公开(公告)号：US20080130462A1

公开(公告)日：2008-06-05

申请号：US11814006

申请日：2006-01-06

申请人： Frank Jeroen Pieter Schuurmans ,  Gert 'T Hooft ,  Marcello Leonardo Mario Balistreri

发明人： Frank Jeroen Pieter Schuurmans ,  Gert 'T Hooft ,  Marcello Leonardo Mario Balistreri

IPC分类号： G11B7/0065

CPC分类号： G11B7/1353 ,  G11B7/0065 ,  G11B7/128

摘要： An optical device comprises a light source (301) for generating a radiation beam, a reflective diffractive structure (304) for reflecting and diffracting said radiation beam along an optical path (PP), imaging means (305) for imaging the radiation beam after it has been reflected and diffracted by said reflective diffractive structure, and a holographic beam splitter (303) between said reflective diffractive structure and said imaging means along said optical path. Such an optical device can be used for recording data into a holographic medium.

摘要翻译： 光学装置包括用于产生辐射束的光源（301），用于沿着光路（PP）反射和衍射所述辐射束的反射衍射结构（304），用于对其辐射束进行成像的成像装置（305） 已经被所述反射衍射结构反射和衍射，以及沿着所述光路在所述反射衍射结构和所述成像装置之间的全息分束器（303）。 这种光学装置可用于将数据记录到全息介质中。

公开(公告)号：US08094311B2

公开(公告)日：2012-01-10

申请号：US11912342

申请日：2006-04-26

申请人： Natallia Uzunbajakava ,  Aleksey Kolesnychenko ,  Antonius Theodorus Martinus Van Gogh ,  Gert 'T Hooft ,  Frank Jeroen Pieter Schuurmans

发明人： Natallia Uzunbajakava ,  Aleksey Kolesnychenko ,  Antonius Theodorus Martinus Van Gogh ,  Gert 'T Hooft ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G01N21/31

CPC分类号： G01J3/32 ,  G01J3/02 ,  G01J3/0213 ,  G01J3/0229 ,  G01J3/0264 ,  G01J3/0272 ,  G01J3/28 ,  G01J2003/1282 ,  G01N21/274

摘要： The invention relates to a multivariate calibration which can be used when the optical system used for that method does not comprise a multi-channel detector such as a CCD sensor or a line array of photodiodes. An optical system without a multi-channel detector doesn't allow to carry out preprocessing steps. Thus there is the need to carry out these preprocessing steps in another way. It is suggested to partially replace the preprocessing step by a measurement of the optical signal, whereby the measurement comprises transmitting or reflecting the optical signal by an optical element, thereby weighing the optical signal by a spectral weighing function. The advantage of the invention is to teach how such an optical system without a bulky and expensive CCD sensor can be used to carry out a multivariate calibration and preprocessing steps.

摘要翻译： 本发明涉及当用于该方法的光学系统不包括诸如CCD传感器或光电二极管的线阵列的多通道检测器时可以使用的多变量校准。 没有多通道检测器的光学系统不允许执行预处理步骤。 因此，需要以另一种方式执行这些预处理步骤。 建议通过光信号的测量部分地代替预处理步骤，由此测量包括通过光学元件发送或反射光信号，从而通过光谱称重功能称量光信号。 本发明的优点是教导如何不使用庞大且昂贵的CCD传感器的这种光学系统来执行多变量校准和预处理步骤。

公开(公告)号：US20090268203A1

公开(公告)日：2009-10-29

申请号：US11912342

申请日：2006-04-26

申请人： Natallia Uzunbajakava ,  Aleksey Kolesnychenko ,  Antonius Theodorus Martinus Van Gogh ,  Gert 'T Hooft ,  Frank Jeroen Pieter Schuurmans

发明人： Natallia Uzunbajakava ,  Aleksey Kolesnychenko ,  Antonius Theodorus Martinus Van Gogh ,  Gert 'T Hooft ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G01N21/31

CPC分类号： G01J3/32 ,  G01J3/02 ,  G01J3/0213 ,  G01J3/0229 ,  G01J3/0264 ,  G01J3/0272 ,  G01J3/28 ,  G01J2003/1282 ,  G01N21/274

摘要： The invention relates to a multivariate calibration which can be used when the optical system used for that method does not comprise a multi-channel detector such as a CCD sensor or a line array of photodiodes. An optical system without a multi-channel detector doesn't allow to carry out preprocessing steps. Thus there is the need to carry out these preprocessing steps in another way. It is suggested to partially replace the preprocessing step by a measurement of the optical signal, whereby the measurement comprises transmitting or reflecting the optical signal by an optical element, thereby weighing the optical signal by a spectral weighing function. The advantage of the invention is to teach how such an optical system without a bulky and expensive CCD sensor can be used to carry out a multivariate calibration and preprocessing steps.

摘要翻译： 本发明涉及当用于该方法的光学系统不包括诸如CCD传感器或光电二极管的线阵列的多通道检测器时可以使用的多变量校准。 没有多通道检测器的光学系统不允许执行预处理步骤。 因此，需要以另一种方式执行这些预处理步骤。 建议通过光信号的测量部分地代替预处理步骤，由此测量包括通过光学元件发送或反射光信号，从而通过光谱称重功能称量光信号。 本发明的优点是教导如何不使用庞大且昂贵的CCD传感器的这种光学系统来执行多变量校准和预处理步骤。

公开(公告)号：US20080298404A1

公开(公告)日：2008-12-04

申请号：US11719951

申请日：2005-11-23

申请人： Gert 'T Hooft ,  Johannes Joseph Hubertina Barbara Schleipen ,  Frank Jeroen Pieter Schuurmans ,  Teunis Willem Tukker

发明人： Gert 'T Hooft ,  Johannes Joseph Hubertina Barbara Schleipen ,  Frank Jeroen Pieter Schuurmans ,  Teunis Willem Tukker

IPC分类号： H01S3/10 ,  H01S3/1055

CPC分类号： G11B7/0065 ,  G02B19/0028 ,  G02B19/0052 ,  G11B7/1362 ,  G11B7/1376 ,  G11B7/1381 ,  G11B7/1398 ,  H01S5/005 ,  H01S5/0656 ,  H01S5/141 ,  H01S2302/00

摘要： For optical data storage applications, for example, for holographic storage applications, a radiation beam (12) with a flat intensity profile is needed. The radiation source device (1) of the invention comprises a beam shaper element (5) and a collimating element (7) between a semiconductor laser (3) and an output coupler (9) and provides such a radiation beam (12) with an increased efficiency. An external resonator is thereby provided. Further, a relatively fast tuning of the wavelength of the output radiation beam (12) can be provided.

摘要翻译： 对于光学数据存储应用，例如，对于全息存储应用，需要具有平坦强度分布的辐射束（12）。 本发明的辐射源装置（1）包括在半导体激光器（3）和输出耦合器（9）之间的光束整形元件（5）和准直元件（7），并且提供这样的辐射束（12） 提高效率。 由此提供外部谐振器。 此外，可以提供输出辐射束（12）的波长的相对快速调谐。

公开(公告)号：US20100200772A1

公开(公告)日：2010-08-12

申请号：US12771466

申请日：2010-04-30

申请人： Levinus Pieter BAKKER ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter BAKKER ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21K5/04

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

摘要翻译： 辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。 污染屏障包括多个薄片。 薄片的表面包括材料。 辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。 收集器的光学表面包括与薄片表面的材料相同的材料。

公开(公告)号：US07737425B2

公开(公告)日：2010-06-15

申请号：US11798710

申请日：2007-05-16

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21F1/12

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

摘要翻译： 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US20090206279A1

公开(公告)日：2009-08-20

申请号：US10599345

申请日：2005-03-18

申请人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： A61N5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

摘要： A method for removing contaminant particles (14), such as atoms, molecules, clusters, ions, and the like, produced by means of a radiation source (10) during generation of short-wave radiation (12) having a wavelength of up to approximately 20 nm, by means of a first gas (22) guided at high mass throughput between the radiation source (10) and a particle trap (20) arranged in a wall (16) of a mirror chamber (18) is described that can be used for a lithography device or a microscope. In order to protect an optical device and/or articles to he irradiated against contamination, the method is designed such that a second gas (24) is introduced into the mirror chamber (18) and its pressure is adjusted such that it is at least as high as the pressure of the first gas (22).

摘要翻译： 一种用于去除在产生短波辐射（12）期间通过辐射源（10）产生的污染物颗粒（14）的方法，例如原子，分子，簇，离子等，其具有波长直至 描述了通过在辐射源（10）和布置在反射镜腔（18）的壁（16）中的颗粒捕获器（20）之间以高质量通量引导的第一气体（22）的大约20nm，其可以 用于光刻设备或显微镜。 为了保护光学装置和/或物品以照射到污染物上，该方法被设计成使得第二气体（24）被引入反射镜室（18）中，并且调节其压力使其至少等于 作为第一气体（22）的压力高。

公开(公告)号：US20090015819A1

公开(公告)日：2009-01-15

申请号：US10596563

申请日：2004-12-13

申请人： Michael Cornelis Van Beek ,  Bernardus Leonardus Bakker ,  Wouter Harry Jacinth Rensen ,  Frank Jeroen Pieter Schuurmans

发明人： Michael Cornelis Van Beek ,  Bernardus Leonardus Bakker ,  Wouter Harry Jacinth Rensen ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G01N33/48

CPC分类号： G01N21/31 ,  G01J3/28 ,  G01N21/274 ,  G01N21/64 ,  G01N21/6445 ,  G01N21/65 ,  G01N2021/3196 ,  G01N2021/6417 ,  G01N2021/655

摘要： The optical analysis system (20) is arranged to determine an amplitude of a principal component of an optical signal. The optical analysis system (20) comprises a multivariate optical element (5, 6) for weighing the optical signal by a spectral weighing function and a detector (7, 8) for detecting the weighed optical signal. The optical signal comprises the principal component and a further component which was not accounted for when designing the spectral weighing function. Therefore, the detected weighed optical signal comprises a part relating to the amplitude of the principal component and a further part relating to a further amplitude of the further component. The optical analysis system (20) further comprises a modulator element (13) for modulating the detected weighed optical signal. The difference between the modulated detected weighed optical signal and the detected weighed optical signal relates to the amplitude of the principal component and thus allows for determining the amplitude of the principal component in an accurate way. The blood analysis system (40) comprises such an optical analysis system (20). The method of determining an amplitude of an principal component makes use of the optical analysis system (20).

摘要翻译： 光学分析系统（20）被布置成确定光信号的主分量的幅度。 光学分析系统（20）包括用于通过光谱称重功能称量光信号的多元光学元件（5,6）和用于检测加权光信号的检测器（7,8）。 光信号包括主分量和另外的分量，在设计光谱称重功能时不考虑。 因此，检测到的加权光信号包括与主分量的振幅有关的部分，以及与另一分量的另一幅度相关的另一部分。 光学分析系统（20）还包括用于调制检测到的称重光信号的调制器元件（13）。 调制检测到的称重光信号与检测到的称重光信号之间的差异与主分量的振幅有关，因此允许以准确的方式确定主分量的振幅。 血液分析系统（40）包括这样的光学分析系统（20）。 确定主成分的振幅的方法利用光学分析系统（20）。

公开(公告)号：US07279690B2

公开(公告)日：2007-10-09

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

IPC分类号： H05H3/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US07256407B2

公开(公告)日：2007-08-14

申请号：US11224084

申请日：2005-09-13

申请人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： H01J37/00 ,  G21K5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70958

摘要： A lithographic projection apparatus includes reflector assembly, a foil trap, and a housing that is constructed and arranged to contain the reflector assembly and the foil trap. The reflector assembly is connected to the housing via a first wall, and the foil trap is connected to the housing via a second wall. The apparatus also includes a chamber between the foil trap and the reflector assembly. The chamber is defined by the housing, the first wall, and the second wall. The apparatus further includes a pump that is configured to create a vacuum in the chamber.

摘要翻译： 光刻投影设备包括反射器组件，箔捕获器和壳体，其被构造和布置成容纳反射器组件和箔阱。 反射器组件经由第一壁连接到壳体，并且箔阱通过第二壁连接到壳体。 该设备还包括在箔捕获器和反射器组件之间的室。 腔室由壳体，第一壁和第二壁限定。 该设备还包括被配置为在腔室中产生真空的泵。