-
公开(公告)号：US20200240015A1
公开(公告)日：2020-07-30
申请号：US16749282
申请日：2020-01-22
发明人： Toru SHIMIZU , Masakazu MINAMI
IPC分类号： C23C16/455 , C23C16/448
摘要： A concentration control apparatus capable of appropriately making a zero adjustment of a concentration measurement mechanism without interrupting a semiconductor manufacturing process includes: a control valve that controls gas flowing through a lead-out flow path; a concentration measurement mechanism that measures the concentration of source gas contained in gas flowing through the lead-out flow path; a concentration controller that controls the control valve so that the deviation between measured concentration measured by the concentration measurement mechanism and preset set concentration decreases; a judgement time point determination part that determines a judgement time point that is the time point when the gas present in a measurement part where the concentration measurement mechanism performs the concentration measurement has been replaced with other gas; and a zero adjustment part that makes a zero adjustment of the concentration measurement mechanism at or after the judgement time point.
-
公开(公告)号：US20190242818A1
公开(公告)日：2019-08-08
申请号：US16333265
申请日：2017-09-14
摘要： Obtained is an absorbance meter capable of, when measuring high-temperature sample gas, without increasing the distance from a light source part to a light receiving part, protecting the light source part and the light receiving part from the heat of the sample gas and keeping measurement accuracy high. A sample accommodation part including an accommodation space for accommodating the sample gas, the light source part for radiating light into the accommodation space, the light receiving part for receiving light exiting from inside the accommodation space, a first insulation part disposed adjacent to the light source part side of the sample accommodation part, a second insulation part disposed adjacent to the light receiving part side of the sample accommodation part, a first cooling part disposed adjacent to the first insulation part, and a second cooling part disposed adjacent to the second insulation part are provided.
-
公开(公告)号：US20170138794A1
公开(公告)日：2017-05-18
申请号：US15344848
申请日：2016-11-07
发明人： Sho FUJINO , Naoto BANDO , Masakazu MINAMI
CPC分类号： G01J5/0007 , G01J5/0875 , G01J5/10 , G01J2005/0048 , G01J2005/068
摘要： In order to provide a radiation thermometer with which a temperature of a measurement object disposed in a chamber configured to form plasma therein can be accurately measured in a noncontact manner from outside of the chamber, the radiation thermometer includes an infrared sensor and a window temperature compensation part. The infrared sensor is disposed outside the chamber configured to form plasma therein, and is configured to detect infrared ray emitted from the measurement object in the chamber through a transmission window provided in the chamber. The infrared sensor is configured to output an output signal according to energy of detected infrared ray. The window temperature compensation part is configured to compensate for a pre-compensation temperature of the measurement object being indicated by the output signal of the infrared sensor, on the basis of a temperature of the transmission window.
-
4.发明申请公开(公告)号：US20200340918A1
公开(公告)日：2020-10-29
申请号：US16849381
申请日：2020-04-15
发明人： Toru SHIMIZU , Yuhei SAKAGUCHI , Masakazu MINAMI
IPC分类号： G01N21/61
摘要： In order to make it possible to conduct a zero calibration even though an interference gas exists in a measurement area of a detector, a light absorbance analysis apparatus includes a detector that detects an intensity of light that transmits a gas, a total pressure sensor that measures a total pressure of the gas, an absorbance calculating part that calculates an absorbance based on an output value of the detector and a previously set zero reference value, a partial pressure—absorbance relation storing part that stores a partial pressure—absorbance relational data that indicates a relationship between a partial pressure of an interference gas that exists in a measurement area of the detector and an absorbance calculated by the absorbance calculating part, and a partial pressure calculating part that calculates an interference gas partial pressure as a partial pressure of the interference gas.
-
公开(公告)号：US20190085444A1
公开(公告)日：2019-03-21
申请号：US16134082
申请日：2018-09-18
发明人： Toru SHIMIZU , Masakazu MINAMI
IPC分类号： C23C14/54
摘要： Provided is a concentration control apparatus that, without reducing maintainability, can shorten piping to improve responsiveness. The concentration control apparatus is one adapted to introduce carrier gas into a storage tank storing a material, and control the concentration of material gas that is led out of the storage tank as mixed gas with the carrier gas and results from vaporization of the material. Also, the concentration control apparatus includes: a first unit that controls the flow rate of the carrier gas to be introduced into the storage tank; and a second unit that detects the concentration of the material gas led out of the storage tank.
-
公开(公告)号：US20170101715A1
公开(公告)日：2017-04-13
申请号：US15291264
申请日：2016-10-12
IPC分类号： C23C16/52 , G01N21/3504 , C23C16/448 , G01N21/84
CPC分类号： C23C16/52 , C23C16/4481 , C23C16/4482 , G01N21/3504 , G01N21/84 , G01N33/0004 , G01N2021/8411 , G01N2021/8578 , G05D11/00 , Y10T137/0329 , Y10T137/2499 , Y10T137/2509
摘要： A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.
-
公开(公告)号：US20200294820A1
公开(公告)日：2020-09-17
申请号：US16807722
申请日：2020-03-03
发明人： Toru SHIMIZU , Masakazu MINAMI
IPC分类号： H01L21/67 , G05D11/13 , C23C16/448
摘要： In order to provide a concentration control apparatus that, without adding any new sensors or the like, makes it possible to accurately estimate a quantity of source consumed inside a vaporization tank, and to perform highly accurate concentration control in accordance with the remaining quantity of source, there is provided a concentration control apparatus that, in a vaporizer that is equipped with at least a vaporization tank containing a liquid or solid source, a carrier gas supply path that supplies a carrier gas to the vaporization tank, and a source gas extraction path along which flows a source gas which is created by vaporizing the source and is then extracted from the vaporization tank, controls a concentration of the source gas and includes a concentration monitor that is provided on the source gas extraction path, and outputs output signals in accordance with a concentration of the source gas.
-
公开(公告)号：US20190333737A1
公开(公告)日：2019-10-31
申请号：US16394655
申请日：2019-04-25
发明人： Daisuke HAYASHI , Masakazu MINAMI
摘要： In order to uniform a two-dimensional concentration distribution or two-dimensional temperature distribution in a chamber at high speed and with high accuracy without relying on operator's experience, the present invention is adapted to include: a chamber that contains substrates and is also supplied with material gas; a laser emitting mechanism that emits laser beams from multiple points around the chamber toward incident windows formed in the peripheral wall of the chamber; a laser detecting mechanism that detects respective laser beams emitted from the multiple points, passing through the chamber, and emitted through emission windows formed in the peripheral wall of the chamber; and a control device that acquires beam intensity signals of the respective laser beams detected by the laser detecting mechanism, as well as on the basis of the beam intensity signals, calculates the two-dimensional concentration distribution or two-dimensional temperature distribution of the material gas in the chamber.
-
公开(公告)号：US20190161863A1
公开(公告)日：2019-05-30
申请号：US16323119
申请日：2017-07-26
IPC分类号： C23C16/52 , C23C16/448 , H01L21/67 , G05D7/06
摘要： The present invention provides a gas control system which introduces carrier gas into a tank containing a material and leads out material gas generated by vaporization of the material from the tank together with the carrier gas, the gas control system being provided with: a flow rate control unit that is configure to control the flow rate of the material gas led out from the tank by adjusting the flow rate of the carrier gas introduced into the tank; and a control limit detection unit that is configured to detect a control limit state and output detection of the control limit state, the control limit state is a state that the adjustment of the flow rate of the carrier gas performed by the flow rate control unit cannot secure the flow rate control of the material gas at a predetermined performance level.
-
公开(公告)号：US20170052115A1
公开(公告)日：2017-02-23
申请号：US15240235
申请日：2016-08-18
CPC分类号： G01N21/05 , G01N21/3504 , G01N2021/0389
摘要： The present invention intends to provide a Cp2Mg concentration measuring device capable of accurately measuring the concentration of Cp2Mg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 μm and on the basis of the light intensity, calculate the concentration of Cp2Mg in a material gas.
摘要翻译： 本发明旨在提供一种Cp2Mg浓度测定装置，能够精确地测定供给到处理室的Cp2Mg的浓度，而不受自发分解的影响，适用于测定12.8μm左右的规定波长带的光强度， 光强度的基础，计算材料气体中Cp2Mg的浓度。
-
-
-
-
-
-
-
-
-
搜索结果
14 条记录 (耗时 0.019 秒)
