摘要:
A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical,R.sup.1 denotes an alkylene group andR.sup.2 denotes a hydrogen atom, an alkyl group or a group R.sup.1 --OH,or of the general formula II ##STR2## in which X denotes an alkylene group, an arylene group or a group of the formulaNH--Y--NH, wherein Y is an alkylene group or an arylene group,R.sup.3 denotes an alkylene group, which may be interrupted by ether oxygen atoms,n is a number from 1 to 40 andm is a number from 0 to 50,the ratio m:(m+n) being from 0:100 to 95:100 and R.sup.1 and D having the above-indicated meaning, are disclosed. The compounds may be used in positive-working photosenitive materials for the production of printing plates and photoresists. Compounds according to formula II do not require an addition of polymeric binders.
摘要:
A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.
摘要:
Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula ##SPC1##Where R is hydrogen or methyl; R.sub.1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C.sub.1 to C.sub.2) alkoxy, carbo-(C.sub.1 to C.sub.2)-alkoxy, (C.sub.1 to C.sub.2)acyl or (C.sub.1 to C.sub.2)acyloxy and R.sub.2 and R.sub.3, independently, each are (C.sub.1 to C.sub.4)alkyl or chlorine; and R.sub.4 is (C.sub.1 to C.sub.4)alkyl, nitro, chlorine or bromine, are provided.
摘要翻译:能够通过光交联的聚合物,其包含具有式WHERE R为氢或甲基的侧取代的1-羰基氧基-1H-萘-2-酮的单元; R 1是具有1至3个碳原子的链状或支链,饱和或不饱和的烃基,其中氢原子可以被氰基,(C1-C2)烷氧基,碳 - (C1-C2) - 烷氧基, (C1至C2)酰基或(C1至C2)酰氧基,R2和R3独立地为(C1至C4)烷基或氯; 并且R4是(C1-C4)烷基,硝基,氯或溴。
摘要:
Novel bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides of secondary diamines, which amides are represented by the formula ##STR1## in which R is a straight-chain or branched, unsubstituted or hydroxyl-substituted alkyl, cycloalkyl or aralkyl radical which has 1 to 14 carbon atoms and which includes a carbon chain that can be interrupted by either oxygen atoms,R.sub.1 is an alkylene radical which has 2 to 12 carbon atoms and which includes a carbon chain that can be interrupted by ether oxygen atoms, or a mononuclear or polynuclear aralkylene radical which has 8 to 18 carbon atoms and which can, when it is a polynuclear radical, comprise aromatic members that are linked by a single bond, by --O--, --S--, --CO-- or --CR.sub.2 R.sub.3 --, --N[C.sub.1-3 -alkyl]CO-- or a C.sub.2-5 -alkyl group which can be interrupted by ether oxygen atoms, andR.sub.2 and R.sub.3 can be identical or different, and are separately hydrogen or an alkyl radical which is unsubstituted or substituted and which has 1 or 2 carbon atoms, orR and R.sub.1 together form a cycloalkyl radical which has 4 to 16 carbon atoms and which can, when it is a polynuclear radical, comprise cycloaliphatic moieties that are linked by a carbon chain having 1 to 6 carbon atoms,andD.sub.1 and D.sub.2 are identical or different and are 1,2-naphthoquinone-2-diazide-4- or -5-sulfonyl radicals.The compounds can be used as radiation-sensitive components in radiation-sensitive mixtures for copying materials, as they are characterized by good absorption in the range from 300 to 350 nm.
摘要:
The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.
摘要:
A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.
摘要:
The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.
摘要:
The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.
摘要:
A photosensitive material for the production of color proofing films for multicolor printing, having (A) a transparent, flexible film support, (B) a photopolymerizable layer which contains (B1) a polymeric binder, (B2) a free-radical-polymerizable compound, (B3) a substituted bistrihalomethyl-s-triazine having an absorption maximum in the range from 300 to 380 nm and an absorbance of greater than 11,000 at the absorption maximum, and an absorbance of less than 1400 at 400 nm and above, as photoinitiator, and (B4) a dye or a colored pigment in a primary color of multicolor printing, and (C) a thermoplastic adhesive layer on the photo-sensitive layer. The material is processed by lamination onto an image-receiving material, exposure of the material and peeling apart of film support and image-receiving material, leaving the unexposed layer areas on the image-receiving material together with the adhesive layer. To produce a multicolored image, these steps are repeated with at least one further single-color sheet. The material has increased photosensitivity and gives color prints with lower background discoloration.
摘要:
A photosensitive material comprising (A) a flexible transparent film support, (B) a colored photosensitive layer which contains an organic binder (B1) a dye or a colored pigment (B2), a compound (B3), which forms a strong acid on exposure to radiation, and a compound (B4) which has at least one group cleavable by the acid, and (C) an adhesion-promoting layer which contains a thermoplastic polymer which has a softening temperature in the range from 40.degree. to 200.degree. C., wherein the adhesion (a.sub.1) of the unexposed photosensitive layer (B) to the adhesion-promoting layer (C) is less than the adhesion (a.sub.3) of the unexposed photosensitive layer (B) to the film support (A) and than the cohesions of the layers (B) and (C), and the adhesion (a.sub.3 ') of the exposed photosensitive layer (B) to the film support (A) is less than the adhesion (a.sub.1 ') of the exposed photosensitive layer (B) to the adhesion-promoting layer (C) and than the cohesions of the adhesion-promoting layer (C) and of the exposed photosensitive layer (B) is useful for the production of a colored image, in particular, is useful in a color proofing method for multicolor printing, which process gives images having high resolution.