SELF-ALIGNED THIN FILM TRANSISTOR WITH DOPING BARRIER AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    SELF-ALIGNED THIN FILM TRANSISTOR WITH DOPING BARRIER AND METHOD OF MANUFACTURING THE SAME 有权
    自对准薄膜晶体管及其制造方法

    公开(公告)号:US20140042539A1

    公开(公告)日:2014-02-13

    申请号:US13960352

    申请日:2013-08-06

    IPC分类号: H01L29/66 H01L29/786

    摘要: Disclosed are a self-aligned thin film transistor controlling a diffusion length of a doping material using a doping barrier in a thin film transistor having a self-aligned structure and a method of manufacturing the same. The self-aligned thin film transistor with a doping barrier includes: an active layer formed on a substrate and having a first doping region, a second doping region, and a channel region; a gate insulating film formed on the channel region; a gate electrode formed on the gate insulating film; a doping source film formed on the first doping region and the second doping region; and a doping barrier formed between the doping source film and the first doping region and between the doping source film and the second doping region.

    摘要翻译: 公开了一种在具有自对准结构的薄膜晶体管中使用掺杂阻挡层控制掺杂材料的扩散长度的自对准薄膜晶体及其制造方法。 具有掺杂势垒的自对准薄膜晶体管包括:形成在衬底上并具有第一掺杂区,第二掺杂区和沟道区的有源层; 形成在沟道区上的栅极绝缘膜; 形成在栅极绝缘膜上的栅电极; 形成在所述第一掺杂区域和所述第二掺杂区域上的掺杂源膜; 以及在掺杂源膜和第一掺杂区之间以及在掺杂源膜和第二掺杂区之间形成的掺杂势垒。

    SELF-ALIGNED THIN FILM TRANSISTOR AND FABRICATION METHOD THEREOF
    5.
    发明申请
    SELF-ALIGNED THIN FILM TRANSISTOR AND FABRICATION METHOD THEREOF 审中-公开
    自对准薄膜晶体管及其制造方法

    公开(公告)号:US20160104804A1

    公开(公告)日:2016-04-14

    申请号:US14971217

    申请日:2015-12-16

    摘要: Disclosed are a self-aligned thin film transistor capable of simultaneously improving an operation speed and stability and minimizing a size thereof by forming source and drain electrodes so as to be self-aligned, and a fabrication method thereof. The method of fabricating a thin film transistor according to an exemplary embodiment of the present disclosure includes: forming an active layer, a gate insulator, and a gate layer on a substrate; forming a photoresist layer pattern for defining a shape of a gate electrode on the gate layer; etching the gate layer, the gate insulator, and the active layer by using the photoresist layer pattern; depositing a source and drain layer on the etched substrate by a deposition method having directionality; and forming a gate electrode and self-aligned source electrode and drain electrode by removing the photoresist layer pattern.

    摘要翻译: 本发明公开了一种自对准薄膜晶体管及其制造方法,其能够同时提高操作速度和稳定性,并且通过形成源极和漏极以自对准地使其尺寸最小化。 根据本公开的示例性实施例的制造薄膜晶体管的方法包括:在衬底上形成有源层,栅极绝缘体和栅极层; 形成用于限定所述栅极层上的栅电极的形状的光致抗蚀剂层图案; 通过使用光致抗蚀剂层图案蚀刻栅极层,栅极绝缘体和有源层; 通过具有方向性的沉积方法在蚀刻的衬底上沉积源极和漏极层; 以及通过去除光致抗蚀剂层图案形成栅电极和自对准源电极和漏电极。

    NONVOLATILE MEMORY CELL AND METHOD OF MANUFACTURING THE SAME
    6.
    发明申请
    NONVOLATILE MEMORY CELL AND METHOD OF MANUFACTURING THE SAME 有权
    非易失性存储单元及其制造方法

    公开(公告)号:US20140011297A1

    公开(公告)日:2014-01-09

    申请号:US14022705

    申请日:2013-09-10

    IPC分类号: H01L29/66

    摘要: Provided are a nonvolatile memory cell and a method of manufacturing the same. The nonvolatile memory cell includes a memory transistor and a driver transistor. The memory transistor includes a semiconductor layer, a buffer layer, an organic ferroelectric layer, and a gate electrode, which are disposed on a substrate. The driver transistor includes the semiconductor layer, the buffer layer, a gate insulating layer, and the gate electrode, which are disposed on the substrate. The memory transistor and the driver transistor are disposed on the same substrate. The nonvolatile memory cell is transparent in a visible light region.

    摘要翻译: 提供一种非易失性存储单元及其制造方法。 非易失性存储单元包括存储晶体管和驱动晶体管。 存储晶体管包括设置在基板上的半导体层,缓冲层,有机铁电层和栅极电极。 驱动晶体管包括设置在基板上的半导体层,缓冲层,栅极绝缘层和栅极电极。 存储晶体管和驱动晶体管设置在同一衬底上。 非易失性存储单元在可见光区域是透明的。

    METHOD FOR MANUFACTURING AN ACTIVE MATRIX ORGANIC LIGHT EMITTING DIODE
    7.
    发明申请
    METHOD FOR MANUFACTURING AN ACTIVE MATRIX ORGANIC LIGHT EMITTING DIODE 审中-公开
    制造有源矩阵有机发光二极管的方法

    公开(公告)号:US20130302923A1

    公开(公告)日:2013-11-14

    申请号:US13908009

    申请日:2013-06-03

    IPC分类号: H01L51/52

    摘要: Disclosed are an active matrix organic light emitting diode and a method for manufacturing the same. The active matrix organic light emitting diode includes: a substrate; a black matrix formed above a part of the substrate; at least one thin film transistor formed above the black matrix; a passivation film formed to entirely cover the at least one thin film transistor; a planarizing layer formed above the passivation film; a color filter formed above an upper part of the planarizing layer opposite to the position where the at least one thin film transistor is formed; and an organic light emitting diode formed above the color filter.

    摘要翻译: 公开了有源矩阵有机发光二极管及其制造方法。 有源矩阵有机发光二极管包括:基板; 形成在基板的一部分上方的黑色矩阵; 形成在黑矩阵上方的至少一个薄膜晶体管; 形成为完全覆盖所述至少一个薄膜晶体管的钝化膜; 形成在钝化膜上方的平坦化层; 形成在所述平坦化层的与形成有所述至少一个薄膜晶体管的位置相反的上方的滤色器; 以及形成在滤色器上方的有机发光二极管。

    DUAL DISPLAY DEVICE WITH VERTICAL STRUCTURE
    8.
    发明申请
    DUAL DISPLAY DEVICE WITH VERTICAL STRUCTURE 有权
    具有垂直结构的双显示设备

    公开(公告)号:US20140042475A1

    公开(公告)日:2014-02-13

    申请号:US13960413

    申请日:2013-08-06

    IPC分类号: H01L27/32

    摘要: Disclosed is a dual display device having a vertical structure, in which a reflective display device and a self-emissive display device are formed on one substrate in a vertical structure so as to enable a reflective display or a self-emissive display according to a situation and provide a high resolution display. The dual display device having a vertical structure includes: a thin film transistor formed on a substrate; a white light emitting device formed on the thin film transistor: a reflection adjusting layer formed on the white light emitting device; and a color converting layer formed on the reflection adjusting layer.

    摘要翻译: 公开了一种具有垂直结构的双显示装置,其中反射显示装置和自发光显示装置以垂直结构形成在一个基板上,以便能够根据情况进行反射显示或自发显示 并提供高分辨率显示。 具有垂直结构的双显示装置包括:形成在基板上的薄膜晶体管; 形成在所述薄膜晶体管上的白色发光器件,形成在所述白色发光器件上的反射调节层; 以及形成在反射调节层上的颜色转换层。

    VERTICAL CHANNEL THIN FILM TRANSISTOR
    9.
    发明申请
    VERTICAL CHANNEL THIN FILM TRANSISTOR 审中-公开
    垂直通道薄膜晶体管

    公开(公告)号:US20130161732A1

    公开(公告)日:2013-06-27

    申请号:US13712428

    申请日:2012-12-12

    IPC分类号: H01L29/78

    摘要: Disclosed is a vertical channel thin film transistor including a substrate; a drain electrode formed on the substrate; a spacer formed on the substrate while coming into contact with the drain electrode; a source electrode formed on the spacer; an active layer formed on an entire surface of the substrate including the drain electrode and the source electrode and configured to form a vertical channel; a gate insulating layer formed on the active layer; and a gate electrode formed on the gate insulating layer.

    摘要翻译: 公开了一种包括衬底的垂直沟道薄膜晶体管; 形成在所述基板上的漏电极; 在与所述漏电极接触的同时在所述基板上形成的间隔物; 形成在间隔物上的源电极; 形成在包括所述漏电极和所述源电极的所述基板的整个表面上的有源层,并且被构造成形成垂直沟道; 形成在所述有源层上的栅极绝缘层; 以及形成在栅极绝缘层上的栅电极。