公开(公告)号：US10011491B2

公开(公告)日：2018-07-03

申请号：US14685553

申请日：2015-04-13

Applicant: Element Six Technologies Limited

Inventor： Chee-Leong Lee ,  Erdan Gu ,  Geoffrey Alan Scarsbrook ,  Ian Friel ,  Martin David Dawson

IPC: C23C16/27 ,  C01B31/06 ,  C30B25/10 ,  C30B25/20 ,  C30B29/04 ,  G01N27/30 ,  H01L21/02 ,  H01L21/04 ,  H01L29/04 ,  H01L29/16 ,  H01L29/167 ,  H01L29/36 ,  G01N21/87 ,  G01N21/95 ,  H01J37/32 ,  C01B32/28

CPC classification number: C01B32/28 ,  C23C16/27 ,  C23C16/274 ,  C23C16/278 ,  C30B25/105 ,  C30B25/20 ,  C30B29/04 ,  G01N21/87 ,  G01N21/95 ,  G01N27/308 ,  G01N2201/0636 ,  H01J37/321 ,  H01J2237/08 ,  H01J2237/3341 ,  H01L21/02104 ,  H01L21/02376 ,  H01L21/02527 ,  H01L21/02579 ,  H01L21/0262 ,  H01L21/02634 ,  H01L21/041 ,  H01L29/045 ,  H01L29/1602 ,  H01L29/167 ,  H01L29/36 ,  Y10T428/24355

Abstract: A polycrystalline CVD diamond material comprising a surface having a surface roughness Rq of less than 5 nm, wherein said surface is damage free to the extent that if an anisotropic thermal revealing etch is applied thereto, a number density of defects revealed by the anisotropic thermal revealing etch is less than 100 per mm2.