公开(公告)号：US11383230B2

公开(公告)日：2022-07-12

申请号：US16085253

申请日：2016-03-31

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Jeffrey A. Nielsen ,  Michael W. Cumbie ,  Devin Alexander Mourey ,  Silam J. Choy ,  Kenneth Ward ,  Christie Dudenhoefer

IPC: B01L3/02

Abstract: A digital dispense apparatus includes at least one fluid dispense device, at least one reservoir fluidically connected to the at least one fluid dispense device, a monolithic carrier structure carrying the at least one fluid dispense device and reservoir, the monolithic carrier forming fluid routing between the reservoir and the fluid dispense device.

公开(公告)号：US20210011043A1

公开(公告)日：2021-01-14

申请号：US16500362

申请日：2017-07-18

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Suzanne Mirashrafi ,  Christie Dudenhoefer ,  Heather B. Louderback ,  Craig Olbrich ,  Dennis R. Esterberg ,  Jeffrey A. Nielsen

IPC: G01N35/10 ,  G01N35/00 ,  G01N35/02

Abstract: A reagent substrate may include a reagent sample deposition area on which a sample of a reagent is deposited, and a number of diagnostic regions on which a diagnostic sample of the reagent is deposited for verification of deposition of the diagnostic sample. A reagent dispensing system may include a conveyor surface to convey a number of substrates, at least one reagent module located in-line with respect to the conveyor surface where the reagent module includes at least one reagent dispensing device to dispense a reagent on the substrates, and at least one optical sensor to verify the dispensing of the reagent at a number of diagnostic regions of the substrate.

公开(公告)号：US20180222109A1

公开(公告)日：2018-08-09

申请号：US15748846

申请日：2015-10-20

Applicant: Hewlett-Packard Development Company, L.P.

Inventor： David H. Ochs ,  Joshua M. Yu ,  Jeffrey A. Nielsen ,  Kenneth Ward ,  Christie Dudenhoefer

IPC: B29C64/112 ,  B29C64/386 ,  B29C64/40 ,  B29C64/188

CPC classification number: B29C64/112 ,  B29C64/188 ,  B29C64/245 ,  B29C64/386 ,  B29C64/40 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02

Abstract: Systems, methods, and computer readable medium to provide patterned layer deposition of liquid types to a plate surface in layers organized in layouts with sites of patterns aligned to a plate origin of the plate surface. At least one layer includes a layout defining a geometric layout of the plate surface.

公开(公告)号：US11366125B2

公开(公告)日：2022-06-21

申请号：US16603119

申请日：2017-07-18

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Jeffrey A. Nielsen ,  Christie Dudenhoefer

IPC: G01N1/00 ,  G01N35/00 ,  G01N35/10

Abstract: Examples described herein also provide a substrate conveyance system. The substrate conveyance system may include a conveyor surface to convey a number of substrates, and a number of apertures defined in the conveyor surface between the substrates as positioned on the conveyor surface. The location of the apertures is based on a location at which at least one reagent module dispenses a reagent.

公开(公告)号：US20220146544A1

公开(公告)日：2022-05-12

申请号：US17414031

申请日：2019-07-31

Applicant: Hewlett-Packard Development Company, L.P.

Inventor： Diane R. Hammerstad ,  Jeffrey A. Nielsen ,  Christie Dudenhoefer ,  Matthew Smith

IPC: G01N35/10 ,  B01L3/02

Abstract: Aspects of the present disclosure relate to evaporation compensation in fluidic devices. An example apparatus for evaporation compensation includes an assessment circuit to determine an amount of evaporation of a volume dispensed in a microwell of a fluidic device. The amount of evaporation may be determined based on the volume in the microwell, and an amount of time after dispensing the volume in the microwell. A compensation circuit may determine, based on the amount of evaporation, a compensation factor for the microwell including an amount of a normalizing fluid to compensate for the amount of evaporation. The compensation circuit may also create a normalization profile for the fluidic device, including an association between the fluidic device and the compensation factor. A dispensing circuit may dispense the normalizing fluid in the microwell according to the normalization profile.

公开(公告)号：US11203017B2

公开(公告)日：2021-12-21

申请号：US16099668

申请日：2016-07-26

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Jeffrey A Nielsen ,  Manish Giri ,  Chantelle Domingue ,  Kenneth Ward ,  Christie Dudenhoefer ,  Matthew David Smith ,  Joshua M. Yu ,  Diane R. Hammerstad ,  Hilary Ely

IPC: B01L3/00 ,  B01L3/02 ,  G01N15/10 ,  G01N35/10 ,  G01N15/14

Abstract: According to an example, a microfluidic apparatus may include a channel, a foyer, in which the foyer is in fluid communication with the channel and in which the channel has a smaller width than the foyer, a sensor to sense a property of a fluid passing through the channel, a nozzle in fluid communication with the foyer, and an actuator positioned in line with the nozzle. The microfluidic apparatus may also include a controller to determine whether the sensed property of the fluid meets a predetermined condition and to perform a predefined action in response to the sensed property of the fluid meeting the predetermined condition.

公开(公告)号：USD917066S1

公开(公告)日：2021-04-20

申请号：US29689292

申请日：2019-04-29

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Designer： Dennis R. Esterberg ,  Vignesh Kannan ,  Kenneth Ward ,  Christie Dudenhoefer

公开(公告)号：US10029259B2

公开(公告)日：2018-07-24

申请号：US15650599

申请日：2017-07-14

Applicant: Hewlett-Packard Development Company, L.P.

Inventor： Dennis R Esterberg ,  Frank D Derryberry ,  Richard W Seaver ,  Christie Dudenhoefer

IPC: B01L3/00 ,  B41J2/175

Abstract: A slot extender includes a reservoir. The reservoir includes a reservoir floor defining a drain opening, a continuous reservoir sidewall extending from the reservoir floor, and a concave fillet running along at least a portion where the reservoir sidewall joins the reservoir floor. The concave fillet has a variable radius.

公开(公告)号：US11774463B2

公开(公告)日：2023-10-03

申请号：US16770198

申请日：2018-01-26

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Dennis R. Esterberg ,  Christie Dudenhoefer

IPC: G01N35/10 ,  G01N35/00 ,  B01L9/00

CPC classification number: G01N35/109 ,  B01L9/52 ,  G01N35/00029 ,  G01N35/1011 ,  B01L9/523 ,  B01L9/527 ,  B01L2200/025 ,  B01L2300/0816 ,  B01L2300/0822 ,  B01L2300/0829 ,  G01N2035/00138 ,  G01N2035/1039

Abstract: In one example, dispenser stages described herein may include a dispenser platform comprising: a stage coupled to a rail system to move the stage in a first plane and a second plane, an alignment feature coupled to the stage to align a substrate nest coupled to the stage with a dispenser positioned above the stage, and a releasable fastener to couple the substrate nest to the stage.

公开(公告)号：US20220168773A1

公开(公告)日：2022-06-02

申请号：US17672442

申请日：2022-02-15

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Roberto A. Pugliese ,  Jeffrey A. Nielsen ,  Christie Dudenhoefer ,  Craig Olbrich ,  Debora J. Thomas

IPC: B05C11/00 ,  B05C5/02

Abstract: An alignment system, in an example, may include a substrate comprising at least one nanowell, at least one fluid ejection device comprising at least one die, the at least one die comprising as least one nozzle, and an alignment device to align the at least one nozzle to the at least one nanowell.