GAS ANALYSIS DEVICE AND GAS ANALYSIS METHOD
    1.
    发明公开

    公开(公告)号:US20230417660A1

    公开(公告)日:2023-12-28

    申请号:US18039316

    申请日:2021-11-22

    摘要: The present invention is a gas analysis device that measures a concentration or partial pressure of a halide contained in a material gas used in semiconductor manufacturing process or a by-product gas generated in semiconductor manufacturing process with good accuracy, the device being for analyzing a concentration or partial pressure of a halide contained in a material gas used in a semiconductor manufacturing process or a by-product gas generated in a semiconductor manufacturing process, the device including a gas cell into which the material gas or the by-product gas is introduced, a laser light source that irradiates the gas cell with laser light whose wavelength is modulated, a light detector that detects the laser light transmitted through the gas cell, and a signal processing unit that calculates the concentration or partial pressure of the halide by using a light absorption signal obtained from an output signal of the light detector.

    ABSORBANCE METER AND SEMICONDUCTOR MANUFACTURING DEVICE USING ABSORBANCE METER

    公开(公告)号:US20190242818A1

    公开(公告)日:2019-08-08

    申请号:US16333265

    申请日:2017-09-14

    摘要: Obtained is an absorbance meter capable of, when measuring high-temperature sample gas, without increasing the distance from a light source part to a light receiving part, protecting the light source part and the light receiving part from the heat of the sample gas and keeping measurement accuracy high. A sample accommodation part including an accommodation space for accommodating the sample gas, the light source part for radiating light into the accommodation space, the light receiving part for receiving light exiting from inside the accommodation space, a first insulation part disposed adjacent to the light source part side of the sample accommodation part, a second insulation part disposed adjacent to the light receiving part side of the sample accommodation part, a first cooling part disposed adjacent to the first insulation part, and a second cooling part disposed adjacent to the second insulation part are provided.

    GAS CONTROL SYSTEM AND FILM FORMATION APPARATUS PROVIDED WITH GAS CONTROL SYSTEM

    公开(公告)号:US20190161863A1

    公开(公告)日:2019-05-30

    申请号:US16323119

    申请日:2017-07-26

    摘要: The present invention provides a gas control system which introduces carrier gas into a tank containing a material and leads out material gas generated by vaporization of the material from the tank together with the carrier gas, the gas control system being provided with: a flow rate control unit that is configure to control the flow rate of the material gas led out from the tank by adjusting the flow rate of the carrier gas introduced into the tank; and a control limit detection unit that is configured to detect a control limit state and output detection of the control limit state, the control limit state is a state that the adjustment of the flow rate of the carrier gas performed by the flow rate control unit cannot secure the flow rate control of the material gas at a predetermined performance level.

    CP2Mg CONCENTRATION MEASURING DEVICE
    4.
    发明申请
    CP2Mg CONCENTRATION MEASURING DEVICE 有权
    CP2Mg浓度测量装置

    公开(公告)号:US20170052115A1

    公开(公告)日:2017-02-23

    申请号:US15240235

    申请日:2016-08-18

    IPC分类号: G01N21/61 G01N21/05

    摘要: The present invention intends to provide a Cp2Mg concentration measuring device capable of accurately measuring the concentration of Cp2Mg to be supplied to a process chamber without being affected by spontaneous decomposition, and is adapted to measure light intensity in a predetermined wavelength band around 12.8 μm and on the basis of the light intensity, calculate the concentration of Cp2Mg in a material gas.

    摘要翻译: 本发明旨在提供一种Cp2Mg浓度测定装置,能够精确地测定供给到处理室的Cp2Mg的浓度,而不受自发分解的影响,适用于测定12.8μm左右的规定波长带的光强度, 光强度的基础,计算材料气体中Cp2Mg的浓度。

    ANALYSIS DEVICE, ANALYSIS METHOD, AND ANALYSIS PROGRAM

    公开(公告)号:US20240030013A1

    公开(公告)日:2024-01-25

    申请号:US18222029

    申请日:2023-07-14

    IPC分类号: H01J37/32 H01L21/67

    摘要: The present invention is aimed to perform precise monitoring of the processed amount by which a workpiece is processed, and includes a measurement unit that measures a concentration or a partial pressure of a reaction product generated while the workpiece is being processed, and an operation unit that calculates the processed amount of the workpiece using an output value of the measurement unit. The measurement unit includes: a laser light source that irradiates target gas containing the reaction product with a laser beam; a photodetector that detects a laser beam having passed through the target gas; and a signal processing unit that calculates the concentration or the partial pressure of the reaction product based on a detection signal of the photodetector. The operation unit includes a time integration unit; a relationship data storage unit; and a processed amount calculation unit.

    LIGHT ABSORBANCE ANALYSIS APPARATUS AND PROGRAM RECORD MEDIUM FOR RECORDING PROGRAMS OF LIGHT ABSORBANCE ANALYSIS APPARATUS

    公开(公告)号:US20200340918A1

    公开(公告)日:2020-10-29

    申请号:US16849381

    申请日:2020-04-15

    IPC分类号: G01N21/61

    摘要: In order to make it possible to conduct a zero calibration even though an interference gas exists in a measurement area of a detector, a light absorbance analysis apparatus includes a detector that detects an intensity of light that transmits a gas, a total pressure sensor that measures a total pressure of the gas, an absorbance calculating part that calculates an absorbance based on an output value of the detector and a previously set zero reference value, a partial pressure—absorbance relation storing part that stores a partial pressure—absorbance relational data that indicates a relationship between a partial pressure of an interference gas that exists in a measurement area of the detector and an absorbance calculated by the absorbance calculating part, and a partial pressure calculating part that calculates an interference gas partial pressure as a partial pressure of the interference gas.

    GAS ANALYSIS DEVICE, FLUID CONTROL SYSTEM, GAS ANALYSIS PROGRAM, AND GAS ANALYSIS METHOD

    公开(公告)号:US20240094176A1

    公开(公告)日:2024-03-21

    申请号:US18369332

    申请日:2023-09-18

    IPC分类号: G01N33/00 B01L3/00 B01L5/00

    摘要: The present invention brings an actual concentration of a process gas closer to an ideal concentration, and a gas analysis device that is used in a fluid control system that controls a process gas obtained by vaporizing a liquid material or a solid material, the gas analysis device including: a first concentration calculation unit that calculates a concentration of the process gas; a second concentration calculation unit that calculates a concentration of a by-product gas at least generated in a side reaction that is a reaction different from a main reaction for generating the process gas; a comparison unit that compares a first actual concentration that is the concentration of the process gas calculated by the first concentration calculation unit with a first ideal concentration, and compares a second actual concentration that is the concentration of the by-product gas calculated by the second concentration calculation unit with a second ideal concentration.