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    Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith
    2.
    发明授权
    Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith 失效
    含有萘醌二叠氮磺酸混合酯和用其制备的辐射敏感记录材料的组合物

    公开(公告)号：US5306595A

    公开(公告)日：1994-04-26

    申请号：US862603

    申请日：1992-04-01

    申请人： Siegfried Scheler ,  Wolfgang Zahn ,  Axel Schmitt ,  Gerhard Buhr

    发明人： Siegfried Scheler ,  Wolfgang Zahn ,  Axel Schmitt ,  Gerhard Buhr

    IPC分类号： G03F7/00 ,  G03F7/022 ,  H01L21/027 ,  G03C1/52

    CPC分类号： G03F7/022

    摘要： The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.

    摘要翻译： 本发明涉及一种含有树脂粘合剂的辐射敏感性组合物，其不溶于水，但在碱性水溶液，至少一种辐射敏感化合物和任选的交联剂中可溶或至少可溶胀。 辐射敏感性化合物是由a）含有2-6个芳族羟基的化合物，b）环取代的（邻 - 萘醌-2-二叠氮化物）-4-磺酸（重氮化合物D1）和c） （重氮化合物D2）和/或非辐射敏感性有机酸（化合物D0）的（邻 - 萘醌-2-二叠氮化物）-4-或-5-磺酸（化合物D0），其中D1：（D2和 /或D0）摩尔比为约0.1:1至30:1。

    Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters
    3.
    发明授权
    Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters 失效
    含有O-萘醌二叠氮化物 - 磺酸酯的光敏混合物及其制备的记录材料，其中O-萘醌二叠氮化物为偏酯

    公开(公告)号：US5413899A

    公开(公告)日：1995-05-09

    申请号：US254500

    申请日：1994-06-06

    申请人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

    发明人： Siegfried Scheler ,  Andreas Elsaesser ,  Gerhard Buhr ,  Klaus Bergmann ,  Wolfgang Zahn

    IPC分类号： G03F7/00 ,  G03F7/022 ,  H01L21/027 ,  H01L21/30 ,  G03F7/021 ,  G03F7/30

    CPC分类号： G03F7/022

    摘要： A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

    摘要翻译： 含有不溶于水但在碱性水溶液中至少溶胀或至少可溶胀的树脂粘合剂和邻萘醌二叠氮化物 - 磺酸酯的光敏混合物，该邻萘醌二叠氮化物 - 磺酸酯为式I 其中R为氢或烷基或芳基，R1为氢或1,2-萘醌-2-重氮-4-磺酰基，1,2-萘醌-2-重氮基-5-磺酰基 或7-甲氧基-1,2-萘醌-2-二叠氮-4-磺酰基，分子中定义为R1的相同或不同的萘醌二叠氮基 - 磺酰基的数目为1〜5; 可用于制备光敏抗蚀剂材料。 使用感光性混合物制造的抗蚀剂材料具有高的光敏感性和对碱性显影剂非常好的显影剂抗性，并且可以在没有水性弱碱性溶液的问题的情况下开发。

    Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material
    7.
    发明授权
    Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material 失效
    辐射敏感性化合物，其制备的辐射敏感性混合物和复制材料

    公开(公告)号：US5114816A

    公开(公告)日：1992-05-19

    申请号：US431221

    申请日：1989-11-03

    申请人： Siegfried Scheler ,  Gerhard Buhr ,  Helmut Lenz ,  Klaus Bergmann ,  Herbert Siegel

    发明人： Siegfried Scheler ,  Gerhard Buhr ,  Helmut Lenz ,  Klaus Bergmann ,  Herbert Siegel

    IPC分类号： C07C309/26 ,  C07C309/52 ,  C07C309/73 ,  C07C311/37 ,  C07C323/66 ,  G03F7/022

    CPC分类号： G03F7/022 ,  C07C309/26 ,  C07C2101/16

    摘要： The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,R.sub.1 and R.sub.2 not being hydrogen at the same time.The compounds are used as radiation-sensitive components in radiation-sensitive mixtures with which corresponding copying materials can be produced. The compounds have an absorption which is directed towards longer wavelengths matching the emission range of commercially available radiation sources. They also make it possible, in a reliable and practical manner, to carry out negativeworking image reversal processes.

    摘要翻译： 本发明涉及新的辐射敏感化合物，它们是通式为（I）的1,2-萘醌 - （2） - 二叠氮-4-磺酸的酯或酰胺，其中R 1和R 2相同或 不同的表示氢，烷基，烷基醚基或其碳链可被醚氧原子间隔的烷基硫醚基，酰氨基，羧酸酯基，磺酸酯基或磺酰胺基，R1和R2不是 同时是氢。 这些化合物用作辐射敏感性混合物中的辐射敏感组分，可以制备相应的复印材料。 这些化合物具有吸收，该吸收指向与市售辐射源的发射范围匹配的较长波长。 它们也使得以可靠和实际的方式实现负面的图像反转过程成为可能。

    Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use
    8.
    发明授权
    Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use 失效
    取代的1,2-萘醌-2-二氮杂-4-磺酸及其制备和使用的方法

    公开(公告)号：US5077395A

    公开(公告)日：1991-12-31

    申请号：US564612

    申请日：1990-08-09

    申请人： Siegfried Scheler ,  Gerhard Buhr ,  Klaus Bergmann

    发明人： Siegfried Scheler ,  Gerhard Buhr ,  Klaus Bergmann

    IPC分类号： C07D303/22 ,  C07C303/06 ,  C07C303/22 ,  C07C303/32 ,  C07C309/26 ,  C09K9/02 ,  G03F7/022

    CPC分类号： C07C309/26 ,  G03F7/022

    摘要： Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids are disclosed having the general formula A ##STR1## in which R is an alkyl, epoxyalklyl, alkylcarbonyl or alkylsulfonyl group, the carbon chains of which may be interrupted by oxygen atoms, or a substituted or unsubstituted aralkyl, arylcarbonyl or arylsulfonyl group andX is hydrogen, a metal or an ammonium group.A process for the preparation of the compounds is also disclosed. The compounds can be used as such, or preferably after condensation of their sulfonic acid chlorides with aromatic hydroxy compounds or amines to give the corresponding esters or amides, as light-sensitive compounds in radiation-sensitive mixtures or materials.

    摘要翻译： 公开了具有通式A A的取代的1,2-萘醌-2-二叠氮-4-磺酸，其中R是烷基，环氧烷基，烷基羰基或烷基磺酰基，其碳链可被氧中断 原子或取代或未取代的芳烷基，芳基羰基或芳基磺酰基，X是氢，金属或铵基。 还公开了制备化合物的方法。 化合物可以原样使用，或优选在其磺酰氯与芳族羟基化合物或胺缩合后得到相应的酯或酰胺，作为辐射敏感混合物或材料中的光敏化合物。

    1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds
    9.
    发明授权
    1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds 失效
    含有这些化合物的1,2-萘磺酸-2-二亚磺酸 - 酰胺类和感光性组合物

    公开(公告)号：US5162190A

    公开(公告)日：1992-11-10

    申请号：US373036

    申请日：1989-06-29

    申请人： Wolfgang Zahn ,  Gerhard Buhr ,  Hartmut Steppan

    发明人： Wolfgang Zahn ,  Gerhard Buhr ,  Hartmut Steppan

    IPC分类号： C07C311/14 ,  C07C311/17 ,  G03F7/022 ,  G03F7/023

    CPC分类号： C07C311/14 ,  C07C311/17 ,  G03F7/022

    摘要： A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical,R.sup.1 denotes an alkylene group andR.sup.2 denotes a hydrogen atom, an alkyl group or a group R.sup.1 --OH,or of the general formula II ##STR2## in which X denotes an alkylene group, an arylene group or a group of the formulaNH--Y--NH, wherein Y is an alkylene group or an arylene group,R.sup.3 denotes an alkylene group, which may be interrupted by ether oxygen atoms,n is a number from 1 to 40 andm is a number from 0 to 50,the ratio m:(m+n) being from 0:100 to 95:100 and R.sup.1 and D having the above-indicated meaning, are disclosed. The compounds may be used in positive-working photosenitive materials for the production of printing plates and photoresists. Compounds according to formula II do not require an addition of polymeric binders.

    摘要翻译： 其中D表示1,2-萘醌-2-重氮基-4-磺酰基或-5-磺酰基的通式I（I）的化合物，R 1表示亚烷基，R 2表示氢原子， 烷基或基团R 1 -OH，或通式II其中X表示亚烷基，亚芳基或式NH-Y-NH基，其中Y 是亚烷基或亚芳基，R3表示可被醚氧原子间隔的亚烷基，n为1〜40的数，m为0〜50的数，m：（m + n ）为0：100〜95：100，R1和D为上述含义。 这些化合物可用于生产印刷板和光致抗蚀剂的正性光敏材料。 根据式II的化合物不需要加入聚合物粘合剂。

    Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in a radiation-sensitive mixture, and radiation-sensitive copying material
    10.
    发明授权
    Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in a radiation-sensitive mixture, and radiation-sensitive copying material 失效
    双-1,2-萘醌-2-二叠氮磺酸酰胺，它们在辐射敏感混合物中的用途和辐射敏感性复制材料

    公开(公告)号：US4774171A

    公开(公告)日：1988-09-27

    申请号：US10640

    申请日：1987-02-04

    申请人： Wolfgang Zahn ,  Gerhard Buhr

    发明人： Wolfgang Zahn ,  Gerhard Buhr

    IPC分类号： G03C1/72 ,  C07C67/00 ,  C07C301/00 ,  C07C311/29 ,  C07C311/37 ,  G03C1/73 ,  G03F7/022 ,  G03C1/54 ,  C07C113/00

    CPC分类号： G03F7/022

    摘要： Novel bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides of secondary diamines, which amides are represented by the formula ##STR1## in which R is a straight-chain or branched, unsubstituted or hydroxyl-substituted alkyl, cycloalkyl or aralkyl radical which has 1 to 14 carbon atoms and which includes a carbon chain that can be interrupted by either oxygen atoms,R.sub.1 is an alkylene radical which has 2 to 12 carbon atoms and which includes a carbon chain that can be interrupted by ether oxygen atoms, or a mononuclear or polynuclear aralkylene radical which has 8 to 18 carbon atoms and which can, when it is a polynuclear radical, comprise aromatic members that are linked by a single bond, by --O--, --S--, --CO-- or --CR.sub.2 R.sub.3 --, --N[C.sub.1-3 -alkyl]CO-- or a C.sub.2-5 -alkyl group which can be interrupted by ether oxygen atoms, andR.sub.2 and R.sub.3 can be identical or different, and are separately hydrogen or an alkyl radical which is unsubstituted or substituted and which has 1 or 2 carbon atoms, orR and R.sub.1 together form a cycloalkyl radical which has 4 to 16 carbon atoms and which can, when it is a polynuclear radical, comprise cycloaliphatic moieties that are linked by a carbon chain having 1 to 6 carbon atoms,andD.sub.1 and D.sub.2 are identical or different and are 1,2-naphthoquinone-2-diazide-4- or -5-sulfonyl radicals.The compounds can be used as radiation-sensitive components in radiation-sensitive mixtures for copying materials, as they are characterized by good absorption in the range from 300 to 350 nm.

    摘要翻译： 次酰胺的新型双-1,2-萘醌-2-二叠氮化物 - 磺酸酰胺由式（I）表示，其中R是直链或支链，未取代或羟基取代的烷基 ，具有1至14个碳原子的环烷基或芳烷基，并且包括可以被氧原子间隔的碳链，R 1是具有2至12个碳原子的亚烷基，并且包括可以被 醚氧原子或具有8至18个碳原子的单核或多核亚芳基，当其为多核基团时，其可以包含通过单键连接的芳族成员，-O - ， - S - ， - CO-或-CR 2 R 3 - ， - N [C 1-3 - 烷基] CO-或可被醚氧原子间隔的C 2-5 - 烷基，R 2和R 3可以相同或不同，并且分别为氢或 未取代或取代且具有1或2个碳原子的烷基，或R和R 1 其形成具有4至16个碳原子的环烷基，并且当其为多核基团时，其可以包含通过具有1至6个碳原子的碳链连接的脂环族部分，并且D1和D2相同或不同，并且是 1,2-萘醌-2-二叠氮-4-或5-磺酰基。 这些化合物可以用作用于复印材料的辐射敏感混合物中的辐射敏感组分，因为它们的特征在于在300至350nm范围内的良好吸收。