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公开(公告)号：US06700715B2
公开(公告)日：2004-03-02
申请号：US10016704
申请日：2001-12-11
申请人： Franz Sorg , Stefan Xalter , Michael Muehlbeyer , Bernhard Gellrich , Frank Melzer , Thomas Ittner
发明人： Franz Sorg , Stefan Xalter , Michael Muehlbeyer , Bernhard Gellrich , Frank Melzer , Thomas Ittner
IPC分类号： G02B702
CPC分类号： G03F7/709 , F16F15/005 , F16F15/02 , G02B27/646
摘要： In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.
摘要翻译： 在振荡阻尼系统中，作用在成像装置中的光学元件，特别是在投影照明装置中的变形解耦安装件和操纵器上的振荡，特别是用于微光刻投影曝光物镜光刻的投影物镜中的振荡被检测 通过致动器产生具有与干扰振荡相同或至少相似的频率和反相振幅的致动器传感器，并将其引入到所述安装件中。
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公开(公告)号：US06897599B2
公开(公告)日：2005-05-24
申请号：US10075797
申请日：2002-02-12
CPC分类号： G03F7/70991 , F16F15/005 , F16F15/02 , G03F7/709
摘要： In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.
摘要翻译： 在用于克服或至少阻挡在通道（9）中或至少阻尼振荡的系统中，所述通道（9）承载组件中的流体，特别是光学元件（1）中的冷却通道中的冷却剂，特别是用于半导体的投影物镜（1a） 光刻，发生的振荡由传感器（5）检测和评估，之后结果通过自适应控制环路形式的压电元件（9）的形式，压电元件（9）集成在光学元件中，呈现形式 薄板，薄膜或层，当被激活时，产生抵消由湍流产生的振荡和固有频率的振荡或频率。
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公开(公告)号：US07684125B2
公开(公告)日：2010-03-23
申请号：US10595583
申请日：2003-12-18
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译： 本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。
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公开(公告)号：US08089707B2
公开(公告)日：2012-01-03
申请号：US12700351
申请日：2010-02-04
申请人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
发明人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译： 本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。
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公开(公告)号：US20100134777A1
公开(公告)日：2010-06-03
申请号：US12700351
申请日：2010-02-04
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译： 本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。
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6.发明授权Optical imaging device, in particular lens system, with at least one system diaphragm 有权光学成像装置，特别是透镜系统，具有至少一个系统隔膜公开(公告)号：US06445510B1
公开(公告)日：2002-09-03
申请号：US09678715
申请日：2000-10-04
IPC分类号： G02B900
CPC分类号： G03F7/7025 , G02B5/005
摘要： An optical imaging device, in particular a lens system, has a system diaphragm (1). An aperture of the system diaphragm (1) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm (1) with respect to the optical axis (4) of the system diaphragm (1) is fixed in dependence on the opening diameter (D) of the system diaphragm (1).
摘要翻译： 光学成像装置，特别是透镜系统，具有系统隔膜（1）。 系统隔膜（1）的孔径可以在其开口直径（D）上调节。 系统隔膜（1）的孔径相对于系统隔膜（1）的光轴（4）的轴向位置根据系统隔膜（1）的开口直径（D）固定。
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公开(公告)号：US20120075611A1
公开(公告)日：2012-03-29
申请号：US13307550
申请日：2011-11-30
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译： 本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。 隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。
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公开(公告)号：US20090141258A1
公开(公告)日：2009-06-04
申请号：US12363065
申请日：2009-01-30
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。 剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。 线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。
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公开(公告)号：US20090040487A1
公开(公告)日：2009-02-12
申请号：US12247597
申请日：2008-10-08
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。
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公开(公告)号：US08179621B2
公开(公告)日：2012-05-15
申请号：US12716357
申请日：2010-03-03
IPC分类号： G02B7/02
CPC分类号： G03F7/70258 , G02B7/182 , G02B7/1822 , G02B7/183 , G03F7/70825 , H02K41/035
摘要： The invention relates to an apparatus for manipulation of an optical element (7) in up to six degrees of freedom with respect to a structure (8) via at least three actuator devices (9). The actuator devices (9) each have at least two force-controlled actuators, which each produce an effective force along one degree of freedom, with linking points (11) of the actuator devices (9) acting directly on the optical element (7).
摘要翻译： 本发明涉及一种用于经由至少三个致动器装置（9）相对于结构（8）以高达六个自由度操纵光学元件（7）的装置。 致动器装置（9）各自具有至少两个力控制致动器，每个致动器分别沿着一个自由度产生有效力，致动器装置（9）的连接点（11）直接作用在光学元件（7）上， 。
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