公开(公告)号：US20050189502A1

公开(公告)日：2005-09-01

申请号：US10665404

申请日：2003-09-22

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

公开(公告)号：US20060081792A1

公开(公告)日：2006-04-20

申请号：US11294559

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060091330A1

公开(公告)日：2006-05-04

申请号：US11294476

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Koren ,  Hoite Pieter Tolsma ,  Hubertus Johannes Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Johannes Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Koren ,  Hoite Pieter Tolsma ,  Hubertus Johannes Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060081791A1

公开(公告)日：2006-04-20

申请号：US11294475

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060081790A1

公开(公告)日：2006-04-20

申请号：US11294473

申请日：2005-12-06

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Navarro Y Koren ,  Hoite Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

摘要翻译： 用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。 位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。 光刻设备具有上述对准系统。 使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

公开(公告)号：US20070176128A1

公开(公告)日：2007-08-02

申请号：US11643772

申请日：2006-12-22

申请人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US20060086910A1

公开(公告)日：2006-04-27

申请号：US11294367

申请日：2005-12-06

申请人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

发明人： Franciscus Maria Van Bilsen ,  Jacobus Burghoorn ,  Richard Franciscus Van Haren ,  Paul Hinnen ,  Hermanus Van Horssen ,  Jeroen Huijbregtse ,  Andre Jeunink ,  Henry Megens ,  Ramon Y. Koren ,  Hoite Theodoor Tolsma ,  Hubertus Gertrudus Simons ,  Johny Schuurhuis ,  Sicco Schets ,  Brian Bok Lee ,  Allan Dunbar

IPC分类号： G01N21/86

CPC分类号： G03F9/7084 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：US09155517B2

公开(公告)日：2015-10-13

申请号：US12669015

申请日：2008-07-01

申请人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

发明人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

IPC分类号： A61B8/14 ,  A61B8/00 ,  G01H9/00 ,  G01S7/52 ,  G01S15/89 ,  A61B5/00

CPC分类号： A61B8/00 ,  A61B5/0066 ,  A61B5/0097 ,  G01H9/00 ,  G01S7/52033 ,  G01S7/52079 ,  G01S15/8968

摘要： An opto-electrical ultrasound sensor, preferably for the use in medical diagnostics, comprising at least one light source (2), a photo detector (3) illuminated by the light source (2) and capable of producing an electrical signal indicative of the intensity of the light incident on the photo detector (3), and an optical ultrasound detector (4) located in the optical path between the light source (2) and the photo detector (3) and capable of modulating in response to an ultrasound signal the intensity of at least part of the light incident on photo detector (3) from the light source (2). The opto-electrical ultrasound sensor further comprises intensity adjustment means (5) for adjusting the intensity of the light incident on the photo detector (3) via the optical ultrasound detector (4).

摘要翻译： 一种优选用于医疗诊断的光电超声波传感器，包括由光源（2）照射的至少一个光源（2），光电检测器（3），并且能够产生指示强度的电信号 的入射光检测器（3）的光，和位于光源（2）和光电检测器（3）之间的光路中的光学超声波检测器（4），并且能够响应于超声信号进行调制 从光源（2）入射到光检测器（3）上的光的至少一部分的强度。 光电超声波传感器还包括用于经由光学超声波检测器（4）调节入射在光检测器（3）上的光的强度的强度调节装置（5）。

公开(公告)号：US20050133743A1

公开(公告)日：2005-06-23

申请号：US10736911

申请日：2003-12-17

申请人： Sicco Schets ,  Jeroen Huijbregstse ,  Allan Dunbar ,  Nicolaas Van Der Aa

发明人： Sicco Schets ,  Jeroen Huijbregstse ,  Allan Dunbar ,  Nicolaas Van Der Aa

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F7/70633

摘要： A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.

摘要翻译： 一种用于优化光刻投影设备的对准状​​态的方法。 该方法包括将辐射束投射在基板的目标部分上并测量由目标部分发射的多个衍射信号。 该方法还包括计算多个衍射信号中的每一个的方差，使得​​确定衍射信号的多个方差，并且基于多个方差的分析来调整光刻投影设备的对准状​​态。

公开(公告)号：US20100210950A1

公开(公告)日：2010-08-19

申请号：US12669015

申请日：2008-07-01

申请人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

发明人： Allan Dunbar ,  Eliseo Sobrino ,  Sicco Schets ,  Uwe Zeitner

IPC分类号： A61B8/00

CPC分类号： A61B8/00 ,  A61B5/0066 ,  A61B5/0097 ,  G01H9/00 ,  G01S7/52033 ,  G01S7/52079 ,  G01S15/8968

摘要： An opto-electrical ultrasound sensor, preferably for the use in medical diagnostics, comprising at least one light source (2),a photo detector (3) illuminated by the light source (2) and capable of producing an electrical signal indicative of the intensity of the light incident on the photo detector(3), and an optical ultrasound detector (4) located in the optical path between the light source (2) and the photo detector (3) and capable of modulating in response to an ultrasound signal the intensity of at least part of the light incident on photo detector (3) from the light source (2). The opto-electrical ultrasound sensor further comprises intensity adjustment means (5) for adjusting the intensity of the light incident on the photo detector (3) via the optical ultrasound detector (4).

摘要翻译： 一种优选用于医疗诊断的光电超声波传感器，包括由光源（2）照射的至少一个光源（2），光电检测器（3），并且能够产生指示强度的电信号 的入射光检测器（3）的光，和位于光源（2）和光电检测器（3）之间的光路中的光学超声波检测器（4），并且能够响应于超声信号进行调制 从光源（2）入射到光检测器（3）上的光的至少一部分的强度。 光电超声波传感器还包括用于经由光学超声波检测器（4）调节入射在光检测器（3）上的光的强度的强度调节装置（5）。