GAS ANALYSIS DEVICE, FLUID CONTROL SYSTEM, GAS ANALYSIS PROGRAM, AND GAS ANALYSIS METHOD

    公开(公告)号:US20240094176A1

    公开(公告)日:2024-03-21

    申请号:US18369332

    申请日:2023-09-18

    Abstract: The present invention brings an actual concentration of a process gas closer to an ideal concentration, and a gas analysis device that is used in a fluid control system that controls a process gas obtained by vaporizing a liquid material or a solid material, the gas analysis device including: a first concentration calculation unit that calculates a concentration of the process gas; a second concentration calculation unit that calculates a concentration of a by-product gas at least generated in a side reaction that is a reaction different from a main reaction for generating the process gas; a comparison unit that compares a first actual concentration that is the concentration of the process gas calculated by the first concentration calculation unit with a first ideal concentration, and compares a second actual concentration that is the concentration of the by-product gas calculated by the second concentration calculation unit with a second ideal concentration.

    GAS ANALYSIS DEVICE, FLUID CONTROL SYSTEM, PROGRAM FOR GAS ANALYSIS, AND GAS ANALYSIS METHOD

    公开(公告)号:US20240201157A1

    公开(公告)日:2024-06-20

    申请号:US18288097

    申请日:2022-02-14

    Abstract: A gas analysis device for analyzing a compound gas and H2O gas produced in a main reaction in which an aqueous solution including a compound and water is vaporized, includes a first concentration calculating unit that calculates a concentration of the compound gas, a second concentration calculating unit that calculates a concentration of the H2O gas, an analysis unit that compares a first actual concentration which is the concentration of the compound gas calculated by the first concentration calculating unit with a first ideal concentration which is the concentration of the compound gas in case that the main reaction proceeds ideally, and that compares a second actual concentration which is the concentration of the H2O gas calculated by the second concentration calculating unit with a second ideal concentration which is the concentration of the H2O gas in case that the main reaction proceeds ideally and an output unit.

    ANALYSIS DEVICE, ANALYSIS METHOD, AND ANALYSIS PROGRAM

    公开(公告)号:US20240030013A1

    公开(公告)日:2024-01-25

    申请号:US18222029

    申请日:2023-07-14

    Abstract: The present invention is aimed to perform precise monitoring of the processed amount by which a workpiece is processed, and includes a measurement unit that measures a concentration or a partial pressure of a reaction product generated while the workpiece is being processed, and an operation unit that calculates the processed amount of the workpiece using an output value of the measurement unit. The measurement unit includes: a laser light source that irradiates target gas containing the reaction product with a laser beam; a photodetector that detects a laser beam having passed through the target gas; and a signal processing unit that calculates the concentration or the partial pressure of the reaction product based on a detection signal of the photodetector. The operation unit includes a time integration unit; a relationship data storage unit; and a processed amount calculation unit.

    GAS ANALYSIS DEVICE AND GAS ANALYSIS METHOD
    5.
    发明公开

    公开(公告)号:US20230417660A1

    公开(公告)日:2023-12-28

    申请号:US18039316

    申请日:2021-11-22

    CPC classification number: G01N21/3504 G01N21/0332 G01N21/39 G01N2201/127

    Abstract: The present invention is a gas analysis device that measures a concentration or partial pressure of a halide contained in a material gas used in semiconductor manufacturing process or a by-product gas generated in semiconductor manufacturing process with good accuracy, the device being for analyzing a concentration or partial pressure of a halide contained in a material gas used in a semiconductor manufacturing process or a by-product gas generated in a semiconductor manufacturing process, the device including a gas cell into which the material gas or the by-product gas is introduced, a laser light source that irradiates the gas cell with laser light whose wavelength is modulated, a light detector that detects the laser light transmitted through the gas cell, and a signal processing unit that calculates the concentration or partial pressure of the halide by using a light absorption signal obtained from an output signal of the light detector.

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