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1.发明申请公开(公告)号：US20120327381A1
公开(公告)日：2012-12-27
申请号：US13582261
申请日：2011-01-31
申请人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin
发明人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin
IPC分类号： G03B27/52
CPC分类号： H05G2/008 , G02B5/00 , G02B19/00 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G03F7/70908 , G03F7/70916 , G03F7/70933 , H05G2/003
摘要： A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.
摘要翻译： 用于产生用于光刻设备的极紫外辐射的辐射源具有碎片减轻装置，其包括布置在辐射束的中间焦点（IF）处或其附近的喷嘴。 喷嘴用于引导气体（330）流向辐射源或收集器光学元件，以便偏转由辐射源发射的颗粒物（43）。
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公开(公告)号：US08755032B2
公开(公告)日：2014-06-17
申请号：US13063139
申请日：2009-07-21
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。
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公开(公告)号：US20110164236A1
公开(公告)日：2011-07-07
申请号：US13063139
申请日：2009-07-21
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。
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4.发明授权Lithographic apparatus, spectral purity filter and device manufacturing method 有权平版印刷设备，光谱纯度滤光片和器件制造方法公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。
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公开(公告)号：US09395630B2
公开(公告)日：2016-07-19
申请号：US13704222
申请日：2011-03-17
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
IPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , C01B31/04 , G02B5/08 , G02B5/20 , G02B27/00 , G03F1/24 , G03F1/62 , G21K1/06 , H01B1/04 , H01B1/24 , G03B27/54
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
摘要翻译： 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。
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公开(公告)号：US20130088699A1
公开(公告)日：2013-04-11
申请号：US13704222
申请日：2011-03-17
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
摘要翻译： 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。
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公开(公告)号：US09726989B2
公开(公告)日：2017-08-08
申请号：US13643265
申请日：2011-02-22
申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
发明人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC分类号： G03F7/70891 , G02B5/208 , G03F7/70191 , G03F7/70575
摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.
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公开(公告)号：US20140160455A1
公开(公告)日：2014-06-12
申请号：US14181076
申请日：2014-02-14
申请人： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Ven Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
发明人： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Ven Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
IPC分类号： G03F7/20
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
摘要翻译： 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。
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9.发明申请Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method 有权光刻设备，光谱纯化过滤器和器件制造方法公开(公告)号：US20140085619A1
公开(公告)日：2014-03-27
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。
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公开(公告)号：US20130038926A1
公开(公告)日：2013-02-14
申请号：US13643265
申请日：2011-02-22
申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
发明人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC分类号： G03F7/70891 , G02B5/208 , G03F7/70191 , G03F7/70575
摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.
摘要翻译： 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃
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