公开(公告)号：US09767984B2

公开(公告)日：2017-09-19

申请号：US14502099

申请日：2014-09-30

Applicant: FEI Company

Inventor： Kevin Kagarice ,  Charles Otis ,  N. William Parker

IPC: H01J37/05 ,  H01J37/04

CPC classification number: H01J37/045 ,  H01J37/05 ,  H01J2237/004 ,  H01J2237/028 ,  H01J2237/057 ,  H01J2237/15 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01J2237/32

Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.

公开(公告)号：US20160093470A1

公开(公告)日：2016-03-31

申请号：US14502099

申请日：2014-09-30

Applicant: FEI Company

Inventor： Kevin Kagarice ,  Charles Otis ,  N. William Parker

IPC: H01J37/32

CPC classification number: H01J37/045 ,  H01J37/05 ,  H01J2237/004 ,  H01J2237/028 ,  H01J2237/057 ,  H01J2237/15 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01J2237/32

Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.

Abstract translation: 一种用于带电粒子束系统的通道消除器组件包括入口和出口，至少一个中性阻挡结构，多个拐角偏转器，光束消隐偏转器和光束阻挡结构。 入口构造成接受沿着轴传播的带电粒子束。 至少一个中性阻挡结构与轴相交。 多个拐角偏转器包括顺序地布置在入口和出口之间并被配置为沿着旁路中性阻塞的路径偏转光束的第一拐角拐弯器，第二拐角偏转器，第三拐角偏转器和第四通道偏转器 结构，并通过出口离开通道阻塞组件。 在实施例中，拐弯夹板组件包括两个中性阻挡结构。 在实施例中，梁阻挡结构布置在第三拐角偏转器和第四通道偏转器之间。

公开(公告)号：US11887805B2

公开(公告)日：2024-01-30

申请号：US17491039

申请日：2021-09-30

Applicant: FEI Company

Inventor： John Stiller ,  Aaron Torok ,  Kevin Kagarice

IPC: H01J37/075 ,  H01J37/21 ,  H01J37/073

CPC classification number: H01J37/075 ,  H01J37/21 ,  H01J2237/06316

Abstract: Electron sources can include an electron source crystal coupled in series between opposing electrically conductive supports to form an electrically conductive path, wherein the electrical resistance of each of the electrically conductive supports is lower than the electrical resistance of the electron source crystal. Electron source crystals can include an emitting end and opposing shank end, wherein the shank end includes opposing leg portions. Electrically conductive supports can include foil supports spaced apart across a gap, wherein each of the opposing leg portions is attached to a respective foil support such that the foil supports are electrically connected to form the electrically conductive path. Particle focusing system are also disclosed. Electron sources can include an electron source crystal having an emitting end and opposing shank end, wherein the shank end is formed of a pair of opposing leg portions. Methods of manufacturing and operating electron sources are also disclosed.

公开(公告)号：US20230101787A1

公开(公告)日：2023-03-30

申请号：US17491039

申请日：2021-09-30

Applicant: FEI Company

Inventor： John Stiller ,  Aaron Torok ,  Kevin Kagarice

IPC: H01J37/075 ,  H01J37/21

Abstract: Electron sources can include an electron source crystal coupled in series between opposing electrically conductive supports to form an electrically conductive path, wherein the electrical resistance of each of the electrically conductive supports is lower than the electrical resistance of the electron source crystal. Electron source crystals can include an emitting end and opposing shank end, wherein the shank end includes opposing leg portions. Electrically conductive supports can include foil supports spaced apart across a gap, wherein each of the opposing leg portions is attached to a respective foil support such that the foil supports are electrically connected to form the electrically conductive path. Particle focusing system are also disclosed. Electron sources can include an electron source crystal having an emitting end and opposing shank end, wherein the shank end is formed of a pair of opposing leg portions. Methods of manufacturing and operating electron sources are also disclosed.