公开(公告)号：US09285679B2

公开(公告)日：2016-03-15

申请号：US14497560

申请日：2014-09-26

申请人： FUJIFILM CORPORATION

发明人： Tomotaka Tsuchimura ,  Takuya Tsuruta ,  Takeshi Inasaki ,  Koutarou Takahashi

IPC分类号： G03F7/039 ,  G03F7/028 ,  G03F7/027 ,  C08F12/24 ,  G03F7/004 ,  G03F7/038 ,  G03F1/00 ,  G03F1/20 ,  G03F1/22 ,  G03F7/20 ,  C08F12/22 ,  C08F12/26 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C09D125/18

CPC分类号： G03F7/027 ,  C08F12/22 ,  C08F12/24 ,  C08F12/26 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C09D125/18 ,  G03F1/00 ,  G03F1/20 ,  G03F1/22 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2037 ,  G03F7/2039 ,  C08F212/32 ,  C08F212/08

摘要： There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Å3 or more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.

摘要翻译： 提供了一种光化射线敏感或辐射敏感性组合物，其包含（α）由式（αI）表示的化合物，其能够产生体积为200或更大的酸的量（＆bgr） 在用光化射线或辐射照射时产生酸，并且式（αI）如本文所定义，并且使用光化射线敏感或辐射敏感组合物形成的抗蚀剂膜，涂覆有抗蚀剂的抗蚀剂涂覆的掩模毛坯 膜，抗蚀剂图案形成方法，包括曝光抗蚀剂膜和显影曝光的膜，通过曝光和显影抗蚀剂涂覆的掩模毛坯获得的光掩模，电子器件的制造方法，包括抗蚀剂图案形成方法和电子器件 通过电子设备的制造方法制造。

公开(公告)号：US10545405B2

公开(公告)日：2020-01-28

申请号：US15685499

申请日：2017-08-24

申请人： FUJIFILM Corporation

发明人： Shuhei Yamaguchi ,  Koutarou Takahashi ,  Toshiaki Fukuhara ,  Shuji Hirano

IPC分类号： G03F7/038 ,  G03F7/30 ,  G03F1/50 ,  G03F7/16 ,  G03F7/20

摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

公开(公告)号：US09316908B2

公开(公告)日：2016-04-19

申请号：US14472831

申请日：2014-08-29

申请人： FUJIFILM Corporation

发明人： Koutarou Takahashi

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/038 ,  G03F7/004 ,  G03F7/30 ,  G03F7/11

CPC分类号： G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30

摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises at least either any of repeating units (I) of general formula (I) below or any of repeating units (II) of general formula (II) below, (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater.

摘要翻译： 本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含（A）当被酸作用时分解，从而提高其碱溶性的树脂，该树脂至少包含任何重复单元（I） 下列通式（I）或以下通式（II）的重复单元（II）中的任何一种：（B）鎓盐酸发生剂，当暴露于光化射线或辐射时，产生体积范围为250〜3 小于350Å3，和（C）鎓盐酸发生剂，当暴露于光化射线或辐射时，产生体积为400或更大的磺酸。

公开(公告)号：US10526266B2

公开(公告)日：2020-01-07

申请号：US15176762

申请日：2016-06-08

申请人： FUJIFILM Corporation

发明人： Natsumi Yokokawa ,  Hidehiro Mochizuki ,  Koutarou Takahashi ,  Shuhei Yamaguchi

IPC分类号： G03F1/50 ,  G03F1/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32 ,  G03F7/20 ,  C07C41/09 ,  C07C41/22 ,  C07C41/14 ,  C07C43/178 ,  C07D239/10

摘要： The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.

公开(公告)号：US10139727B2

公开(公告)日：2018-11-27

申请号：US14540454

申请日：2014-11-13

申请人： FUJIFILM CORPORATION

发明人： Tomotaka Tsuchimura ,  Koutarou Takahashi

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/004 ,  G03F7/32 ,  G03F7/30 ,  G03F7/20 ,  G03F1/20 ,  G03F1/22 ,  G03F1/00 ,  G03F1/50 ,  G03F1/56 ,  C08F212/14

摘要： A chemical amplification resist composition according to the present invention includes (A) a compound including a triarylsulfonium cation having one or more fluorine atoms and capable of generating an acid with a volume of 240 Å3 or higher by irradiation of active rays or radiation; and (B) a compound including a phenolic hydroxyl group.

公开(公告)号：US10324374B2

公开(公告)日：2019-06-18

申请号：US15080714

申请日：2016-03-25

申请人： FUJIFILM Corporation

发明人： Shuhei Yamaguchi ,  Tomotaka Tsuchimura ,  Natsumi Yokokawa ,  Koutarou Takahashi

IPC分类号： G03F7/038 ,  C07C233/36 ,  C07C271/16 ,  C07C271/24 ,  C07C271/34 ,  C07C275/10 ,  C07C275/24 ,  C07C275/26 ,  C07C323/60 ,  C07D211/26 ,  C07D233/32 ,  C07D233/36 ,  C07D235/26 ,  C07D239/10 ,  C07D251/30 ,  C07D403/12 ,  C07D487/04

摘要： There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).

公开(公告)号：US09904168B2

公开(公告)日：2018-02-27

申请号：US15205250

申请日：2016-07-08

申请人： FUJIFILM Corporation

发明人： Natsumi Yokokawa ,  Shuhei Yamaguchi ,  Koutarou Takahashi

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/20 ,  H01L21/027 ,  C08F220/20 ,  C08F220/28 ,  G03F7/00 ,  C08F220/30 ,  C08F12/24 ,  C08F12/30 ,  C08F112/14 ,  C09D125/18 ,  C08F116/10 ,  C08F214/18 ,  C08F216/10 ,  C08F220/16 ,  C08F224/00 ,  G03F7/32 ,  G03F7/039 ,  C08F12/18 ,  C08F12/20

CPC分类号： G03F7/038 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  C08F12/18 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F112/14 ,  C08F116/10 ,  C08F214/186 ,  C08F216/10 ,  C08F220/16 ,  C08F220/20 ,  C08F220/28 ,  C08F220/30 ,  C08F224/00 ,  C09D125/18 ,  G03F7/0015 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2059 ,  G03F7/2065 ,  G03F7/322 ,  G03F7/325 ,  H01L21/0274 ,  C08F212/14 ,  C08F212/32 ,  C08F212/34

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a resin (A) containing a repeating unit represented by General Formula (4) and a crosslinking agent (C) containing a polar group, in which the crosslinking agent (C) is a compound represented by General Formula (1) or a compound in which two to five structures represented by General Formula (1) are connected via a linking group or a single bond represented by L1 in General Formula (3).

公开(公告)号：US10120281B2

公开(公告)日：2018-11-06

申请号：US15176345

申请日：2016-06-08

申请人： FUJIFILM Corporation

发明人： Koutarou Takahashi ,  Tomotaka Tsuchimura ,  Shuhei Yamaguchi ,  Natsumi Yokokawa ,  Hidehiro Mochizuki

IPC分类号： G03F7/20 ,  G03F7/24 ,  G03F7/038 ,  G03F7/32 ,  G03F1/24 ,  G03F1/50 ,  G03F1/78

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

公开(公告)号：US10011576B2

公开(公告)日：2018-07-03

申请号：US15176810

申请日：2016-06-08

申请人： FUJIFILM Corporation

发明人： Shuhei Yamaguchi ,  Koutarou Takahashi ,  Tomotaka Tsuchimura ,  Natsumi Yokokawa ,  Hidehiro Mochizuki

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  C07D307/33 ,  C08F12/24 ,  C08F112/14 ,  C08F212/32 ,  G03F7/038 ,  C08F212/14 ,  C09D125/18 ,  G03F1/50 ,  C08F12/22

CPC分类号： C07D307/33 ,  C08F12/22 ,  C08F12/24 ,  C08F112/14 ,  C08F212/14 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/322 ,  C08F212/32 ,  C08F212/08

摘要： The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.