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公开(公告)号：US08822921B2
公开(公告)日：2014-09-02
申请号：US14144902
申请日：2013-12-31
Applicant: FEI Company
Inventor： Michael Schmidt , Jeffrey Blackwood , Stacey Stone , Sang Hoon Lee , Ronald Kelley
CPC classification number: G01N1/32 , G01N1/286 , G01N2001/2886 , H01J37/3056 , H01J2237/31745
Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。
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公开(公告)号：US11972923B2
公开(公告)日：2024-04-30
申请号：US17566904
申请日：2021-12-31
Applicant: FEI Company
Inventor： Christopher Thompson , Dustin Ellis , Adam Stokes , Ronald Kelley , Cedric Bouchet-Marquis
IPC: H01J37/305 , H01J37/20 , H01J37/244 , H01J37/28
CPC classification number: H01J37/3056 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/2007 , H01J2237/208 , H01J2237/31745 , H01J2237/31749
Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.
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公开(公告)号：US20140138350A1
公开(公告)日：2014-05-22
申请号：US14081947
申请日：2013-11-15
Applicant: FEI Company
Inventor： Ronald Kelley
IPC: B05D3/04
CPC classification number: H01J37/3053 , B05D3/044 , C23C14/30 , G01N1/286 , G01N1/32 , G01N2001/2886 , H01J37/265 , H01J37/3056 , H01J2237/31745 , H01J2237/3348 , H01L21/02318
Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。
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Patent Agency Ranking
公开(公告)号：US20150179402A1
公开(公告)日：2015-06-25
申请号：US14572626
申请日：2014-12-16
Applicant: FEI Company
Inventor： Ronald Kelley , Michael Moriarty , Stacey Stone , Jeffrey Blackwood
IPC: H01J37/305 , C23C14/30
CPC classification number: H01J37/3053 , B05D3/044 , C23C14/30 , G01N1/286 , G01N1/32 , G01N2001/2886 , H01J37/265 , H01J37/3056 , H01J2237/31745 , H01J2237/3348 , H01L21/02318
Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。
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公开(公告)号：US20140190934A1
公开(公告)日：2014-07-10
申请号：US14144902
申请日：2013-12-31
Applicant: FEI Company
Inventor： Michael Schmidt , Jeffrey Blackwood , Stacey Stone , Sang Hoon Lee , Ronald Kelley
IPC: G01N1/32
CPC classification number: G01N1/32 , G01N1/286 , G01N2001/2886 , H01J37/3056 , H01J2237/31745
Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
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公开(公告)号：US20150330877A1
公开(公告)日：2015-11-19
申请号：US14758150
申请日：2013-12-30
Applicant: FEI COMPANY
Inventor： Michael Schmidt , Jeffrey Blackwood , Stacey Stone , Sang Hoon Lee , Ronald Kelley , Trevan Landin
IPC: G01N1/32 , H01L21/3065
CPC classification number: G01N1/32 , G01N1/28 , H01L21/30655
Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 离子束研磨机使用大量研磨工艺暴露工件的横截面。 沉积前体气体被引导到样品表面，同时少量的材料从暴露的横截面去除，沉积前体产生更均匀的横截面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。
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公开(公告)号：US09111720B2
公开(公告)日：2015-08-18
申请号：US14572626
申请日：2014-12-16
Applicant: FEI Company
Inventor： Ronald Kelley , Michael Moriarty , Stacey Stone , Jeffrey Blackwood
IPC: G01N23/00 , H01J37/305 , C23C14/30
CPC classification number: H01J37/3053 , B05D3/044 , C23C14/30 , G01N1/286 , G01N1/32 , G01N2001/2886 , H01J37/265 , H01J37/3056 , H01J2237/31745 , H01J2237/3348 , H01L21/02318
Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。
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公开(公告)号：US08912490B2
公开(公告)日：2014-12-16
申请号：US14081947
申请日：2013-11-15
Applicant: FEI Company
Inventor： Ronald Kelley , Michael Moriarty , Stacey Stone , Jeffrey Blackwood
IPC: G01N23/00 , B05D3/04 , H01J37/305 , H01L21/02 , G01N1/28
CPC classification number: H01J37/3053 , B05D3/044 , C23C14/30 , G01N1/286 , G01N1/32 , G01N2001/2886 , H01J37/265 , H01J37/3056 , H01J2237/31745 , H01J2237/3348 , H01L21/02318
Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
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