公开(公告)号：US20060081792A1

公开(公告)日：2006-04-20

申请号：US11294559

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060081791A1

公开(公告)日：2006-04-20

申请号：US11294475

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060081790A1

公开(公告)日：2006-04-20

申请号：US11294473

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

公开(公告)号：US20050189502A1

公开(公告)日：2005-09-01

申请号：US10665404

申请日：2003-09-22

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

公开(公告)号：US20070176128A1

公开(公告)日：2007-08-02

申请号：US11643772

申请日：2006-12-22

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060091330A1

公开(公告)日：2006-05-04

申请号：US11294476

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Koren ,  Hoite Pieter Tolsma ,  Hubertus Johannes Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Koren ,  Hoite Pieter Tolsma ,  Hubertus Johannes Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060086910A1

公开(公告)日：2006-04-27

申请号：US11294367

申请日：2005-12-06

申请人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20050146699A1

公开(公告)日：2005-07-07

申请号：US11068895

申请日：2005-03-02

申请人： Leon Levasier ,  Arie Den Boef ,  Ingo Dirnstorfer ,  Andre Jeunink ,  Stefan Kruijswijk ,  Henricus Pellemans ,  Irwan Setija ,  Hoite Tolsma

发明人： Leon Levasier ,  Arie Den Boef ,  Ingo Dirnstorfer ,  Andre Jeunink ,  Stefan Kruijswijk ,  Henricus Pellemans ,  Irwan Setija ,  Hoite Tolsma

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.

摘要翻译： 根据本发明的一个实施例的光刻设备包括对准子系统，该对准子系统被配置为相对于图案化结构对准衬底台上的衬底。 对准结构包括非周期性特征，其可以被检测为例如。 在对准子系统中使用参考光栅的捕获位置或检查位置。 非周期性特征可能导致对准子系统的检测信号中的相位效应或幅度效应。

公开(公告)号：US06788383B1

公开(公告)日：2004-09-07

申请号：US10624893

申请日：2003-07-23

申请人： Andre Jeunink ,  Frank Commissaris ,  Vera Lemmen

发明人： Andre Jeunink ,  Frank Commissaris ,  Vera Lemmen

IPC分类号： G03B2742

CPC分类号： G03F7/70258 ,  G03F7/70891

摘要： The change in a property of a lithographic apparatus, in a preferred embodiment the change in magnification of the projection system due to lens heating effects, is predicted and when the change since the last time an alignment process was performed is greater than a threshold, an additional alignment process is carried out. A realignment is triggered when the predictive correction, and hence the error in it, becomes larger than a desired maximum. This avoids unnecessary realignments but ensures that an alignment does occur when likely errors are out of permitted ranges.

摘要翻译： 在优选实施例中，预测了光刻设备的属性变化，由于透镜加热效应引起的投影系统的放大倍率的变化，并且当自上次执行对准处理以来的变化大于阈值时， 进行附加对准处理。 当预测校正因此其误差变得大于期望的最大值时，触发重新对准。 这避免了不必要的重新对齐，但是确保当可能的错误超出允许范围时确定对齐。

公开(公告)号：US07084952B2

公开(公告)日：2006-08-01

申请号：US10712264

申请日：2003-11-14

申请人： Andre Jeunink ,  Frank Commissaris ,  Vera Lemmen ,  M'Hamed Akhssay

发明人： Andre Jeunink ,  Frank Commissaris ,  Vera Lemmen ,  M'Hamed Akhssay

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70891 ,  G03F7/70258

摘要： The change in a property of a lithographic apparatus (e.g. the change in magnification of the projection system due to lens heating effects) is predicted, and when the change since the last time an alignment task was performed is greater than a threshold, an additional alignment task is carried out. A realignment is triggered when the predictive correction, and hence the error in it, becomes larger than a desired maximum. This avoids unnecessary realignments but ensures that an alignment does occur when likely errors are out of permitted ranges.

摘要翻译： 预测光刻设备的特性变化（例如，由于透镜加热效应引起的投影系统的放大倍数的变化），并且当上次执行对准任务时的变化大于阈值时，附加的对准 执行任务 当预测校正因此其误差变得大于期望的最大值时，触发重新对准。 这避免了不必要的重新对齐，但是确保当可能的错误超出允许范围时确定对齐。