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公开(公告)号：US20230417660A1
公开(公告)日：2023-12-28
申请号：US18039316
申请日：2021-11-22
IPC分类号： G01N21/3504 , G01N21/03 , G01N21/39
CPC分类号： G01N21/3504 , G01N21/0332 , G01N21/39 , G01N2201/127
摘要： The present invention is a gas analysis device that measures a concentration or partial pressure of a halide contained in a material gas used in semiconductor manufacturing process or a by-product gas generated in semiconductor manufacturing process with good accuracy, the device being for analyzing a concentration or partial pressure of a halide contained in a material gas used in a semiconductor manufacturing process or a by-product gas generated in a semiconductor manufacturing process, the device including a gas cell into which the material gas or the by-product gas is introduced, a laser light source that irradiates the gas cell with laser light whose wavelength is modulated, a light detector that detects the laser light transmitted through the gas cell, and a signal processing unit that calculates the concentration or partial pressure of the halide by using a light absorption signal obtained from an output signal of the light detector.
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公开(公告)号：US20240030013A1
公开(公告)日：2024-01-25
申请号：US18222029
申请日：2023-07-14
发明人： Miyako HADA , Motonobu TAKAHASHI , Masakazu MINAMI , Yuhei SAKAGUCHI , Toru SHIMIZU , Tetsuo FUJII
CPC分类号： H01J37/32981 , H01J37/32926 , H01L21/67069 , H01L21/67253 , H01J2237/2445 , H01J2237/3341
摘要： The present invention is aimed to perform precise monitoring of the processed amount by which a workpiece is processed, and includes a measurement unit that measures a concentration or a partial pressure of a reaction product generated while the workpiece is being processed, and an operation unit that calculates the processed amount of the workpiece using an output value of the measurement unit. The measurement unit includes: a laser light source that irradiates target gas containing the reaction product with a laser beam; a photodetector that detects a laser beam having passed through the target gas; and a signal processing unit that calculates the concentration or the partial pressure of the reaction product based on a detection signal of the photodetector. The operation unit includes a time integration unit; a relationship data storage unit; and a processed amount calculation unit.
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3.发明公开公开(公告)号：US20240094176A1
公开(公告)日：2024-03-21
申请号：US18369332
申请日：2023-09-18
CPC分类号： G01N33/0013 , B01L3/502761 , B01L5/00 , B01L2200/16 , B01L2400/082
摘要： The present invention brings an actual concentration of a process gas closer to an ideal concentration, and a gas analysis device that is used in a fluid control system that controls a process gas obtained by vaporizing a liquid material or a solid material, the gas analysis device including: a first concentration calculation unit that calculates a concentration of the process gas; a second concentration calculation unit that calculates a concentration of a by-product gas at least generated in a side reaction that is a reaction different from a main reaction for generating the process gas; a comparison unit that compares a first actual concentration that is the concentration of the process gas calculated by the first concentration calculation unit with a first ideal concentration, and compares a second actual concentration that is the concentration of the by-product gas calculated by the second concentration calculation unit with a second ideal concentration.
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公开(公告)号：US20230228677A1
公开(公告)日：2023-07-20
申请号：US18095204
申请日：2023-01-10
发明人： Motonobu TAKAHASHI , Sotaro KISHIDA , Akira KUWAHARA , Takeshi AKAMATSU , Yuhei SAKAGUCHI , Masakazu MINAMI
IPC分类号： G01N21/3504 , G01N33/00 , G01D11/24 , G01D21/02
CPC分类号： G01N21/3504 , G01N33/0027 , G01D11/245 , G01D21/02
摘要： Provided are a gas cell into which a gas is introduced, a temperature control block configured to control a temperature of the gas cell, and a pressure sensor configured to measure a pressure inside the gas cell. The pressure sensor is built into the temperature control block and/or the gas cell.
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公开(公告)号：US20240201078A1
公开(公告)日：2024-06-20
申请号：US18287544
申请日：2022-03-16
IPC分类号： G01N21/3504
CPC分类号： G01N21/3504 , G01N2201/0233 , G01N2201/0633 , G01N2201/0636
摘要： In order to provide a more practical gas analysis device than that having conventionally been, while keeping the laser source and the photodetector separated from the gas cell, thereby preventing exposure to a high temperature, the gas analysis device includes: a gas cell; a laser source or a photodetector separated from the gas cell; and a laser light transmission mechanism provided between the gas cell and the laser source or the photodetector. The laser light transmission mechanism includes one or a plurality of tubular members, and an inner space of the one or the plurality of tubular members provides a light path for the laser light.
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公开(公告)号：US20210131955A1
公开(公告)日：2021-05-06
申请号：US16492358
申请日：2018-04-17
申请人： HORIBA, LTD.
发明人： Motonobu TAKAHASHI
IPC分类号： G01N21/3504 , G01N33/00
摘要： In order to enable concentrations of components to be measured to be accurately calculated even when higher boiling compounds are contained in a test gas, a gas analysis device that analyzes components to be measured that are contained in a test gas using a light spectrum obtained by irradiating light onto the test gas is provided with a calibration curve data storage section in which is stored first calibration curve data in which effects on concentrations of the components to be measured from higher boiling compounds whose boiling point is higher than a heating temperature of an analyzer into which the test gas has been introduced have been corrected, and with a concentration calculation section that calculates concentrations of components to be measured using the first calibration curve data.
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公开(公告)号：US20190017927A1
公开(公告)日：2019-01-17
申请号：US16020421
申请日：2018-06-27
申请人： HORIBA, Ltd.
发明人： Motonobu TAKAHASHI
IPC分类号： G01N21/3504 , G01N21/25
摘要： A gas analysis apparatus includes a calibration curve data storage section designed to store N types of calibration curve data which are previously created for N types of measurement target components and obtained by correcting influences of other N-1 types of measurement target components with respect to a concentration of each of the measurement target components, and a concentration calculation section designed to calculate a concentration of each of the measurement target components by using the N types of calibration curve data. When there exists a subthreshold component whose concentration calculated by the concentration calculation section is not more than a predetermined threshold value, the concentration calculation section calculates a concentration of each of the measurement target components other than the subthreshold component by using calibration curve data obtained without correcting an influence of the subthreshold component.
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