用于净化惰性气体混合物以从其中除去路易斯酸和氧化剂杂质的清除剂，其包含（i）惰性无机载体，和（ii）载体上的活性清除物质，其通过在其上沉积有机金属前体而形成，并在 选择升高的温度。 有机金属前体是包含IA，IIA和/或IIIA族金属的烷基金属化合物，其中热分解温度可以在约150℃至约250℃的范围内，这取决于作为 的前身。 还公开了：制备清除剂的相应方法; 通过与清除剂接触来净化惰性气体的方法; 以及容纳清除剂床的容器，可用作净化惰性气体的装置。

公开(公告)号：US4865822A

公开(公告)日：1989-09-12

申请号：US255765

申请日：1988-10-11

申请人： Glenn M. Tom ,  Duncan W. Brown

发明人： Glenn M. Tom ,  Duncan W. Brown

IPC分类号： B01J20/32

CPC分类号： B01J20/3265 ,  B01J20/3204 ,  B01J20/321

摘要： A scavenger, having utility for purifying a mixture comprising:(i) a primary component selected from one or more members of the group consisting of hydrogen selenide and hydrogen telluride, and(ii) impurities selected from one or more members of the group consisting of moisture and oxidants, comprising:(a) a support; and(b) associated with said support, one or more members of the group consisting of:(I) precusor compounds of the formula R.sub.3-x AlH.sub.x, wherein x is 0 or 1, and R is a hydrocarbon radical containing from 1 to 12 carbon atoms; and(II) aluminum chalconides of the formula Al.sub.2 M.sub.3, wherein M is selenium or tellurium.Illustrative supports useful in such scavenger include aluminosilicates, alumina, silica, carbon, and macroreticulate polymers. A process and apparatus are disclosed for purifying hyhrogen selenide and/or hydrogen telluride, to remove moisture and/or oxidant impurities therefrom, in which a bed of the scavenger is employed.

摘要翻译： 一种清除剂，其用于纯化混合物，其包含：（i）选自硒化氢和碲化氢中的一种或多种成员的主要成分，和（ii）选自以下的一种或多种成员的杂质： 水分和氧化剂，包括：（a）载体; 和（b）与所述载体相关联，所述组中的一个或多个成员包括：（I）式R3-xAlHx的前体化合物，其中x为0或1，R为含有1至12个碳的烃基 原子 和（II）式Al 2 M 3的铝金卤素，其中M是硒或碲。 在这种清除剂中有用的说明性的载体包括硅铝酸盐，氧化铝，二氧化硅，碳和大理石聚合物。 公开了一种用于净化硒化氢和/或碲化氢的方法和装置，以除去其中使用清除剂床的水分和/或氧化剂杂质。