TECHNIQUE TO MODIFY THE MICROSTRUCTURE OF SEMICONDUCTING MATERIALS
    2.
    发明申请
    TECHNIQUE TO MODIFY THE MICROSTRUCTURE OF SEMICONDUCTING MATERIALS 有权
    修改半导体材料微观结构的技术

    公开(公告)号:US20120074528A1

    公开(公告)日:2012-03-29

    申请号:US13236068

    申请日:2011-09-19

    IPC分类号: H01L29/30 H01L21/20

    摘要: A method of treating a sheet of semiconducting material comprises forming a sinterable first layer over each major surface of a sheet of semiconducting material, forming a second layer over each of the first layers to form a particle-coated semiconductor sheet, placing the particle-coated sheet between end members, heating the particle-coated sheet to a temperature effective to at least partially sinter the first layer and at least partially melt the semiconducting material, and cooling the particle-coated sheet to solidify the semiconducting material and form a treated sheet of semiconducting material.

    摘要翻译: 一种处理半导体材料片的方法包括在半导体材料片的每个主表面上形成可烧结的第一层,在每个第一层上形成第二层以形成颗粒涂覆的半导体片,将颗粒涂覆 将所述颗粒包覆的片材加热到有效地至少部分地烧结所述第一层并且至少部分地熔化所述半导体材料的温度,以及冷却所述颗粒涂覆的片材以固化所述半导体材料并形成经处理的片材 半导体材料。