公开(公告)号：US20210356862A1

公开(公告)日：2021-11-18

申请号：US17307091

申请日：2021-05-04

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Minoru UEMURA ,  Akihiro KANEKO ,  Akiyoshi GOTO ,  Kei YAMAMOTO

IPC: G03F7/004 ,  C07C381/12 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07D333/46 ,  C07D327/06 ,  C07C25/18

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin. M1+A−-L-B−M2+  (I)

公开(公告)号：US20160280999A1

公开(公告)日：2016-09-29

申请号：US15172282

申请日：2016-06-03

Applicant: FUJIFILM Corporation

Inventor： Shinichi MORISHIMA ,  Nobutaka IWAHASHI ,  Masashi OGIYAMA ,  Minoru UEMURA

IPC: C09K19/60 ,  G02F1/1335 ,  G02B5/30

CPC classification number: C09K19/601 ,  B05D3/0218 ,  B05D3/062 ,  C09B29/081 ,  C09B29/083 ,  C09B31/043 ,  C09B31/18 ,  C09B31/30 ,  C09B33/22 ,  C09B56/02 ,  C09B56/06 ,  G02B1/10 ,  G02B5/30 ,  G02B5/3016 ,  G02F1/133528 ,  G02F1/133788

Abstract: Provided is a polarizing film showing high dichroism comprising a substrate, and a photo alignment film and a light absorption anisotropic film laminated on the substrate in this order. The light absorption anisotropic film is obtained by fixing the alignment of a dichroic dye composition comprising at least one nematic liquid crystalline azo dichroic dye and in X-ray diffraction measurement thereof, diffraction peaks derived from periodic structure along a vertical direction to the alignment axis are present, the period indicated by at least one of the diffraction peaks is 3.0 to 15.0 Å and an intensity of the diffraction peak does not show a maximum value in the range of ±70° of the film normal line direction in a plane vertical to the alignment axis.

Abstract translation: 本发明提供了一种偏光膜，其具有高的二色性，其包含基板，以及依次层叠在基板上的光取向膜和光吸收性各向异性膜。 光吸收各向异性膜是通过固定包含至少一种向列型液晶偶氮二色性染料的二色性染料组合物的取向而获得的，并且在其X射线衍射测量中，沿着垂直方向衍生自周期性结构的衍射峰与取向轴是 存在时，由至少一个衍射峰表示的周期为3.0〜15.0，并且在垂直于垂直于该方向的平面的膜法线方向的±70°的范围内，衍射峰的强度不显示最大值 对齐轴。

公开(公告)号：US20240402601A1

公开(公告)日：2024-12-05

申请号：US18798237

申请日：2024-08-08

Applicant: FUJIFILM Corporation

Inventor： Minoru UEMURA ,  Masafumi Kojima ,  Akiyoshi Goto ,  Nishiki Fujimaki ,  Nobuhiro Hiura ,  Kazuhiro Marumo ,  Takahiro Mori ,  Michihiro Shirakawa

IPC: G03F7/004 ,  C07C311/51 ,  C07C381/12 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  G03F7/038 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (Q) represented by a formula (I-1) below and a resin having a polarity that increases through decomposition by an action of an acid, wherein, in the formula (I-1), R1 represents a hydrocarbon group having at least one or more fluorine atoms, R2 represents an aromatic group, Y represents —SO2— or —CO—, and X+ represents a counter cation.

公开(公告)号：US20140192286A1

公开(公告)日：2014-07-10

申请号：US14204822

申请日：2014-03-11

Applicant: FUJIFILM CORPORATION

Inventor： Tomoki TASAKA ,  Yasuhiro ISHIWATA ,  Minoru UEMURA ,  Takao TAGUCHI ,  Masao NAKAJIMA ,  Shunya KATOH

IPC: C09K19/56 ,  B60J3/04

CPC classification number: C09K19/56 ,  B32B17/10036 ,  B32B17/10293 ,  B32B17/10504 ,  B32B17/10761 ,  B60J3/04 ,  C09K19/2007 ,  C09K2019/0448 ,  C09K2019/2078 ,  G02B5/208 ,  G02F2201/343 ,  B32B17/10 ,  B32B2367/00

Abstract: A cholesteric liquid-crystal mixture containing a compound represented by the general formula (Ia), a compound represented by the general formula (Ib), a fluorine-containing horizontal alignment agent and a polymerization initiator is capable of forming a film which is prevented from precipitation of liquid-crystal compounds therein, of which the haze is reduced and which has a broad reflection width. Z1—Y1-A1-Y3-M1-Y4-A2-Y2—Z2  General Formula (Ia) Z3—Y5-A3-Y7-M2-P  General Formula (Ib)

Abstract translation: 含有由通式（Ia）表示的化合物，通式（Ib）表示的化合物，含氟水平取向剂和聚合引发剂的胆固醇型液晶混合物能够形成防止 其中液晶化合物沉淀，其中雾度降低并且具有宽的反射宽度。 Z1-Y1-A1-Y3-M1-Y4-A2-Y2-Z2通式（Ia）Z3-Y5-A3-Y7-M2-P通式（Ib）

公开(公告)号：US20140138580A1

公开(公告)日：2014-05-22

申请号：US14163901

申请日：2014-01-24

Applicant: FUJIFILM Corporation

Inventor： Masatoshi MIZUMURA ,  Shunya KATOH ,  Minoru UEMURA ,  Yasuhiro ISHIWATA ,  Masaru YOSHIKAWA ,  Hiroshi MATSUYAMA

IPC: C09K19/54

CPC classification number: C09K19/54 ,  C07C69/92 ,  C09K19/2007 ,  C09K19/322 ,  C09K19/3475 ,  C09K19/588 ,  C09K2019/0429 ,  C09K2019/044 ,  C09K2019/2078

Abstract: A compound represented by the following formula (1) has sufficient solubility, a wide usable concentration range, and excellent haze-lowering performance. In the formula, L1 to L6 represent a single bond, —O—, —CO—, —COO—, etc; Sp1 to Sp4 represent a single bond or alkylene of 1 to 10 carbon atoms; A1 and A2 represent trivalent or tetravalent aromatic hydrocarbon or heterocyclic; T represents the following formulae, etc; Hb represent perfluoroalkyl of 2 to 30 carbon atoms; m and n are 2 or 3; and o and p are an integer of 0 or more.

Abstract translation: 由下式（1）表示的化合物具有足够的溶解性，宽的可用浓度范围和优异的雾度降低性能。 在该式中，L 1至L 6表示单键，-O - ， - CO - ， - COO-等; Sp1至Sp4表示单键或1至10个碳原子的亚烷基; A1和A2表示三价或四价芳烃或杂环; T表示以下公式等; Hb表示2〜30个碳原子的全氟烷基; m和n为2或3; o和p为0以上的整数。

公开(公告)号：US20240201589A1

公开(公告)日：2024-06-20

申请号：US18418331

申请日：2024-01-21

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Minoru UEMURA ,  Tomotaka TSUCHIMURA

IPC: G03F7/004 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C311/09 ,  C07C381/12 ,  C07D295/26 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C311/09 ,  C07C381/12 ,  C07D295/26 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing a compound (I) that generates an acid upon irradiation with actinic rays or radiation, the compound (I) having at least two acid anionic groups and cationic groups equal in number to the acid anionic groups. At least one of the acid anionic groups and at least one of the cationic groups are linked via covalent bonding, and at least two acid groups generated from the compound (I) upon irradiation with the actinic rays or radiation include at least two acid groups having different acid dissociation constants (pKa).

公开(公告)号：US20240192592A1

公开(公告)日：2024-06-13

申请号：US18421949

申请日：2024-01-24

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Minoru UEMURA ,  Tomotaka TSUCHIMURA

IPC: G03F7/004 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C309/12 ,  C07C309/17 ,  C07C311/09 ,  C07C381/12 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C43/225 ,  C07C309/07 ,  C07C309/11 ,  C07C309/12 ,  C07C309/17 ,  C07C311/09 ,  C07C381/12 ,  C07D327/06 ,  G03F7/038 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (I) that generates an acid upon irradiation with actinic rays or radiation and has an ionic structure and a zwitterionic structure. A pattern forming method contains forming an actinic ray-sensitive or radiation-sensitive film on a substrate using the actinic ray-sensitive or radiation-sensitive resin composition, exposing the actinic ray-sensitive or radiation-sensitive film to light; and developing the exposed actinic ray-sensitive or radiation-sensitive film with a developer.

公开(公告)号：US20210286263A1

公开(公告)日：2021-09-16

申请号：US17320364

申请日：2021-05-14

Applicant: FUJIFILM Corporation

Inventor： Naohiro TANGO ,  Masafumi KOJIMA ,  Minoru UEMURA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin A having polarity that increases by an action of an acid; one or more resins B selected from the group consisting of a resin B1 including a fluorine atom and having polarity that increases by the action of an acid, a resin B2 including a fluorine atom and having polarity that increases by the action of an alkali, and a resin B3 including a fluorine atom and having polarity that increases by any of an action of an acid and an action of an alkali; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III), provided that the resin B1 to the resin B3 include no repeating unit including an ion-bonding group.

公开(公告)号：US20140183410A1

公开(公告)日：2014-07-03

申请号：US14201060

申请日：2014-03-07

Applicant: FUJIFILM Corporation

Inventor： Minoru UEMURA ,  Yasuhiro ISHIWATA ,  Masaru YOSHIKAWA ,  Takao TAGUCHI ,  Tomoki TASAKA

IPC: C09K19/38 ,  C09K19/50

CPC classification number: G02B1/14 ,  C09K19/3838 ,  C09K19/50 ,  C09K2019/0448 ,  C09K2019/2078 ,  C09K2219/03 ,  G02B1/10 ,  G02B1/105 ,  G02B1/11 ,  G02B5/208 ,  G02B5/3016 ,  G02B5/3083 ,  G03H2001/0264

Abstract: A polymerizable liquid-crystal compound of formula (I) effective for preventing crystal deposition after coating with polymerizable liquid crystal (II) or a polymerizable liquid crystal similar thereto. P represents a polymerizable functional group; Sp represents a spacer or a single bond; Z1 and Z2 each represent —CO—O—; R0 represents a linear alkyl group having 1-15 carbon atoms; R2, R3 and R4 each independently represent an alkyl group having 1-4 carbon atoms, an alkoxy group having 1-4 carbon atoms, an alkoxycarbonyl group having 2-5 carbon atoms, an acyloxy group having 2-5 carbon atoms, an acyl group having 2-4 carbon atoms, an amide group having 2-5 carbon atoms, a cyano group, an amino group, a hydroxyl group, or a halogen atom; r1, r2 and r3 indicate an integer from 0-4; when r1, r2 and r3 each are 2 or more, then R2, R3 and R4 each may be the same or different; however, when R0 is a methyl group, then r2 is not 1.

Abstract translation: 一种可有效防止涂覆聚合液晶（II）或类似于其的可聚合液晶之后的结晶沉积的式（I）的可聚合液晶化合物。 P表示可聚合官能团; Sp表示间隔基或单键; Z1和Z2各自表示-CO-O-; R 0表示具有1-15个碳原子的直链烷基; R2，R3和R4各自独立地表示具有1-4个碳原子的烷基，具有1-4个碳原子的烷氧基，具有2-5个碳原子的烷氧基羰基，具有2-5个碳原子的酰氧基，酰基 具有2-4个碳原子的基团，具有2-5个碳原子的酰胺基，氰基，氨基，羟基或卤素原子; r1，r2和r3表示0-4的整数; 当r1，r2和r3各自为2或更大时，则R2，R3和R4各自可以相同或不同; 然而，当R 0是甲基时，则r 2不为1。

公开(公告)号：US20240329524A1

公开(公告)日：2024-10-03

申请号：US18737794

申请日：2024-06-07

Applicant: FUJIFILM Corporation

Inventor： Aina SHIBUYA ,  Minoru UEMURA ,  Akihiro KANEKO ,  Masafumi KOJIMA ,  Akiyoshi GOTO

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: a compound (N) having an anion and a cation represented by a formula (N1) below, and a resin (A) that is decomposed by an action of an acid to provide increased polarity,




wherein, in the formula (N1), RN1, RN2, and RN3 each independently represent a specified group, k1 to k6 each independently represents a specified integer, a plurality of RN1's may be the same or different, RN4, RN5, and RN6 each independently represent a specified substituent, and at least two among the aromatic rings in the formula (N1) may be bonded together via a single bond or a linking group.