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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20120013879A1

    公开(公告)日：2012-01-19

    申请号：US13178965

    申请日：2011-07-08

    申请人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

    发明人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

    IPC分类号： G03B27/54 ,  G01B11/22

    CPC分类号： G01B11/0608 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7034 ,  G03F9/7088

    摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.

    摘要翻译： 本发明提供了一种水平传感器，其被配置为确定支撑在可移动衬底支撑件上的衬底的表面的高度水平，所述液位传感器包括多个投影单元，多个检测单元和处理单元，以计算每个 基于来自所述投影单元的测量光束的多个测量位置，其中所述液位传感器被配置为在所述基板上的多个测量位置处同时测量高度水平，其中所述基板支撑件被配置成基本上在第一方向上移动所述基板 平行于衬底的表面以测量衬底上不同位置处的高度水平，并且其中多个测量位置的至少一部分在基本上平行于衬底的表面并且垂直于衬底的第二方向上至少间隔开 第一个方向。

    Lithographic apparatus and device manufacturing method involving a level sensor having multiple projection units and detection units
    5.
    发明授权
    Lithographic apparatus and device manufacturing method involving a level sensor having multiple projection units and detection units 有权
    涉及具有多个投影单元和检测单元的液位传感器的平版印刷设备和设备制造方法

    公开(公告)号：US08488107B2

    公开(公告)日：2013-07-16

    申请号：US13178965

    申请日：2011-07-08

    申请人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

    发明人： Arie Jeffrey Den Boef ,  Frank Staals ,  Lukasz Jerzy Macht

    IPC分类号： G03B27/58

    CPC分类号： G01B11/0608 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7034 ,  G03F9/7088

    摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.

    摘要翻译： 本发明提供了一种水平传感器，其被配置为确定支撑在可移动衬底支撑件上的衬底的表面的高度水平，所述液位传感器包括多个投影单元，多个检测单元和处理单元，以计算每个 基于来自所述投影单元的测量光束的多个测量位置，其中所述液位传感器被配置为在所述基板上的多个测量位置处同时测量高度水平，其中所述基板支撑件被配置成基本上在第一方向上移动所述基板 平行于衬底的表面以测量衬底上不同位置处的高度水平，并且其中多个测量位置的至少一部分在基本上平行于衬底的表面并且垂直于衬底的第二方向上至少间隔开 第一个方向。

    Level sensor, lithographic apparatus, and substrate surface positioning method
    7.
    发明授权
    Level sensor, lithographic apparatus, and substrate surface positioning method 有权
    液位传感器，光刻设备和基板表面定位方法

    公开(公告)号：US08675210B2

    公开(公告)日：2014-03-18

    申请号：US13603168

    申请日：2012-09-04

    申请人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    发明人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    IPC分类号： G01B11/14

    CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

    摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD
    9.
    发明申请
    LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
    水平传感器，光刻设备和基板表面定位方法

    公开(公告)号：US20130077079A1

    公开(公告)日：2013-03-28

    申请号：US13603168

    申请日：2012-09-04

    申请人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    发明人： Arie Jeffrey DEN BOEF ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    IPC分类号： G03F9/00 ,  G01B11/06

    CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

    摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。