公开(公告)号：US5492229A

公开(公告)日：1996-02-20

申请号：US151386

申请日：1993-11-12

申请人： Takashi Tanaka ,  Jun Yoshikawa ,  Eiichi Toya ,  Atsuo Kitazawa ,  Kazunori Meguro ,  Tatsuo Nozawa ,  Yutaka Ishizuka ,  Yoshiyuki Watanabe ,  Masaru Seino ,  Hideo Nakanishi

发明人： Takashi Tanaka ,  Jun Yoshikawa ,  Eiichi Toya ,  Atsuo Kitazawa ,  Kazunori Meguro ,  Tatsuo Nozawa ,  Yutaka Ishizuka ,  Yoshiyuki Watanabe ,  Masaru Seino ,  Hideo Nakanishi

IPC分类号： C30B31/14 ,  H01L21/673 ,  A47F7/00

CPC分类号： H01L21/67309 ,  C30B31/14

摘要： A vertical boat for holding a plurality of semiconductor wafers comprising two end members (2) positioned at the top and the bottom of the vertical boat, and a plurality of support members (3,4,5,6,104) vertically mounted on the end members (2) for supporting the wafers, wherein each support member (3,4,5,6,104) is formed by a plate-like member having a series of slits (9,10,7,8,108) formed thereon in such a manner that a plurality of support arms are defined by the slits (9,10,7,8,108) at a predetermined interval, each support arm having a support projection (11,12,13,14,112) formed at the end thereof, and wherein the inner portions (P) of the wafer (1) is to be supported by the support projections (11,12,13,14,112) whereas the periphery of the wafer (1) does not contact the arms of the support members (3,4,5,6,104). The slits can be formed in two steps: forming a series of first slit portions on the plate-like member at a predetermined interval so as to retain two side walls of the plate-like member; and forming a series of second small slit portions on one of the side walls at the same interval so as to connect each second slit portion to the corresponding first slit portion.

摘要翻译： 一种用于保持多个半导体晶片的垂直船，包括位于垂直船的顶部和底部的两个端部构件（2）和垂直安装在端部构件上的多个支撑构件（3,4,5,6,104） （2），用于支撑晶片，其中每个支撑构件（3,4,5,6,104）由其上形成有一系列狭缝（9,10,7,8,108）的板状构件形成，其方式使得 多个支撑臂由狭缝（9,10,7,8,108）以预定的间隔限定，每个支撑臂具有在其端部形成的支撑突起（11,12,13,14,112），并且其中内部 晶片（1）的部分（P）将由支撑突起（11,12,13,14,112）支撑，而晶片（1）的周边不与支撑部件（3,4）的臂接触， 5,6,104）。 狭缝可以分成两个步骤：以预定间隔在板状构件上形成一系列第一狭缝部分，以便保持板状构件的两个侧壁; 并且在一个侧壁上以相同的间隔形成一系列第二小狭缝部分，以将每个第二狭缝部分连接到相应的第一狭缝部分。

公开(公告)号：US09277637B2

公开(公告)日：2016-03-01

申请号：US13885708

申请日：2011-11-16

申请人： Toshihisa Nozawa ,  Caizhong Tian ,  Masaru Sasaki ,  Naoki Mihara ,  Naoki Matsumoto ,  Kazuki Moyama ,  Jun Yoshikawa

发明人： Toshihisa Nozawa ,  Caizhong Tian ,  Masaru Sasaki ,  Naoki Mihara ,  Naoki Matsumoto ,  Kazuki Moyama ,  Jun Yoshikawa

IPC分类号： H01L21/306 ,  H05H1/46 ,  H01J37/32

CPC分类号： H05H1/46 ,  H01J37/32192 ,  H01J37/32211 ,  H01J37/3244

摘要： An apparatus for plasma treatment contains a process vessel provided with a mounting table for mounting a substrate, a first gas supplying unit configured to supply a first gas into the process vessel, a first plasma generating unit configured to convert at least a part of the first gas to a first plasma, a second gas supplying unit configured to supply a second gas into the process vessel, and a second plasma generating unit configured to convert at least a part of the second gas to a second plasma. A height of ea an inlet of the second gas from the mounting table is lower than a height of an inlet of the first gas from the mounting table.

摘要翻译： 一种用于等离子体处理的装置，包括设置有用于安装基板的安装台的处理容器，构造成将第一气体供应到处理容器中的第一气体供给单元，第一等离子体产生单元，其被配置为将第一 第二气体供给单元，被配置为将第二气体供应到处理容器中;第二等离子体产生单元，被配置为将至少一部分第二气体转化为第二等离子体。 来自安装台的第二气体的入口的高度低于来自安装台的第一气体的入口的高度。

公开(公告)号：US08709662B2

公开(公告)日：2014-04-29

申请号：US13112029

申请日：2011-05-20

申请人： Ryuta Sugiura ,  Tsutomu Nanataki ,  Jun Yoshikawa

发明人： Ryuta Sugiura ,  Tsutomu Nanataki ,  Jun Yoshikawa

IPC分类号： H01M4/13 ,  H01M8/06 ,  H01L35/34 ,  H01M4/88

CPC分类号： H01M4/505 ,  C01G31/006 ,  C01G31/02 ,  C01P2002/50 ,  C01P2006/40 ,  H01M4/0471 ,  H01M4/1391 ,  H01M4/525 ,  H01M10/052 ,  H01M2004/021

摘要： The method for producing a cathode active material for a lithium secondary battery is characterized by including (1) a forming step of forming a sheet-form compact containing, as raw substances, a lithium compound serving as a first ingredient, a compound of a transition metal other than lithium serving as a second ingredient, and at least one of boron oxide and vanadium oxide serving as a third ingredient; and (2) a firing step of firing the compact at 700 to 1,300° C.

摘要翻译： 制造锂二次电池用正极活性物质的方法的特征在于，包括（1）形成作为原料的作为原料的作为第一成分的锂化合物，过渡化合物的片状成形体的成形工序 作为第二成分的锂以外的金属和作为第三成分的氧化硼和氧化钒中的至少一种; 和（2）在700〜1300℃下烧成该烧结体的烧成工序

公开(公告)号：USD697038S1

公开(公告)日：2014-01-07

申请号：US29416085

申请日：2012-03-19

申请人： Naoki Matsumoto ,  Jun Yoshikawa

设计人： Naoki Matsumoto ,  Jun Yoshikawa

公开(公告)号：US08444948B2

公开(公告)日：2013-05-21

申请号：US13204538

申请日：2011-08-05

申请人： Katsuki Ide ,  Tetsuya Mine ,  Jun Yoshikawa ,  Tsuyoshi Noma ,  Masao Kon ,  Kazutaka Kojo

发明人： Katsuki Ide ,  Tetsuya Mine ,  Jun Yoshikawa ,  Tsuyoshi Noma ,  Masao Kon ,  Kazutaka Kojo

IPC分类号： D01C5/00

CPC分类号： D01F9/133 ,  B82Y30/00 ,  B82Y40/00 ,  D01F9/127

摘要： According to one embodiment, there is provided a graphite nano-carbon fiber provided by using an apparatus having a reactor capable of keeping a reducing atmosphere inside thereof, a metal substrate arranged as a catalyst in the reactor, a heater heating the metal substrate, a pyrolysis gas source supplying pyrolysis gas obtained by thermally decomposing a wood material in a reducing atmosphere to the reactor, a scraper scraping carbon fibers produced on the metal substrate, a recovery container recovering the scraped carbon fibers, and an exhaust pump discharging exhaust gas from the reactor. The carbon fibers are linear carbon fibers with a diameter of 25 to 250 nm formed with layers of graphenes stacked in a longitudinal direction.

摘要翻译： 根据一个实施方案，提供一种石墨纳米碳纤维，其通过使用具有能够保持其内部还原气氛的反应器的装置，在反应器中作为催化剂排列的金属基材，加热金属基材的加热器， 通过将还原性气氛中的木质材料热分解成反应器得到的裂解气体的热解气体源，在该金属基材上产生的刮刀刮除碳纤维，回收上述刮削碳纤维的回收容器以及从上述排出废气排出废气的排气泵 反应堆。 碳纤维是直径为25至250nm的线性碳纤维，其沿长度方向堆叠形成有层叠的石墨烯。

公开(公告)号：US20100092666A1

公开(公告)日：2010-04-15

申请号：US12519933

申请日：2007-11-29

申请人： Eisuke Morisaki ,  Hirokatsu Kobayashi ,  Jun Yoshikawa ,  Ikuo Sawada ,  Tsunenobu Kimoto ,  Noriaki Kawamoto ,  Masatoshi Aketa

发明人： Eisuke Morisaki ,  Hirokatsu Kobayashi ,  Jun Yoshikawa ,  Ikuo Sawada ,  Tsunenobu Kimoto ,  Noriaki Kawamoto ,  Masatoshi Aketa

IPC分类号： C23C16/46 ,  C23C16/00

CPC分类号： C23C16/481 ,  C23C16/325 ,  C23C16/46 ,  C30B25/10 ,  C30B29/36 ,  H01L21/02378 ,  H01L21/02529 ,  H01L21/0262 ,  H01L21/67109 ,  H01L21/6719 ,  H01L21/67748 ,  H01L21/68764 ,  H01L21/68771 ,  H01L29/66068

摘要： A disclosed film deposition apparatus includes a process chamber inside which a reduced pressure space is maintained; a gas supplying portion that supplies a film deposition gas to the process chamber; a substrate holding portion that is made of a material including carbon as a primary constituent and holds a substrate in the process chamber; a coil that is arranged outside the process chamber and inductively heats the substrate holding portion; and a thermal insulation member that covers the substrate holding portion and is arranged to be separated from the process chamber, wherein the reduced pressure space is separated into a film deposition gas supplying space to which the film deposition gas is supplied and a thermal insulation space defined between the substrate holding portion and the process chamber, and wherein a cooling medium is supplied to the thermal insulation space.

摘要翻译： 所公开的膜沉积设备包括处理室，其内保持有减压空间; 气体供给部，其向所述处理室供给成膜气体; 基板保持部，其由以碳为主要成分的材料制成，并将基板保持在所述处理室中; 线圈，其布置在所述处理室的外部并感应加热所述基板保持部; 以及绝热构件，其覆盖所述基板保持部并被布置成与所述处理室分离，其中所述减压空间被分离成供给所述成膜气体的成膜气体供给空间和限定了所述隔热空间的成膜气体供给空间 在所述基板保持部和所述处理室之间，并且其中向所述绝热空间供给冷却介质。

公开(公告)号：US07553787B2

公开(公告)日：2009-06-30

申请号：US11612016

申请日：2006-12-18

申请人： Jun Yoshikawa ,  Yoshimasa Kobayashi ,  Naomi Teratani

发明人： Jun Yoshikawa ,  Yoshimasa Kobayashi ,  Naomi Teratani

IPC分类号： C04B35/581

CPC分类号： H01L21/6831 ,  C04B35/581 ,  C04B2235/3217 ,  C04B2235/3865 ,  C04B2235/723 ,  C04B2235/96

摘要： An aluminum nitride-based ceramic sintered body is provided, which is manufactured by sintering an aluminum nitride powder comprising aluminum nitride as a main component, carbon in an amount of 0.1 wt % or more to 1.0 wt % or less, and containing oxygen in an amount that is not greater than 0.7 wt %, wherein carbon and oxygen are dissolved in grains of the aluminum nitride powder. The a-axis length of the lattice constant of the aluminum nitride is in a range of 3.1120 Å or more to 3.1200 Å or less, and the a c-axis length of the lattice constant is in a range of 4.9810 Å or more to 4.9900 Å or less. The volume resistivity of the aluminum nitride-based ceramic sintered body at 500° C. is 109 Ω·cm or more.

摘要翻译： 提供了一种氮化铝系陶瓷烧结体，其通过以包含氮化铝为主要成分的氮化铝粉末以0.1重量％以上至1.0重量％以下的量烧结而形成， 量不大于0.7重量％，其中碳和氧溶解在氮化铝粉末的颗粒中。 氮化铝的晶格常数的a轴长度在3.1120以上至3.1200以下的范围内，晶格常数的c轴长度在4.98以上至4.9900以上的范围内 Å或更少。 在500℃下的氮化铝系陶瓷烧结体的体积电阻率为109Ω·cm以上。

公开(公告)号：US07250215B2

公开(公告)日：2007-07-31

申请号：US10876260

申请日：2004-06-24

申请人： Jun Yoshikawa ,  Naohito Yamada ,  Hiroya Sugimoto

发明人： Jun Yoshikawa ,  Naohito Yamada ,  Hiroya Sugimoto

IPC分类号： B32B9/00

CPC分类号： C04B35/645 ,  B82Y30/00 ,  C04B35/581 ,  C04B35/806 ,  C04B2235/3225 ,  C04B2235/3865 ,  C04B2235/5248 ,  C04B2235/526 ,  C04B2235/5264 ,  C04B2235/5288 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/656 ,  C04B2235/77 ,  C04B2235/96 ,  C04B2235/9607 ,  H05B3/141 ,  H05B3/145 ,  H05B2214/04 ,  Y10T428/30

摘要： An aluminum nitride sintered body containing carbon fibers is provided. This aluminum nitride sintered body is obtained by mixing carbon fibers and aluminum nitride together to form mixed powder, molding the mixed powder to form a compact, and heating and sintering the compact in any of a vacuum atmosphere, an inert atmosphere and a reductive atmosphere. By using electric conductivity and shapes with high aspect ratios of the carbon fibers, continuous electrically conductive paths are formed with a small content of the carbon fibers. In this way, a value of resistance of the aluminum nitride sintered body is reduced.

摘要翻译： 提供含有碳纤维的氮化铝烧结体。 该氮化铝烧结体通过将碳纤维和氮化铝混合在一起形成混合粉末，成型混合粉末以形成压块，并且在真空气氛，惰性气氛和还原气氛中进行加热和烧结。 通过使用碳纤维的高纵横比的电导率和形状，形成具有少量碳纤维的连续导电路径。 以这种方式，减小了氮化铝烧结体的电阻值。

公开(公告)号：US20060233058A1

公开(公告)日：2006-10-19

申请号：US11404915

申请日：2006-04-14

申请人： Jun Yoshikawa ,  Tomohisa Shiga ,  Keisuke Hisano

发明人： Jun Yoshikawa ,  Tomohisa Shiga ,  Keisuke Hisano

IPC分类号： H04B1/20

CPC分类号： H04N21/85406 ,  H04N5/765 ,  H04N5/775 ,  H04N5/781 ,  H04N7/22 ,  H04N21/2182 ,  H04N21/2318

摘要： Optical signal processing device that processes an optical signal based on predetermined data has a first terminal for inputting and outputting the optical signal, which is connected to a first channel of optical communication line, a second terminal for inputting and outputting the optical signal, which is connected to a second channel of optical communication line, and a switch portion for optical communication, which is connected to the first and second terminals. The switch portion chooses any one of the first and second channels of the optical communication lines without depending on any external fiber channel hub and any fiber channel switch.

公开(公告)号：US20060129730A1

公开(公告)日：2006-06-15

申请号：US11299597

申请日：2005-12-12

申请人： Shinichi Morishima ,  Shingo Nakagawa ,  Masakazu Murata ,  Jun Yoshikawa

发明人： Shinichi Morishima ,  Shingo Nakagawa ,  Masakazu Murata ,  Jun Yoshikawa

IPC分类号： G06F13/14

CPC分类号： G06F13/1605 ,  G06F3/0613 ,  G06F3/0659 ,  G06F3/0689

摘要： A data processing system able to raise the access efficiency to a memory when a plurality of processor access to the memory will be provided. An arbitration program executed by one input/output processing device determines a priority order for the access requests to the RAIDs so as to give the access permission with the highest priority to the access request linked with the reproduction port. The arbitration program notifies the result of the determination to the arbitrated programs executed by the other input/output processing devices.