公开(公告)号：US5085755A

公开(公告)日：1992-02-04

申请号：US450461

申请日：1989-12-14

申请人： Eiji Setoyama ,  Mitsuhiro Kamei ,  Yasunori Ohno

发明人： Eiji Setoyama ,  Mitsuhiro Kamei ,  Yasunori Ohno

IPC分类号： C23C14/36 ,  C23C14/34 ,  C23C14/35 ,  H01J37/34

CPC分类号： H01J37/3402 ,  C23C14/35

摘要： An apparatus for forming a thin film of a given material on one or more substrates comprises a vacuum vessel, a first electrode which is provided in the vacuum vessel for holding a target plate of the given material thereon, a second electrode which is provided opposite to the first electrode in the vacuum vessel to form a discharge space between the first and second electrodes and holds the substrate(s) thereon, a gas conduit for supplying a sputtering gas into the discharge space, power sources for applying a discharge voltage between the first and second electrodes to generate a discharge plasma of the sputtering gas, and a magnetic field generating device which is provided to surround the discharge space and generates a magnetic field effective to prevent the discharge plasma from diffusing to the outside of the discharge space.

摘要翻译： 用于在一个或多个基底上形成给定材料的薄膜的装置包括真空容器，设置在真空容器中用于保持给定材料的靶板的第一电极，与第一电极相对设置的第二电极 所述真空容器中的第一电极在所述第一和第二电极之间形成放电空间并保持其上的衬底，用于将溅射气体供应到放电空间中的气体导管，用于在第一和第二电极之间施加放电电压的电源 以及用于产生溅射气体的放电等离子体的第二电极，以及设置成围绕放电空间产生有效地防止放电等离子体扩散到放电空间外部的磁场的磁场产生装置。

公开(公告)号：US5116482A

公开(公告)日：1992-05-26

申请号：US587034

申请日：1990-09-24

申请人： Eiji Setoyama ,  Mitsuhiro Kamei

发明人： Eiji Setoyama ,  Mitsuhiro Kamei

IPC分类号： C23C14/40 ,  C23C14/34 ,  C23C14/54 ,  H01J37/32

CPC分类号： H01J37/32174 ,  C23C14/54 ,  H01J37/32082 ,  H01J37/32165 ,  H01J37/32935 ,  H01J37/3299 ,  H01J2237/332

摘要： A film forming system including an evacuating unit, a pair of opposed electrodes and an RF voltage supplying unit for suppling RF voltages to the respective electrodes to generate a discharge between the electrodes to form a film. The film forming system includes: a discharge variation detecting unit for detecting an amount of a variation in the discharge as a voltage from each of the electrodes; and a phase adjusting unit for detecting the difference in phase between the RF voltages supplied to the electrodes, and for adjusting the phase difference of the RF voltages supplied to the electrodes, according to the difference between the detected phase difference and a preset value.

摘要翻译： 一种成膜系统，包括排气单元，一对相对电极和RF电压供应单元，用于向各个电极提供RF电压以在电极之间产生放电以形成膜。 成膜系统包括：放电变化检测单元，用于检测作为每个电极的电压的放电变化量; 以及相位调整单元，用于根据所检测的相位差和预设值之间的差异，检测供给到电极的RF电压之间的相位差，并且用于调整提供给电极的RF电压的相位差。

公开(公告)号：US4865709A

公开(公告)日：1989-09-12

申请号：US207537

申请日：1988-06-16

申请人： Yukio Nakagawa ,  Ken-ichi Natsui ,  Youichi Ohshita ,  Tadashi Sato ,  Eiji Setoyama ,  Mitsuhiro Kamei

发明人： Yukio Nakagawa ,  Ken-ichi Natsui ,  Youichi Ohshita ,  Tadashi Sato ,  Eiji Setoyama ,  Mitsuhiro Kamei

IPC分类号： C23C14/35 ,  H01J37/34

CPC分类号： H01J37/3423 ,  C23C14/35 ,  H01J37/3408 ,  H01J37/347

摘要： A magnetron sputter apparatus according to the present invention is constructed so as to satisfy a predetermined optimum relationship between the size of the erosion area on the surface of the target and that of a film forming region. Further, the distance between the target and substrates has a value predetermined for the relationship between the size of the erosion area on the surface of the target and that of the film forming region. By using the magnetron sputter apparatus according to the present invention it is possible to form a homogeneous thin film excellent in step coverage and having a film thickness distribution in which variations are small over a large area.

摘要翻译： 根据本发明的磁控溅射装置被构造成满足目标表面上的侵蚀区域的大小与成膜区域的预定最佳关系。 此外，靶和基板之间的距离具有对于靶的表面上的侵蚀区域的尺寸与成膜区域的尺寸之间的关系预定的值。 通过使用根据本发明的磁控溅射装置，可以形成具有优异的台阶覆盖率并且具有在大面积上变化小的膜厚度分布的均匀薄膜。

公开(公告)号：US4986890A

公开(公告)日：1991-01-22

申请号：US513763

申请日：1990-04-24

申请人： Eiji Setoyama ,  Mitsuhiro Kamei

发明人： Eiji Setoyama ,  Mitsuhiro Kamei

IPC分类号： C23C14/34 ,  C23C14/50 ,  C23C14/56 ,  H01J37/34 ,  H01L21/203 ,  H01L21/285 ,  H01L21/31 ,  H01L21/677

CPC分类号： H01L21/68785 ,  C23C14/50 ,  H01J37/32706 ,  H01J37/34 ,  H01J37/3447 ,  H01J2237/0206

摘要： A thin film deposition system for depositing a thin film on a substrate by sputtering is characterized in that a substrate holder for holding thereon the substrate is transferred by a transfer mechanism from or to a film deposition position to or from another position such as another chamber different from the film deposition chamber, an electrode for applying bias voltage of radio frequency to the substrate or substrate holder is axially movable relatively to the substrate holder so that the electrode can be contacted with or discontact from the substrate holder, and a grounded shield is provided so as to cover the electrode and the substrate holder with a gap thereby shielding radio frequency from the electrode and the substrate holder to prevent formation of glow discharge between a wall of the vacuum chamber and the electrode or the substrate holder.

摘要翻译： 用于通过溅射在衬底上沉积薄膜的薄膜沉积系统的特征在于，用于保持其上的衬底的衬底保持器通过转移机构从或从膜沉积位置转移到另一个位置，例如另一个室 从成膜室，用于向衬底或衬底保持器施加射频偏压的电极可相对于衬底保持器轴向移动，使得电极可与衬底保持器接触或脱离，并且提供接地屏蔽 以便以间隙覆盖电极和衬底保持器，从而屏蔽来自电极和衬底保持器的射频，以防止在真空室的壁与电极或衬底保持器之间形成辉光放电。

公开(公告)号：US4911815A

公开(公告)日：1990-03-27

申请号：US281777

申请日：1988-12-09

申请人： Mitsuhiro Kamei ,  Eiji Setoyama ,  Shinzou Oikawa

发明人： Mitsuhiro Kamei ,  Eiji Setoyama ,  Shinzou Oikawa

IPC分类号： C23C14/36 ,  C23C14/34 ,  C23C14/35 ,  C23C14/50 ,  C23C14/56

CPC分类号： C23C14/351 ,  C23C14/50 ,  C23C14/56

摘要： A magnetic film deposition chamber having Helmholtz coils and a preliminary chamber are connected through a gate valve. Two magnetic plates are fixed to the magnetic film deposition chamber near the both ends thereof. Substrates overlying apertures of a substrate holder are moved by a conveyer together with the substrate holder. The conveyor moves from the preliminary chamber to the film deposition chamber through the gate valve. The substrates then positioned over and between the magnetic plates and are located above the target in the magnetic film deposition chamber.

摘要翻译： 具有亥姆霍兹线圈和初级室的磁性成膜室通过闸阀连接。 两个磁性板固定在磁性膜沉积室的两端附近。 覆盖衬底保持器的孔的衬底通过输送机与衬底保持器一起移动。 输送机通过闸阀从预备室移动到成膜室。 然后将基板放置在磁性板之间并位于磁性板之间并且位于磁性膜沉积室中的靶上方。

公开(公告)号：US5783055A

公开(公告)日：1998-07-21

申请号：US607431

申请日：1996-02-27

申请人： Mitsuhiro Kamei ,  Eiji Setoyama ,  Satoshi Umehara

发明人： Mitsuhiro Kamei ,  Eiji Setoyama ,  Satoshi Umehara

IPC分类号： C23C14/56 ,  H01L21/00

CPC分类号： H01L21/6719 ,  C23C14/568 ,  H01J37/32733 ,  H01J37/34 ,  H01L21/67213

摘要： A multi-chamber sputtering apparatus characterized in that a plurality of target electrodes and a substrate transfer mechanism which is able to transfer a substrate to positions facing the target electrodes and change distance between the target electrodes and the substrate.

摘要翻译： 一种多室溅射装置，其特征在于，多个目标电极和基板传送机构，其能够将基板传送到面向目标电极的位置，并改变目标电极和基板之间的距离。

公开(公告)号：US5429729A

公开(公告)日：1995-07-04

申请号：US616868

申请日：1990-11-21

申请人： Mitsuhiro Kamei ,  Eiji Setoyama

发明人： Mitsuhiro Kamei ,  Eiji Setoyama

IPC分类号： C23C14/34 ,  C23C14/56

CPC分类号： C23C14/3407 ,  C23C14/56

摘要： In accordance with the present invention, in order to exchange a target under a vacuum condition without communicating a film-forming chamber with the atmosphere for exchange of the target, a substrate is located in a vacuum vessel and an opening portion is provided on a wall surface of the vacuum vessel opposite to the substrate which is formed with a thin film on its surface. A target exchanging chamber is disposed adjacent to the vacuum vessel so as to be communicated therewith through the opening portion. During film-formation, the interior of the vacuum vessel is maintained in a vacuum state by closing the opening portion with the target while the target exchanging chamber is communicated with the atmosphere and a spare target is contained therein. When exchanging the target, the air in the target exchanging chamber is exhausted to maintain the chamber in a vacuum state and the target is replaced with the spare target.

摘要翻译： 根据本发明，为了在真空条件下更换靶，而不使成膜室与用于更换靶的气氛相通，则基板位于真空容器中，开口部分设置在壁上 表面与在其表面上形成有薄膜的基板相对的真空容器的表面。 目标交换室邻近真空容器设置，以便通过开口部与其连通。 在成膜期间，通过在目标交换室与大气连通并且备用目标物被容纳在其中的同时通过用目标物关闭开口部分将真空容器的内部保持在真空状态。 当更换目标时，目标交换室中的空气被排出以将室维持在真空状态，并且目标被替换为备用目标。

公开(公告)号：US5376777A

公开(公告)日：1994-12-27

申请号：US795732

申请日：1991-11-21

申请人： Mitsuhiro Kamei ,  Eiji Setoyama

发明人： Mitsuhiro Kamei ,  Eiji Setoyama

IPC分类号： C23C14/34 ,  C23C14/50 ,  C23C14/56 ,  C23C16/54 ,  G07C3/04 ,  G06F15/20 ,  G07B15/02

CPC分类号： G07C3/04

摘要： The number of times a substrate tray has been used and the amount of distortion of the substrate tray are measured. When the number of times of use or the distortion amount of the substrate tray exceed a predetermined value, respectively, the substrate tray is exchanged automatically.

摘要翻译： 测量基板托盘的使用次数和基板托盘的变形量。 当基板托盘的使用次数或变形量分别超过预定值时，基板托盘被自动更换。

公开(公告)号：US06224676B1

公开(公告)日：2001-05-01

申请号：US09451911

申请日：1999-12-01

申请人： Katsunori Nakajima ,  Hiroyuki Shida ,  Eiji Setoyama ,  Koji Ishiguro ,  Hikaru Saruta

发明人： Katsunori Nakajima ,  Hiroyuki Shida ,  Eiji Setoyama ,  Koji Ishiguro ,  Hikaru Saruta

IPC分类号： C23C1600

CPC分类号： C23C16/44 ,  C23C16/52 ,  H01L21/67017

摘要： According to the present invention, a signal transmission system is arranged in a region surrounded by a gas control means and a plurality of blocks whereby a region between elements constituting a gas supply flow path can be utilized for the region of the signal transmission system thereby to make the occupying space small and miniaturize the apparatus.

摘要翻译： 根据本发明，信号传输系统被布置在由气体控制装置和多个块包围的区域中，由此构成气体供应流路的元件之间的区域可以用于信号传输系统的区域，从而 使占用空间小，装置小型化。

公开(公告)号：US06084356A

公开(公告)日：2000-07-04

申请号：US84911

申请日：1998-05-28

申请人： Hirofumi Seki ,  Satoshi Ichimura ,  Satoshi Takemori ,  Eiji Setoyama ,  Kouji Ishiguro ,  Yasuhiro Mochizuki ,  Sensuke Okada ,  Hajime Murakami

发明人： Hirofumi Seki ,  Satoshi Ichimura ,  Satoshi Takemori ,  Eiji Setoyama ,  Kouji Ishiguro ,  Yasuhiro Mochizuki ,  Sensuke Okada ,  Hajime Murakami

IPC分类号： H05H1/46 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31

CPC分类号： H01J37/32229 ,  H01J37/32192 ,  H01J37/32266 ,  H01J37/32678

摘要： Dielectric bodies are arranged in waveguide portions for passing microwave radiation and for holding a plasma generating chamber 25 at a vacuum. The dielectric bodies are arranged to intersect at least an electron cyclotron resonance area of the waveguide portions. A tip end portion of the dielectric bodies at a side of the plasma generating chamber are positioned toward at a side of the plasma generating chamber from an intermediate portion in an axial direction length of a first permanent magnet which is arranged by enclosing an outer periphery of the waveguide portions, and a tip end portion of the dielectric bodies at a side of the plasma generating chamber is substantially consistent with an inner face of the plasma generating chamber.

摘要翻译： 电介质体布置在用于通过微波辐射的波导部分中并且用于将等离子体产生室25保持在真空下。 电介质体被布置成与波导部分的至少一个电子回旋共振区域相交。 等离子体发生室一侧的电介质体的前端部从第一永久磁铁的轴向方向长度的中间部朝向等离子体发生室侧， 波导部分和等离子体发生室侧面的电介质体的末端部分与等离子体发生室的内表面基本一致。